Search Results - "VALLEE, Christophe"
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Plasma deposition—Impact of ions in plasma enhanced chemical vapor deposition, plasma enhanced atomic layer deposition, and applications to area selective deposition
Published in Journal of vacuum science & technology. A, Vacuum, surfaces, and films (01-05-2020)“…In this paper, the emerging role of ionic species in plasma assisted chemical deposition processes is discussed in detail for commemorating the Career of John…”
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50 Years of Reactive Ion Etching in Microelectronics
Published in IEEE transactions on materials for electron devices (2024)“…In this short review, the evolution of plasma etching technologies used in microelectronics fabrication since the discovery of the reactive ion etching process…”
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Sorbic Acid as a Renewable Resource for Atom-Economic and Selective Production of p‑Toluic Acid and Alkyl‑p‑Toluates: Intermediates to Bioterephthalic Acid and Esters
Published in Industrial & engineering chemistry research (22-07-2015)“…A new pathway for the production of p-toluic acid and alkyl-p-toluates is described here, starting from industrially relevant but underexploited renewable…”
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Study of selective etching of TaN with respect to SiOCH dielectrics using SiF4 plasma processes
Published in Japanese Journal of Applied Physics (04-09-2024)“…TaN is used as a Cu diffusion barrier during metal interconnect formation to enable modern chip fabrication. In this study, the selective removal of TaN with…”
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A new methodology of non-destructive testing in a set of two parallel immersed plates using time reversal process and leaky Lamb waves
Published in NDT & E international : independent nondestructive testing and evaluation (01-07-2024)“…Ultrasound has been identified as a suitable method for inspecting complex structures (such as nuclear reactors), as it can propagate through both liquids and…”
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Innovative Low-Power Self-Nanoconfined Phase-Change Memory
Published in IEEE transactions on electron devices (01-02-2021)“…In this article, we demonstrate at array level and in industrial-like devices, the extreme scaling down to nanometric dimensions of the phase-change memory…”
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FTIR as a simple tool to quantify unconverted lignin from chars in biomass liquefaction process: Application to SC ethanol liquefaction of pine wood
Published in Fuel processing technology (01-06-2015)“…Lignin in solid residues produced from wood liquefaction can be quantified by FTIR analysis. This is applied to investigate pine wood liquefaction in…”
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Controlling the Current Conduction Asymmetry of HfO 2 Metal–Insulator–Metal Diodes by Interposing Al 2 O 3 Layer
Published in IEEE transactions on electron devices (01-01-2019)“…Metal-insulator-metal (MIM) diodes with bulk-limited current conduction asymmetry employing interposed Al 2 O 3 layer in 6-nm-thick HfO 2 film have been…”
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Reaction Intermediates in the Synthesis of New Hydrido, N-Heterocyclic Dicarbene Iridium(III) Pincer Complexes
Published in Organometallics (27-07-2009)“…The reactivity of the potential pincer ligands (1,3-phenylene)bis(1-butylimidazolium) diiodide ( n-Bu(CHimidCHCHimid)I2, 1) and…”
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Atmospheric Plasma-Enhanced Spatial Chemical Vapor Deposition of SiO2 Using Trivinylmethoxysilane and Oxygen Plasma
Published in Chemistry of materials (23-06-2020)“…SiO2 constitutes one of the most widely used dielectric materials in the microelectronics, packaging, and optical industries. Therefore, the development of new…”
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Interface and plasma damage analysis of PEALD TaCN deposited on HfO2 for advanced CMOS studied by angle resolved XPS and C-V
Published in Applied surface science (01-06-2014)“…Plasma enhanced atomic layer deposition (PEALD) TaCN deposited on HfO2 was studied by X-ray photoelectron spectroscopy (XPS) to understand the reactions taking…”
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Wide Band Frequency Characterization of Al-Doped and Undoped Rutile TiO 2 Thin Films for MIM Capacitors
Published in IEEE electron device letters (01-03-2017)“…In this letter, the dielectric properties of rutile TiO2 thin films are studied for metal-insulator-metal capacitor applications. The dielectric constant, the…”
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A Link Between CBRAM Performances and Material Microscopic Properties Based on Electrical Characterization and Atomistic Simulations
Published in IEEE transactions on electron devices (01-11-2017)“…In this paper, we investigate the link between various resistive memory (RRAM) electrical characteristics: endurance, window margin (WM), and retention. For…”
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Edge and Notch Detection in a Plate Using Time Reversal Process of Leaky Lamb Waves
Published in Applied sciences (01-01-2022)“…Leaky Lamb waves are proven effective to carry out nondestructive testing especially on parallel and immersed plates. To detect and localize defects in such a…”
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Durability analysis of the maritime infrastructure for the Monaco Sea extension
Published in Structural concrete : journal of the FIB (01-12-2019)“…The construction of an artificial peninsula extending the Monaco territory is destined to create an urban area of 6 ha. The preliminary works started end 2016,…”
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An unprecedented, figure-of-eight, dinuclear iridium(I) dicarbene and new iridium(III) 'pincer' complexes
Published in Chemical communications (Cambridge, England) (14-09-2008)“…An unusual dinuclear Ir(I) complex bridged by two N-heterocyclic biscarbene ligands, forming a 20-membered, figure-of-eight dimetallacycle, and new CNHCCCNHC…”
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Remarkable Base Effect in the Synthesis of Mono- and Dinuclear Iridium(I) NHC Complexes
Published in Organometallics (27-04-2009)“…Several [(2-R1-1,3-phenylene)bis(methylene)]bis(1-R2-imidazolium) salts, of general formula R2(CHimid ∧CR1 ∧CHimid)X2, have been synthesized by classical…”
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Investigation of the Reactivity of Hydroxyborate Salts with Group IV Metal Complexes: Synthesis and Structural Characterization of the Zirconium and Hafnium Ionic Complexes [PPN]+[Cp2MMe(OB(C6F5)3)]
Published in Organometallics (22-08-2011)“…The syntheses of some novel fluorinated and nonfluorinated hydroxyborate salts, [Q]+[HOB(C6F5)3]− and [Q]+[HOBPh3]− ([Q]+ = aprotic cation), are reported. The…”
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Evaluation of plasma parameters on PEALD deposited TaCN
Published in Microelectronic engineering (01-07-2013)“…[Display omitted] ► Tuning TaCN deposited material from TaN-like to TaC-like was possible using plasma. ► Influence of plasma power on TaCN properties is…”
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