Phosphorus doping of boron carbides

Substitution of an electron donor such as phosphorus for a carbon or boron atom in [ital p]-type semiconducting boron carbides is expected to reduce the hole concentration. Phosphorus-doped boron carbide samples have been prepared by hot isostatic pressing with homogeneous dopant levels of up to one...

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Bibliographic Details
Published in:Physical review. B, Condensed matter Vol. 48; no. 16; pp. 11759 - 11766
Main Authors: Aselage, TL, Emin, D, Samara, GA, Tallant, DR, Van Deusen SB, Eatough, MO, Tardy, HL, Venturini, EL, Johnson, SM
Format: Journal Article
Language:English
Published: United States 15-10-1993
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Summary:Substitution of an electron donor such as phosphorus for a carbon or boron atom in [ital p]-type semiconducting boron carbides is expected to reduce the hole concentration. Phosphorus-doped boron carbide samples have been prepared by hot isostatic pressing with homogeneous dopant levels of up to one phosphorus atom per ten unit cells. Raman spectroscopy and x-ray diffraction confirm the presence of phosphorus within two-atom intericosahedral chains. The high-temperature dc conductivities of doped samples were substantially lower than those of undoped boron carbides. This effect was due to a combination of reduced carrier concentrations and increased hopping activation energies. The low-temperature ac conductivity of doped samples is also smaller than that of undoped samples. However, the number of carriers participating in the ac conduction is a very small fraction ([lt]0.1%) of the total carrier density.
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content type line 23
AC04-76DP00789
ISSN:0163-1829
1095-3795
DOI:10.1103/PhysRevB.48.11759