In situ X-ray diffraction study of shock and release dynamics of SiO 2

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Bibliographic Details
Published in:Acta crystallographica. Section A, Foundations and advances Vol. 79; no. a2; p. C216
Main Authors: Appel, K., Schoelmerich, M. O., Gleason, A. E., Tracy, S., Harmand, M., Bolme, C. A., Cunningham, E., Galtier, E., Inubushi, Y., Katagiri, K., K.Miyanishi, Nagler, B., Ozaki, N., Preston, T. R., Redmer, R., Smith, R. F., Tobase, T., Togashi, T., Umeda, Y., Wollenweber, L., Yabuuchi, T., Zastrau, U., Tschentscher, T.
Format: Journal Article
Language:English
Published: 22-08-2023
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Summary:Abstract only
ISSN:2053-2733
2053-2733
DOI:10.1107/S2053273323093956