Search Results - "Toshiaki Makabe, Toshiaki Makabe"

Current status and nature of high-frequency electronegative plasmas: basis for material processing in device manufacturing by Makabe, Toshiaki

“…A non-equilibrium electronegative plasma serves as the reactive source for semiconductor dry processing as an advanced technology. This paper reviews the…”
Get full text

Spatial distribution of nonemissive metastables in a two-frequency capacitively coupled plasma in Ar by using a pair of optical emission lines by Ohba, Tomihito, Makabe, Toshiaki

“…When a pair of short- and long-lived excited molecules are coupled with an upper radiative state, it will be possible to derive the number density of the…”
Get full text

Effect of local gas heating on a plasma structure driven at radio frequency in a microcell in Ar at atmospheric pressure by Yamasaki, Masaki, Yagisawa, Takashi, Makabe, Toshiaki

“…In a microplasma in Ar confined at atmospheric pressure, driven at 13.56 MHz, we theoretically investigate the whole structure of a low-temperature plasma…”
Get full text

Monte Carlo analysis of ionization effects on spatiotemporal electron swarm development by Dujko, Saša, Raspopović, Zoran M., White, Ronald D., Makabe, Toshiaki, Petrović, Zoran Lj

“…The explicit impact of ionization dynamics on the non-hydrodynamic spatiotemporal development of electron swarms in gases under the influence of an electric…”
Get full text

Sustainability of active bulk plasma with high electronegativity in capacitive high frequency plasma by Makabe, Toshiaki

“…In a high-frequency capacitively coupled plasma (HF-CCP), few studies have been carried out for the transport of charged particles in the active bulk plasma…”
Get full text

Increased O ( D 1 ) metastable density in highly Ar-diluted oxygen plasmas by Kitajima, Takeshi, Nakano, Toshiki, Makabe, Toshiaki

“…Enhancement of the growth rate of Si O 2 with a rare gas diluted O 2 plasma is of interest for application to various microelectronics fabrications. The key is…”
Get full text

The effect of topographical local charging on the etching of deep-submicron structures in SiO2 as a function of aspect ratio by Matsui, Jun, Nakano, Nobuhiko, Petrović, Zoran Lj, Makabe, Toshiaki

“…Physical and electrical influences on plasma etching on the inside of a microtrench in SiO2 were numerically investigated using Monte Carlo simulation of ions…”
Get full text

Self-Consistent Modeling of Feature Profile Evolution in Plasma Etching and Deposition by Shimada, Takashi, Yagisawa, Takashi, Makabe, Toshiaki

Get full text

Vertically integrated computer-aided design for device processing by Makabe, Toshiaki, Maeshige, Kazunobu

“…The status of a series of numerical modelings of plasma etching processes is overviewed. Almost all models of low-temperature plasma, which were proposed in…”
Get full text

Drift Velocities of Electrons in Time Varying Electric Fields by Petrović, Svetlan Bzenić, Raspopović, Zoran M., Toshiaki Makabe, Toshiaki Makabe

“…Monte Carlo simulations of electron transport have been performed in methane for time resolved rf fields under conditions where negative differential…”
Get full text

Modeling of Si Etching Under Effects of Plasma Molding in Two-Frequency Capacitively Coupled Plasma in \hbox/\hbox for MEMS Fabrication by Hamaoka, F., Yagisawa, T., Makabe, T.

“…We numerically investigated Si deep etching with several hundreds of micrometers such as that used in microelectromechanical system fabrication. This was…”
Get full text

Time dependent RF swarm transport by direct numerical procedure of the Boltzmann equation by MAEDA, K, MAKABE, T

“…Electron swarm transport in rf fields under spatial homogeneity has been investigated by a direct numerical procedure (DNP) of the Boltzmann equation. The…”
Get full text

A Novel Sustaining Mechanism in Capacitively Coupled Radio Frequency Plasma in Oxygen by Mari Shibata, Mari Shibata, Toshiaki Makabe, Toshiaki Makabe, Nobuhiko Nakano, Nobuhiko Nakano

Get full text

Numerical Study of the Effects of Frequency in Inductively Coupled Plasma Using Particle-in-Cell/Monte Carlo Simulation by Jin-Sung Oh, Jin-Sung Oh, Toshiaki Makabe, Toshiaki Makabe

“…The effects of induction frequency on inductively coupled plasma (ICP) have been investigated in a collision-dominated region in Ar under a constant dissipated…”
Get full text

Two-Dimensional Modeling of Spatiotemporal Structure of Inductively Coupled Plasma by Kazuhiro Kamimura, Kazuhiro Kamimura, Katumi Iyanagi, Katumi Iyanagi, Nobuhiko Nakano, Nobuhiko Nakano, Toshiaki Makabe, Toshiaki Makabe

“…An inductively coupled plasma (ICP) is one of the candidates for a high density, large area and uniform plasma source for use in plasma processing even under…”
Get full text

A Numerical Study of a Collision-Dominated Inductively Coupled Plasma Using Particle-in-Cell/Monte Carlo Simulation by Jin-Sung Oh, Jin-Sung Oh, Toshiaki Makabe, Toshiaki Makabe

“…The deposition of power into electrons and ions in a collision-dominated inductively coupled plasma has been investigated in Ar in a cylindrical reactor wound…”
Get full text

Theoretical analysis of electron velocity distribution functions and transport coefficients in HCl in a DC electric field by SHIMURA, N, MAKABE, T

“…The electron transport parameters in HCl in a DC electric field have been calculated over a wide range of reduced field strength E / N , 1≤ E / N ≤2000 Td…”
Get full text

Numerical simulation of the discharge in d.c. magnetron sputtering by SHIDOJI, E, NAKANO, N, MAKABE, T

“…Numerical simulation of d.c. magnetron discharge for sputtering in Ar is performed using a hybrid model consisting of a particle model and a fluid model. The…”
Get full text

Diagnostics of an inductively coupled CF4/Ar plasma by Hioki, Kazuya, Hirata, Hajime, Matsumura, Shosaku, Petrović, Zoran Lj, Makabe, Toshiaki

“…Experimental data for radiative and metastable state densities in pure argon and in mixture of 5% CF4 in argon are obtained to study the effect of CF4 on…”
Get full text

Dependence of Driving Frequency on Capacitively Coupled Plasma in CF 4 by Sumie Segawa, Sumie Segawa, Masaru Kurihara, Masaru Kurihara, Nobuhiko Nakano, Nobuhiko Nakano, Toshiaki Makabe, Toshiaki Makabe

“…A radio-frequency CF 4 plasma in reactive-ion etcher with parallel plate geometry is investigated in one dimension at a position space using the relaxation…”
Get full text