Search Results - "Vdovin, V.I"
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Fabrication of polycrystalline silicon thin films from a-SiOx via the inverted aluminum-induced layer exchange process
Published in Materials letters (15-02-2020)“…•Poly-Si films were first fabricated using a-SiOx via the inverted-ALILE on glass substrates.•The presence of oxygen in the system suppressed the formation Si…”
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Structure and optical properties of Si and SiGe layers grown on SiO2 by chemical vapor deposition
Published in Thin solid films (31-03-2015)“…The properties of thin Si and SiGe layers grown on SiO2 by chemical vapor deposition (CVD) were studied using transmission electron and atomic force…”
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3
Nature and origin of pure edge dislocations in low mismatched epitaxial structures
Published in Journal of crystal growth (01-02-1997)“…A study of pure edge misfit dislocations (L-MDs) in SiGe Si , Ge GaAs , GaAlAsP GaAs , GaAlAsSb GaSb and InGaAsP InP epitaxial structures grown by different…”
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Layer exchange during aluminum-induced crystallization of silicon suboxide thin films
Published in Materials letters (15-06-2021)“…•Al-induced crystallization of a-SiO1.8 in the layer exchange mode was carried out.•Annealing at 550 °C led to the formation of a continuous poly-Si thin…”
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5
Hafnia and alumina stacks as UTBOXs in silicon-on insulator
Published in Solid-state electronics (01-06-2020)“…•In SOI pseudo-MOSFETs with 20 nm hafnia alumina interlayers show normal gate-drain characteristics after an RTA ≥ 950 °C with the charge-carrier mobilities…”
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Ferroelectric properties of SOS and SOI pseudo-MOSFETs with HfO2 interlayers
Published in Solid-state electronics (01-09-2019)“…•SOI and SOS pseudo-MOSFETs with 20 nm hafnia interlayers show normal gate-drain characteristics after annealing ≥ 1000 °C with the carrier mobility as in bulk…”
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7
Blister suppression in the CO+ molecule implanted SOI substrates with ultrathin buried oxides
Published in Materials today communications (01-09-2021)“…The formation of gettering layers in CO+ ion implanted (COII) n-type (001) silicon wafers with a layer of thermal SiO2 and silicon-on-insulator (SOI) was first…”
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Misfit dislocation generation in SiGe epitaxial layers supersaturated with intrinsic point defects
Published in Thin solid films (03-11-2008)“…Misfit dislocation generation in SiGe/Si(001) heterostructures supersaturated with the vacancies (LT epitaxial growth) or self-interstitials (ion implantation)…”
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9
Infrared photoluminescence from GeSi nanocrystals embedded in a germanium–silicate matrix
Published in Journal of experimental and theoretical physics (01-12-2015)“…We investigate the structural and optical properties of GeO/SiO 2 multilayers obtained by evaporation of GeO 2 and SiO 2 powders under ultrahigh vacuum…”
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Regularities in the formation of dislocation networks on the boundary of bonded Si(001) wafers
Published in Semiconductors (Woodbury, N.Y.) (01-02-2013)“…The dislocation networks in structures with hydrophilically bonded Si (001) wafers are investigated by transmission electron microscopy. Networks with…”
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Luminescent and Structural Properties of Electron-Irradiated Silicon Light-Emitting Diodes with Dislocation-Related Luminescence
Published in Materials today : proceedings (2018)“…Electroluminescence (EL) from light-emitting diodes (LEDs) at wavelengths in the range 1000-1650 nm, current densities of up to 10 A/cm2, and temperature of 64…”
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Specific features and mechanisms of photoluminescence of nanostructured silicon carbide films grown on silicon in vacuum
Published in Physics of the solid state (01-09-2011)“…The light-emitting properties of cubic silicon carbide films grown by vacuum vapor phase epitaxy on Si(100) and Si(111) substrates under conditions of…”
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Photoluminescence in silicon implanted with erbium ions at an elevated temperature
Published in Semiconductors (Woodbury, N.Y.) (01-08-2011)“…Photoluminescence spectra of n -type silicon upon implantation with erbium ions at 600°C and oxygen ions at room temperature and subsequent annealings at…”
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Extended structural defects and their influence on the electroluminescence in efficient Si light-emitting diodes
Published in Physica. B, Condensed matter (31-12-2003)“…We report our results on electroluminescence (EL) in the range of 1.0–1.6μm, structural defects and electrophysical properties of light-emitting diodes…”
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Defect structure of erbium-doped [formula omitted] silicon layers formed by solid phase epitaxy
Published in Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms (2001)“…Erbium-doped layers have been produced on 〈1 1 1〉 -oriented silicon wafers using high-energy amorphizing Er implants and solid phase epitaxy (SPE)…”
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Low-temperature strain relaxation in SiGe/Si heterostructures implanted with Ge + ions
Published in Materials science & engineering. B, Solid-state materials for advanced technology (15-06-2003)“…Pseudomorphic Si 0.76Ge 0.24/Si heterostructures grown by molecular beam epitaxy were implanted with Ge + ions at 400 °C in such a way that an ion-damaged…”
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Structural defects and dislocation-related photoluminescence in erbium-implanted silicon
Published in Materials science & engineering. B, Solid-state materials for advanced technology (30-04-2002)“…Structural defects and optical features of p-type CzSi after implantation of erbium ions with 1 MeV energy and 1×10 14 cm −2 dose followed by annealing at…”
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Low-temperature strain relaxation in ion-irradiated pseudomorphic SiGe/Si structures
Published in Materials science & engineering. B, Solid-state materials for advanced technology (14-02-2002)“…The effect of non-equilibrium point defects on strain relaxation in pseudomorphic Si 0.76Ge 0.24/Si heterostructures was studied by X-ray diffraction (XRD) and…”
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19
Dislocation pattern formation in epitaxial structures based on SiGe alloys
Published in Thin solid films (30-12-1998)“…Single layer SiGe/Si and Si/SiGe heterostructures were grown by the molecular beam epitaxy technique with Si solid and GeH 4 gas sources. Dependence of…”
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Dislocation-related luminescence in Er-implanted silicon
Published in Journal of luminescence (01-12-1998)“…The behavior of luminescence spectra and structural defects in single crystal Czochralski silicon after erbium implantation at 1–1.8 MeV energies and 1×10 13…”
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