Search Results - "Wanki Kim"
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Nonvolatile 3D-FPGA with monolithically stacked RRAM-based configuration memory
Published in 2012 IEEE International Solid-State Circuits Conference (01-02-2012)“…SRAM based configuration memory is the primary contributor to the large area, delay, and power consumption of FPGAs relative to ASICs. In [1] it is estimated…”
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Conference Proceeding -
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Pattern Training, Inference, and Regeneration Demonstration Using On‐Chip Trainable Neuromorphic Chips for Spiking Restricted Boltzmann Machine
Published in Advanced intelligent systems (01-08-2022)“…A fully silicon‐integrated restricted Boltzmann machine (RBM) with an event‐driven contrastive divergence (eCD) training algorithm is implemented using novel…”
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Current Conduction Mechanism of Nitrogen-Doped RRAM
Published in IEEE transactions on electron devices (01-06-2014)“…To eliminate the forming process in resistive random access memory (RRAM), we introduced nitrogen into AlO x layer to generate a moderate amount of traps…”
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4
Impact of Phase‐Change Memory Flicker Noise and Weight Drift on Analog Hardware Inference for Large‐Scale Deep Learning Networks
Published in Advanced intelligent systems (01-05-2022)“…The analog AI core concept is appealing for deep‐learning (DL) because it combines computation and memory functions into a single device. Yet, significant…”
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Forming-free nitrogen-doped AlOX RRAM with sub-μA programming current
Published in 2011 Symposium on VLSI Technology - Digest of Technical Papers (01-06-2011)“…Nitrogen-doped AlO X Resistive RAM has been integrated on CMOS. The memory cell requires no forming, and sub-μA programming currents. The cell is capable of…”
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Conference Proceeding -
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A Study on the Factors that Affect the Negotiation of Technology Trading for Promotion of Technology Transfer Commercialization
Published in Journal of distribution science (30-01-2014)“…Purpose - This Study aims to promote technology transfer commercialization and ultimately make contribution towards enhancement of the success rate of…”
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Journal Article -
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Strained Si1−xGex-on-insulator PMOS FinFETs with excellent sub-threshold leakage, extremely-high short-channel performance and source injection velocity for 10nm node and beyond
Published in 2014 Symposium on VLSI Technology (VLSI-Technology): Digest of Technical Papers (01-06-2014)“…We demonstrate high performance (HP) s-SiGe pMOS finFETs with I on /I eff of ~1.05/0.52mA/μm and ~1.3/0.71mA/μm at I off =100nA/μm at V DD =0.8 and 1V,…”
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Conference Proceeding -
8
Evaluation of collagen-based membranes for guided bone regeneration, by three-dimensional computerized microtomography
Published in Oral surgery, oral medicine, oral pathology and oral radiology (01-10-2012)“…Objective The aim of this study was to evaluate the use of a collagen-based membrane compared with no treatment on guided bone regeneration by 3-dimensional…”
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Effects of emulsifiers on properties of poly(styrene–butyl acrylate) latex-modified mortars
Published in Cement and concrete research (01-06-2002)“…Two styrene–butyl acrylate copolymer latices having the same chemical components but different emulsifiers were synthesized under the same reaction conditions,…”
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A Comprehensive Study of Transient Characteristics in FeFET Using In-Situ Vt Measurement Method
Published in IEEE electron device letters (01-08-2024)“…In ferroelectric FETs (FeFETs), the transient characteristics is a key issue to be addressed. Therefore, it is important to have an understanding based on…”
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A Comprehensive Study of Transient Characteristics in FeFET Using In-Situ V t Measurement Method
Published in IEEE electron device letters (01-08-2024)Get full text
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12
Self‐Healing of a Confined Phase Change Memory Device with a Metallic Surfactant Layer
Published in Advanced materials (Weinheim) (01-03-2018)“…Understanding and possibly recovering from the failure mechanisms of phase change memories (PCMs) are critical to improving their cycle life. Extensive…”
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Understanding the Memory Window of Ferroelectric FET and Demonstration of 4.8-V Memory Window With 20-nm HfO 2
Published in IEEE transactions on electron devices (01-08-2024)Get full text
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Understanding the Memory Window of Ferroelectric FET and Demonstration of 4.8-V Memory Window With 20-nm HfO2
Published in IEEE transactions on electron devices (01-08-2024)“…In this work, with the goal of developing a large memory window (MW) ferroelectric field-effect transistor (FeFET) for high-density stand-alone storage…”
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15
Strategies for a Wide Memory Window of Ferroelectric FET for Multilevel Ferroelectric VNAND Operation
Published in IEEE electron device letters (01-07-2024)“…Basic gate stack structure of the Ferroelectric FET is Metal-ferroelectric-insulator-silicon (MFIS), where the memory window (M.W) is <inline-formula>…”
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A Large Window Nonvolatile Transistor Memory for High-Density and Low-Power Vertical NAND Storage Enabled by Ferroelectric Charge Pumping
Published in IEEE electron device letters (09-10-2024)“…In this work, we have developed a large memory window (MW) ferroelectric field effect transistor (FeFET) memory for vertical NAND storage. We demonstrate that:…”
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Using AHP to determine intangible priority factors for technology transfer adoption
Published in Expert systems with applications (01-06-2012)“…► This research investigates the important intangible priority factors for the transfer of technology. ► First, the selection of priority factors of emerging…”
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Antecedents to Customer Repurchase in Korean Social Commerce Service
Published in Journal of distribution science (31-03-2012)“…Recently, with the success of Groupon in the USA using the new business model referred to as social commerce, which is a commercial transaction involving group…”
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Material Choices for Tunnel Dielectric Layer and Gate Blocking Layer for Ferroelectric NAND Applications
Published in IEEE electron device letters (01-10-2024)“…We present an experimental study to compare the impacts of different dielectric materials - Al 2 O 3 and SiO 2 used as the tunnel dielectric layer (TDL) and…”
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Disturb and its mitigation in Ferroelectric Field-Effect Transistors with Large Memory Window for NAND Flash Applications
Published in IEEE electron device letters (24-09-2024)“…We study the disturb characteristics of ferroelectric field-effect transistors (FEFETs) with band-engineered gate stacks. We demonstrate that integrating a…”
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