Search Results - "Treiblmayr, D"

Fully automated hot embossing processes utilizing high resolution working stamps by Glinsner, T., Veres, T., Kreindl, G., Roy, E., Morton, K., Wieser, T., Thanner, C., Treiblmayr, D., Miller, R., Lindner, P.

“…Nanoimprint lithography (NIL) is a fast replication technology for structures with sizes ranging from micrometer down to few nanometers range. This paper…”
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Nanoimprint lithography from CHARPAN Tool exposed master stamps with 12.5 nm hp by MUEHIBERGER, M, BOEHM, M, PLATZGUMMER, E, LOESCHNER, H, JOECHL, P, EDER-KAPI, S, NARZT, T, LAUSECKER, E, FROMHERZ, T, BERGMAIR, I, CHOUIKI, M, SCHOEFTNER, R, KREINDL, G, KAST, M, TREIBLMAYR, D, GLINSNER, T, MILLER, R

“…The use of working stamps for nanoimprint lithography is highly interesting due to a number of reasons. We present results of such a master stamp - working…”
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High accuracy step-and-repeat uv imprint lithography for wafer level camera master manufacturing by Kreindl, G, Glinsner, T, Födisch, R, Treiblmayr, D, Miller, R

“…This work demonstrates unmatched needs for wafer-level camera applications like lateral lens to lens position accuracies of <; ± 200 nm on arbitrary x and y…”
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Nanoimprint lithography from CHARPAN Tool exposed master stamps with 12.5nmhp by Muehlberger, M., Boehm, M., Bergmair, I., Chouiki, M., Schoeftner, R., Kreindl, G., Kast, M., Treiblmayr, D., Glinsner, T., Miller, R., Platzgummer, E., Loeschner, H., Joechl, P., Eder-Kapl, S., Narzt, T., Lausecker, E., Fromherz, T.

“…The use of working stamps for nanoimprint lithography is highly interesting due to a number of reasons. We present results of such a master stamp – working…”
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