Search Results - "VARESI, J. B"
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Fabrication and characterization of two-color midwavelength/long wavelength HgCdTe infrared detectors
Published in Journal of electronic materials (01-06-2006)“…High-performance 20-µm unit-cell two-color detectors using an n-p^sup +^-n HgCdTe triple-layer heterojunction (TLHJ) device architecture grown by molecular…”
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Conference Proceeding Journal Article -
2
Comparing ICP and ECR etching of HgCdTe, CdZnTe, and CdTe
Published in Journal of electronic materials (01-08-2007)“…The surface roughness of inductively coupled plasma (ICP)-etched CdTe is greater than that of electron cyclotron resonance (ECR)-etched CdTe. This greater…”
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Conference Proceeding Journal Article -
3
Infrared vision using uncooled micro-optomechanical camera
Published in Applied physics letters (07-06-1999)“…This letter presents the design, fabrication, and imaging results of an uncooled infrared (IR) camera that contains a focal plane array of bimaterial…”
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Journal Article -
4
Performance of molecular-beam epitaxy-grown midwave infrared HgCdTe detectors on four-inch Si substrates and the impact of defects
Published in Journal of electronic materials (01-07-2003)“…We are continuing development of the growth of midwave infrared (MWIR) HgCdTe by molecular-beam epitaxy (MBE) on 4-in. Si substrates and the fabrication of…”
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Conference Proceeding Journal Article -
5
Fabrication of high-performance large-format MWIR focal plane arrays from MBE-grown HgCdTe on 4 silicon substrates
Published in Journal of electronic materials (01-06-2001)“…We have developed the capability to grow HgCdTe mid-wave infrared radiation double-layer heterojunctions (MWIR DLHJs) on 4″ Si wafers by molecular beam epitaxy…”
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Conference Proceeding Journal Article -
6
HgCdTe/Si materials for long wavelength infrared detectors
Published in Journal of electronic materials (01-06-2004)“…The heteroepitaxial growth of HgCdTe on large-area Si substrates is an enabling technology leading to the production of low-cost, large-format infrared focal…”
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Conference Proceeding Journal Article -
7
A langmuir probe investigation of electron cyclotron resonance argon-hydrogen plasmas
Published in Journal of electronic materials (01-06-2005)“…We report on the physical attributes of an argon-hydrogen plasma and the effects that induced changes in these attributes have on the physical and electrical…”
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Conference Proceeding Journal Article -
8
The effect of electron cyclotron resonance plasma parameters on the aspect ratio of trenches in HgCdTe
Published in Journal of electronic materials (01-07-2003)“…Values of the aspect ratio for trenches etched into HgCdTe by an ECR plasma containing H and Ar are limited by the phenomenon of etch lag. Modeling this plasma…”
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Conference Proceeding Journal Article -
9
Investigation of HgCdTe surface films and their removal
Published in Journal of electronic materials (01-06-2006)“…We have examined the formation and removal of native surface films on Hg^sub 1-x^Cd^sub x^Te (n-type, x = 0.2). Samples were etched with a Br-based solution…”
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Conference Proceeding Journal Article -
10
Inductively coupled plasma etching for large format HgCdTe focal plane array fabrication
Published in Journal of electronic materials (01-06-2005)“…Inductively coupled plasma (ICP) using hydrogen-based gas chemistry has been developed to meet requirements for deep HgCdTe mesa etching and shallow CdTe…”
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Conference Proceeding Journal Article -
11
Physical structure of molecular-beam epitaxy growth defects in HgCdTe and their impact on two-color detector performance
Published in Journal of electronic materials (01-06-2004)“…The flexible nature of molecular-beam epitaxy (MBE) growth is beneficial for HgCdTe infrared-detector design and allows for tailored growths at lower costs and…”
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Conference Proceeding Journal Article -
12
Surface structure of (111)A HgCdTe
Published in Journal of electronic materials (01-06-2006)“…The surface of (111)A HgCdTe has been studied by reflection high-energy electron diffraction and atomic force microscopy (AFM). The as-grown liquid-phase…”
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Conference Proceeding Journal Article -
13
Determination of the ion angular distribution for electron cyclotron resonance, plasma-etched HgCdTe trenches
Published in Journal of electronic materials (01-06-2004)“…Ion angular distribution (IAD) affects the width and aspect ratio in electron cyclotron resonance (ECR)-etched HgCdTe trenches. The IAD was determined by…”
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Conference Proceeding Journal Article -
14
Investigation of HgCdTe surface quality following br-based etching for device fabrication using spectroscopic ellipsometry
Published in Journal of electronic materials (01-06-2005)“…We have examined the etching of HgCdTe (x = 0.2) with bromine/ethylene glycol (Br/EG) solutions. Using a spectroscopic ellipsometer, we tracked the…”
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Conference Proceeding Journal Article -
15
Threading dislocation removal from the near-surface region of epitaxial cadmium telluride on silicon by lithographic patterning of the substrate
Published in Journal of electronic materials (01-09-2005)“…(211) oriented silicon substrates were patterned and etched to give mesas of various sizes and shapes. Cadmium telluride epitaxial layers were deposited on the…”
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Journal Article -
16
Surface structure of plasma-etched (211)B HgCdTe
Published in Journal of electronic materials (01-06-2005)“…The surface of (211)B HgCdTe has been studied by reflection high-energy electron diffraction (RHEED) and atomic force microscopy (AFM). RHEED analysis of the…”
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Conference Proceeding Journal Article -
17
Scalability of dry-etch processing for small unit-cell HgCdTe focal-plane arrays
Published in Journal of electronic materials (01-07-2003)“…A combination of mechanical experiments and fabrication of very-long wavelength ir (VLWIR) HgCdTe-ir detectors has been used to investigate the interaction…”
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Conference Proceeding Journal Article -
18
Macro-loading effects of electron-cyclotron resonance etched II-VI materials
Published in Journal of electronic materials (01-06-2004)“…It has been observed in semiconductor processing that the etch rates for materials subjected to an electron-cyclotron resonance (ECR) plasma change with the…”
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Conference Proceeding Journal Article -
19
Lithography factors that determine the aspect ratio of electron cyclotron resonance plasma etched HgCdTe trenches
Published in Journal of electronic materials (01-07-2003)“…Factors that affect width and aspect ratio in ECR etched HgCdTe trenches are investigated. The ECR etch bias and anisotropy are determined by photoresist…”
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Conference Proceeding Journal Article -
20
Developments in the fabrication and performance of high-quality HgCdTe detectors grown on 4-in. Si substrates
Published in Journal of electronic materials (01-07-2002)“…We are continuing to develop our growth and processing capabilities for HgCdTe grown on 4-in. Si substrates by molecular beam epitaxy (MBE). Both short-wave…”
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Conference Proceeding Journal Article