Search Results - "WALCZYK, Damian"
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Engineering of the Chemical Reactivity of the Ti/HfO2 Interface for RRAM: Experiment and Theory
Published in ACS applied materials & interfaces (09-04-2014)“…The Ti/HfO2 interface plays a major role for resistance switching performances. However, clear interface engineering strategies to achieve reliable and…”
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Journal Article -
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Impact of Temperature on the Resistive Switching Behavior of Embedded \hbox-Based RRAM Devices
Published in IEEE transactions on electron devices (01-09-2011)“…Back-end-of-line integrated 1 × μm 2 TiN/HfO 2 /Ti/TiN MIM memory devices in a 0.25- μm complementary metal-oxide-semiconductor technology were built to…”
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Impact of Temperature on the Resistive Switching Behavior of Embedded HfO2-Based RRAM Devices
Published in IEEE transactions on electron devices (01-09-2011)Get full text
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Oxygen Vacancy Induced Room Temperature Ferromagnetism in Pr-Doped CeO2 Thin Films on Silicon
Published in ACS applied materials & interfaces (22-10-2014)“…Integration of functional oxides on Si substrates could open a pathway to integrate diverse devices on Si-based technology. Oxygen vacancies (Vo··) can…”
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Impact of Intercell and Intracell Variability on Forming and Switching Parameters in RRAM Arrays
Published in IEEE transactions on electron devices (01-08-2015)“…The intercell variability of the initial state and the impact of dc and pulse forming on intercell variability as well as on intracell variability in TiN/HfO 2…”
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Oxygen Vacancy Induced Room Temperature Ferromagnetism in Pr-Doped CeO 2 Thin Films on Silicon
Published in ACS applied materials & interfaces (22-10-2014)Get full text
Journal Article -
8
Statistical analysis of resistive switching characteristics in ReRAM test arrays
Published in 2014 International Conference on Microelectronic Test Structures (ICMTS) (01-03-2014)“…The design and the manufacturing of ReRAM test structures allow deeper insight in the performance of the FORMING, RESET, and SET operations at array level,…”
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Conference Proceeding -
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Engineering of the Chemical Reactivity of the Ti/HfO 2 Interface for RRAM: Experiment and Theory
Published in ACS applied materials & interfaces (09-04-2014)Get full text
Journal Article -
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Impact of Temperature on the Resistive Switching Behavior of Embedded [Formula Omitted]-Based RRAM Devices
Published in IEEE transactions on electron devices (01-09-2011)“…Back-end-of-line integrated [Formula Omitted] MIM memory devices in a 0.25-[Formula Omitted] complementary metal-oxide-semiconductor technology were built to…”
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Journal Article -
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Impact of Temperature on the Resistive Switching Behavior of Embedded hbox HfO 2 -Based RRAM Devices
Published in IEEE transactions on electron devices (01-09-2011)“…Back-end-of-line integrated hbox 1 hbox 1 Unknown character mu hbox m 2 Unknown character hbox TiN / HfO 2 / break hbox Ti / TiN MIM memory devices in a 0.25-…”
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Journal Article -
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Electrical characterization of read window in reram arrays under different SET/RESET cycling conditions
Published in 2014 IEEE 6th International Memory Workshop (IMW) (01-05-2014)“…In this work a SET/RESET investigation in cycling on ReRAM arrays has been performed, in order to find the most reliable SET/RESET operation conditions. The…”
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Conference Proceeding