Lithography potentials of UV-nanoimprint

Lithography potentials of UV-nanoimprint

In the past decade nanoimprint has been developed to a serious alternative for next generation lithography (NGL). In this work, the most recent developments of UV-nanoimprint Lithography (UV-NIL) with special emphasis to the work accomplished at AMO and the IHT-RWTH Aachen are reviewed and functiona...

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Bibliographic Details
Published in:Current applied physics pp. 669 - 674
Main Authors: A. Fuchs(Advanced Microelectronic Center Aachen, M. Bender(Advanced Microelectronic Center Aachen, U. Plachetka(Advanced Microelectronic Center Aachen, L. Kock(Advanced Microelectronic Center Aachen, N. Koo(Advanced Microelectronic Center Aachen, T. Wahlbrink(Advanced Microelectronic Center Aachen, H. Kurz(Advanced Microelectronic Center Aachen
Format: Journal Article
Language:Korean
Published: 한국물리학회 01-10-2008
Subjects:
물리학
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Summary:In the past decade nanoimprint has been developed to a serious alternative for next generation lithography (NGL). In this work, the most recent developments of UV-nanoimprint Lithography (UV-NIL) with special emphasis to the work accomplished at AMO and the IHT-RWTH Aachen are reviewed and functional applications demonstrated. Further the potentials of various UV-NIL concepts are evaluated and possible interests in certain application areas are discussed. In the past decade nanoimprint has been developed to a serious alternative for next generation lithography (NGL). In this work, the most recent developments of UV-nanoimprint Lithography (UV-NIL) with special emphasis to the work accomplished at AMO and the IHT-RWTH Aachen are reviewed and functional applications demonstrated. Further the potentials of various UV-NIL concepts are evaluated and possible interests in certain application areas are discussed. KCI Citation Count: 9
Bibliography:G704-001115.2008.8.6.040
ISSN:1567-1739
1878-1675