Search Results - "Toyota, Eijiro"
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Optical Design of High-Performance Beam Lines for X-Ray Lithography
Published in Japanese Journal of Applied Physics (01-06-1999)“…In this paper is presented an optical design of high-performance beam lines for synchrotron-radiation-based X-ray lithography. The optical system is composed…”
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Journal Article -
2
Dynamic Response of Acoustic Delay Line for Beam Lines of Synchrotron Radiation Lithography System
Published in Japanese Journal of Applied Physics (01-12-1998)“…Protecting against the sudden rupture of a beryllium window foil has been a concern in synchrotron radiation lithography. This paper presents a design study of…”
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Journal Article -
3
Image Formation by Dynamic Exposure with Multispot Beam in X-Ray Nanolithography
Published in Japanese Journal of Applied Physics (2002)Get full text
Journal Article -
4
Thermal Distortion of an X-Ray Mask for Synchrotron Radiation Lithography
Published in Japanese Journal of Applied Physics (01-12-1998)“…A thermal model is developed to calculate the temperature rise in scanning exposure of synchrotron radiation lithography. The maximum temperature rise on a…”
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Journal Article -
5
Design study of compact beam lines for x-ray lithography
Published in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures (01-11-1998)“…This article presents a design study of compact and high-performance beam lines for synchrotron-radiation-based x-ray lithography. The optical system is…”
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Conference Proceeding -
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Extendibility of proximity x-ray lithography to 25 nm and below
Published in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures (01-11-2002)“…Extendibility of proximity x-ray lithography (PXL) relates to three technical issues. They are the minimum proximity gap usable for steppers, the maximum…”
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Conference Proceeding -
7
Technique for 25 nm x-ray nanolithography
Published in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures (01-11-2001)“…The image-forming limit of x-ray lithography is said to be ∼70 nm using existing devices and technologies. This article presents methods to extend the limit to…”
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Conference Proceeding Journal Article -
8
Pattern resolution of an x-ray beamline with a wide exposure field
Published in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures (01-11-1999)“…In an exposure field for x-ray lithography, the beam spectrum is not always the same over the field because of beam path difference, even if the power…”
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Conference Proceeding -
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Performance of a compact beamline with high brightness for x-ray lithography
Published in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures (01-11-2000)“…We have developed a short beamline with high brightness for x-ray lithography. The beamline contains a single, a scanning toroidal mirror and a…”
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Conference Proceeding Journal Article