Search Results - "Tinani, M."

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  1. 1

    Ellipsometry study of the photo-oxidation of poly[(2-methoxy-5-hexyloxy)- p-phenylenevinylene] by Bianchi, R. F., Balogh, D. T., Tinani, M., Faria, R. M., Irene, E. A.

    “…Poly(p‐phenylenevinylene) (PPV) and its derivatives exhibit strong luminescence, being serious candidates to be used as active layers in organic light‐emitting…”
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    Journal Article
  2. 2

    Atomic force microscopy and ellipsometry study of the nucleation and growth mechanism of polycrystalline silicon films on silicon dioxide by Basa, C., Tinani, M., Irene, E. A.

    “…The primary purpose of this research was to elucidate the mechanism of Si nucleation on SiO 2 in a rapid thermal chemical vapor deposition (RTCVD) environment…”
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    Journal Article
  3. 3

    Effects of ion pretreatments on the nucleation of silicon on silicon dioxide by Basa, C., Hu, Y. Z., Tinani, M., Irene, E. A.

    “…Low energy ion pretreatment of silicon dioxide ( SiO 2 ) surfaces results in a reduced incubation time (t inc ) for polycrystalline silicon (poly-Si)…”
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    Journal Article
  4. 4

    In situ real-time studies of nickel silicide phase formation by Tinani, M., Mueller, A., Gao, Y., Irene, E. A., Hu, Y. Z., Tay, S. P.

    “…The formation of NiSi films on Si was studied using Rutherford backscattering spectrometry, atomic force microscopy, and ellipsometry. NiSi is an attractive…”
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