Search Results - "Van Nostrand, Joseph E"

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  1. 1

    Selective area deposited blue GaN–InGaN multiple-quantum well light emitting diodes over silicon substrates by Yang, J. W., Lunev, A., Simin, G., Chitnis, A., Shatalov, M., Khan, M. Asif, Van Nostrand, Joseph E., Gaska, R.

    Published in Applied physics letters (17-01-2000)
    “…We report on fabrication and characterization of blue GaN–InGaN multi-quantum well (MQW) light-emitting diodes (LEDs) over (111) silicon substrates. Device…”
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    Journal Article
  2. 2

    Surface morphology during multilayer epitaxial growth of Ge(001) by Van Nostrand JE, Chey, SJ, Hasan, M, Cahill, DG, Greene, JE

    Published in Physical review letters (13-02-1995)
    “…The surface morphology of Ge(001) films grown by molecular beam epitaxy on a Ge(001) substrate is measured using scanning tunneling microscopy. Growth mounds…”
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    Journal Article
  3. 3

    Surface morphology of GaAs(001) grown by solid- and gas-source molecular beam epitaxy by Van Nostrand, Joseph E, Chey, S.Jay, Cahill, David G, Botchkarev, A.E, Morkoç, H

    Published in Surface science (01-02-1996)
    “…Scanning tunneling microscopy is used to characterize the surface of homoepitaxial GaAs(001) films deposited on GaAs(001) substrates miscut 0.2° towards [110]…”
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    Journal Article
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    Surface damage produced by 20 keV Ga bombardment of Ge(001) by Bellon, P., Chey, S.Jay, Van Nostrand, Joseph E., Ghaly, Mai, Cahill, David G., Averback, R.S.

    Published in Surface science (20-09-1995)
    “…Surface damage on Ge(100) due to single 20 keV Ga + ion impacts was investigated by in situ scanning tunneling microscopy (STM). Two types of damage structures…”
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    Journal Article
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    Surface roughness and pattern formation during homoepitaxial growth of Ge(001) at low temperatures by Van Nostrand, Joseph E., Chey, S. Jay, Cahill, David G.

    “…The evolution of surface roughness during growth of Ge(001) by molecular beam epitaxy at 155°C is characterized using in situ scanning tunneling microscopy…”
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    Conference Proceeding