Phosphorus doping of boron carbides
Substitution of an electron donor such as phosphorus for a carbon or boron atom in [ital p]-type semiconducting boron carbides is expected to reduce the hole concentration. Phosphorus-doped boron carbide samples have been prepared by hot isostatic pressing with homogeneous dopant levels of up to one...
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Published in: | Physical review. B, Condensed matter Vol. 48; no. 16; pp. 11759 - 11766 |
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Main Authors: | , , , , , , , , |
Format: | Journal Article |
Language: | English |
Published: |
United States
15-10-1993
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Subjects: | |
Online Access: | Get full text |
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Summary: | Substitution of an electron donor such as phosphorus for a carbon or boron atom in [ital p]-type semiconducting boron carbides is expected to reduce the hole concentration. Phosphorus-doped boron carbide samples have been prepared by hot isostatic pressing with homogeneous dopant levels of up to one phosphorus atom per ten unit cells. Raman spectroscopy and x-ray diffraction confirm the presence of phosphorus within two-atom intericosahedral chains. The high-temperature dc conductivities of doped samples were substantially lower than those of undoped boron carbides. This effect was due to a combination of reduced carrier concentrations and increased hopping activation energies. The low-temperature ac conductivity of doped samples is also smaller than that of undoped samples. However, the number of carriers participating in the ac conduction is a very small fraction ([lt]0.1%) of the total carrier density. |
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Bibliography: | ObjectType-Article-1 SourceType-Scholarly Journals-1 ObjectType-Feature-2 content type line 23 AC04-76DP00789 |
ISSN: | 0163-1829 1095-3795 |
DOI: | 10.1103/PhysRevB.48.11759 |