Search Results - "Vourdas, N."

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  1. 1

    Mechanisms of Oxygen Plasma Nanotexturing of Organic Polymer Surfaces: From Stable Super Hydrophilic to Super Hydrophobic Surfaces by Tsougeni, K, Vourdas, N, Tserepi, A, Gogolides, E, Cardinaud, C

    Published in Langmuir (06-10-2009)
    “…Plasma processing is used to fabricate super hydrophilic or super hydrophobic polymeric surfaces by means of O2 plasma etching of two organic polymers, namely,…”
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    Journal Article
  2. 2

    Optical and structural properties of copper oxide thin films grown by oxidation of metal layers by Papadimitropoulos, G., Vourdas, N., Vamvakas, V. Em, Davazoglou, D.

    Published in Thin solid films (05-12-2006)
    “…Copper oxide films were grown by oxidation of vacuum evaporated copper layers on silicon substrates. Oxidations were performed at atmospheric pressure, in a…”
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    Journal Article
  3. 3

    Droplet Mobility Manipulation on Porous Media Using Backpressure by Vourdas, N, Pashos, G, Kokkoris, G, Boudouvis, A. G, Stathopoulos, V. N

    Published in Langmuir (31-05-2016)
    “…Wetting phenomena on hydrophobic surfaces are strongly related to the volume and pressure of gas pockets residing at the solid–liquid interface. In this study,…”
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    Journal Article
  4. 4

    Substoichiometric hot-wire WOx films deposited in reducing environment by Vourdas, N., Papadimitropoulos, G., Kostis, I., Vasilopoulou, M., Davazoglou, D.

    Published in Thin solid films (29-02-2012)
    “…Substoichiometric tungsten oxide films were deposited on Si substrates by heating metallic filaments at temperatures of 920, 1020 and 1070K at a total pressure…”
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    Journal Article
  5. 5

    Plug actuation and active manipulation in closed monolithic fluidics using backpressure by Vourdas, N., Pashos, G., Rizos, E., Kokkoris, G., Tsampasis, E., Klouvidaki, E., Boudouvis, A.G., Stathopoulos, V.N.

    Published in Microelectronic engineering (15-08-2019)
    “…We explore the mechanisms to actuate and manipulate liquid plugs in monolithic closed channel fluidics with porous hydrophobic walls. Applying a small…”
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    Journal Article
  6. 6

    Water-Repellent Approaches for 3-D Printed Internal Passages by Milionis, A., Noyes, C., Loth, E., Bayer, I. S., Lichtenberger, A. W., Stathopoulos, V. N., Vourdas, N.

    Published in Materials and manufacturing processes (03-07-2016)
    “…In this work, two different manufacturing approaches are presented that create water-repellency (hydrophobicity and super-hydrophobicity) for acrylonitrile…”
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    Journal Article
  7. 7

    Plasma processing for polymeric microfluidics fabrication and surface modification: Effect of super-hydrophobic walls on electroosmotic flow by Vourdas, N., Tserepi, A., Boudouvis, A.G., Gogolides, E.

    Published in Microelectronic engineering (01-05-2008)
    “…We report on the fabrication and electrokinetic characterization of poly-methyl methacrylate (PMMA) microfluidics by deep O2 plasma etching, utilizing a…”
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    Journal Article Conference Proceeding
  8. 8

    Highly porous tungsten oxides for electrochromic applications by Kostis, I., Vasilopoulou, M., Soultati, A., Argitis, P., Konofaos, N., Douvas, A.M., Vourdas, N., Papadimitropoulos, G., Davazoglou, D.

    Published in Microelectronic engineering (01-11-2013)
    “…[Display omitted] •Electrochromic properties of tungsten oxides.•Hot wire deposited tungsten oxide.•Highly porous metal oxide films.•Higher effective…”
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    Journal Article
  9. 9

    Formation of stoichiometric, sub-stoichiometric undoped and hydrogen doped tungsten oxide films, enabled by pulsed introduction of O2 or H2 during hot-wire vapor deposition by Kostis, I., Vourdas, N., Vasilopoulou, M., Douvas, A., Papadimitropoulos, G., Konofaos, N., Iliadis, A., Davazoglou, D.

    Published in Thin solid films (01-06-2013)
    “…Tungsten oxide films with various stoichiometries, undoped and hydrogen doped were deposited by heating a W wire at 660°C and at a base pressure of 13Pa set by…”
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    Journal Article
  10. 10

    Optical characterization of Si-rich silicon nitride films prepared by low pressure chemical vapor deposition by Vamvakas, V.Em, Vourdas, N., Gardelis, S.

    Published in Microelectronics and reliability (01-04-2007)
    “…An investigation of the optical properties of Si-rich silicon nitride films prepared by low pressure chemical vapor deposition (LPCVD) from dichlorosilane (SiH…”
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    Journal Article Conference Proceeding
  11. 11

    Multiwavelength interferometry and competing optical methods for the thermal probing of thin polymeric films by Vourdas, N., Karadimos, G., Goustouridis, D., Gogolides, E., Boudouvis, A. G., Tortai, J.-H., Beltsios, K., Raptis, I.

    Published in Journal of applied polymer science (05-12-2006)
    “…Multiple‐wavelength interferometry (MWI), a new optical method for the thermal probing of thin polymer films, is introduced and explored. MWI is compared with…”
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    Journal Article
  12. 12

    Increased plasma etch resistance of thin polymeric and photoresist films by Vourdas, N., Boudouvis, A.G., Gogolides, E.

    Published in Microelectronic engineering (01-03-2005)
    “…Plasma etch rate measurements of thin polymeric films are presented. Four commonly used polymers were etched (1) poly-methyl-methacrylate (PMMA), (2)…”
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    Journal Article Conference Proceeding
  13. 13

    Reversible pressure-induced switching of droplet mobility after impingement on porous surface media by Vourdas, N., Tserepi, A., Stathopoulos, V. N.

    Published in Applied physics letters (09-09-2013)
    “…We present a generic method to reversibly switch the mobility of a droplet after impingement onto a hydrophobic porous surface, from a sticky to a slippery…”
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    Journal Article
  14. 14

    Evaluation of LaAlO3 as top coat material for thermal barrier coatings by VOURDAS, N., MARATHONITI, E., PANDIS, P.K., ARGIRUSIS, Chr, SOURKOUNI, G., LEGROS, C., MIRZA, S., STATHOPOULOS, V.N.

    “…Perovskite is a versatile group of oxide materials allowing their properties to be tailored by composition towards specific requirements. LaAlO3 was prepared…”
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    Journal Article
  15. 15

    Thickness-dependent glass transition temperature of thin resist films for high resolution lithography by Marceau, S., Tortai, J.-H., Tillier, J., Vourdas, N., Gogolides, E., Raptis, I., Beltsios, K., van Werden, K.

    Published in Microelectronic engineering (01-04-2006)
    “…Fabrication of devices at the 45 nm node and beyond requires resist film with a thickness below 150 nm. The physicochemical properties of thin films, such as…”
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    Journal Article Conference Proceeding
  16. 16

    Plasma oxidation of polyhedral oligomeric silsesquioxane polymers by Eon, D., Raballand, V., Cartry, G., Cardinaud, Christophe, Vourdas, N., Argitis, P., Gogolides, E.

    “…Copolymers containing polyhedral oligomeric silsesquioxane (POSS™) units have been developed to be used as photoresist components in a bilayer resist scheme…”
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    Journal Article
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