Search Results - "Toprac, A.J."
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1
Computationally efficient modeling of wafer temperatures in a low-pressure chemical vapor deposition furnace
Published in IEEE transactions on semiconductor manufacturing (01-05-2003)“…A new thermal model is developed to predict wafer temperatures within a hot-wall low pressure chemical vapor deposition furnace based on the furnace wall…”
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Journal Article -
2
A comparison of run-to-run control algorithms
Published in Proceedings of the 2002 American Control Conference (IEEE Cat. No.CH37301) (2002)“…Run-to-run control is the term used for the application of batch process control as practiced in the semiconductor industry. This paper gives a brief…”
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Conference Proceeding