Search Results - "Velikov, L. V."

  • Showing 1 - 5 results of 5
Refine Results
  1. 1

    Submillimeter Spectroscopy of Weak Antiferromagnets in Magnetic Fields Up to 300 kOe by Rudashevsky, E.G., Prokhorov, A.S., Velikov, L.V.

    “…The dynamic properties of antiferromaggets with Dzyaloshinsky interaction were investigated at wavelengths 0.3- 14 mm, in magnetic fields up to 300 kOe and…”
    Get full text
    Journal Article
  2. 2

    The percolation approach to the development of pulsed laser exposed positive photoresists by Bogdanov, A. L., Valiev, K. A., Velikov, L. V., Zaroslov, D. Yu

    “…Results of photolithography experiments utilizing the XeCl excimer laser and positive photoresists are reported. Abrupt reciprocity loss resulting in the…”
    Get full text
    Journal Article
  3. 3

    The silylation processes for positive and negative deep ultraviolet resists by Sviridov, S. M., Timerov, M. R., Valiev, K. A., Velikov, L. V., Zaroslov, D. Yu

    “…In this report the experimental results of the resist silylation and O2‐plasma development are presented. The Soviet commercial novolac based photoresists of…”
    Get full text
    Conference Proceeding Journal Article
  4. 4

    Submillimeter Spectroscopy of Weak Antiferromagnets in Magnetic Fields up to 300 kOe by Rudashevsky, E. G., Prokhorov, A. S., Velikov, L. V.

    “…Antiferromagnetic resonance (AFMR) in weak antiferromagnets (WF) is investigated at wavelength λ = 300μ-14mm at 4.2-400°K in magnetic fields (MF) up to 300kOe…”
    Get full text
    Conference Proceeding
  5. 5

    The coherence factors of excimer laser radiation in projection lithography by Valiev, K. A., Velikov, L. V., Volkov, G. S., Zaroslov, D. Yu

    “…The spatial coherence of the excimer laser radiation seriously affects the quality of the images being reproduced by diffraction limited optics in…”
    Get full text
    Conference Proceeding Journal Article