Search Results - "Tien-Sheng Chao"

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  1. 1

    CMOS-Compatible Fabrication of Low-Power Ferroelectric Tunnel Junction for Neural Network Applications by Kuo, Yi-Shan, Lee, Shen-Yang, Lee, Chia-Chin, Li, Shou-Wei, Chao, Tien-Sheng

    Published in IEEE transactions on electron devices (01-02-2021)
    “…A low-cost fabrication process of Hf 1-x Zr x O 2 (HZO) nonvolatile memory (NVM) was proposed and its characteristics were investigated. We successfully…”
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  2. 2

    Junctionless Nanosheet (3 nm) Poly-Si TFT: Electrical Characteristics and Superior Positive Gate Bias Stress Reliability by Lin, Jer-Yi, Kumar, Malkundi Puttaveerappa Vijay, Chao, Tien-Sheng

    Published in IEEE electron device letters (01-01-2018)
    “…In this letter, a junctionless (JL) poly-Si thin-film transistor (TFT) with a 3-nm-thick nanosheet channel is successfully fabricated using the low-temperature…”
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  3. 3

    Fabrication of Vertically Stacked Nanosheet Junctionless Field-Effect Transistors and Applications for the CMOS and CFET Inverters by Sung, Po-Jung, Chang, Shu-Wei, Kao, Kuo-Hsing, Wu, Chien-Ting, Su, Chun-Jung, Cho, Ta-Chun, Hsueh, Fu-Kuo, Lee, Wen-Hsi, Lee, Yao-Jen, Chao, Tien-Sheng

    Published in IEEE transactions on electron devices (01-09-2020)
    “…In this study, conventional CMOS and complementary field-effect transistor (CFET) inverters based on a vertically stacked-nanosheet (NS) structure were…”
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  4. 4

    Reliability of p-Type Pi-Gate Poly-Si Nanowire Channel Junctionless Accumulation-Mode FETs by Hsieh, Dong-Ru, Lin, Kun-Cheng, Lee, Chia-Chin, Chao, Tien-Sheng

    Published in IEEE transactions on electron devices (01-06-2021)
    “…In this study, p-type Pi-gate (PG) poly-Si nanowire channel junctionless accumulation-mode (JAM) field-effect transistors (FETs) were successfully fabricated…”
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  5. 5

    Fabrication of GeSn Nanowire MOSFETs by Utilizing Highly Selective Etching Techniques by Hong, Tzu-Chieh, Lu, Wen-Hsiang, Wang, Yeong-Her, Li, Jiun-Yun, Lee, Yao-Jen, Chao, Tien-Sheng

    Published in IEEE transactions on electron devices (01-04-2023)
    “…Germanium-tin (GeSn) epitaxy layer was prepared on an 8-in SOI wafer with a Ge buffer layer. The etching rates of different solutions for the GeSn layer were…”
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  6. 6

    Gate-All-Around Junctionless Transistors With Heavily Doped Polysilicon Nanowire Channels by Su, Chun-Jung, Tsai, Tzu-I, Liou, Yu-Ling, Lin, Zer-Ming, Lin, Horng-Chih, Chao, Tien-Sheng

    Published in IEEE electron device letters (01-04-2011)
    “…In this letter, we have investigated experimentally, for the first time, the feasibility of gate-all-around polycrystalline silicon (poly-Si) nanowire…”
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  7. 7
  8. 8

    Comprehensive Analysis on Electrical Characteristics of Pi-Gate Poly-Si Junctionless FETs by Hsieh, Dong-Ru, Lin, Jer-Yi, Kuo, Po-Yi, Chao, Tien-Sheng

    Published in IEEE transactions on electron devices (01-07-2017)
    “…In this paper, the electrical characteristics of the Pi-gate junctionless FETs (PG JL FETs) with the in situ n + doped poly-Si (DP-Si) fin-channels have been…”
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  9. 9

    Effect of Seed Layer on Gate-All-Around Poly-Si Nanowire Negative-Capacitance FETs With MFMIS and MFIS Structures: Planar Capacitors to 3-D FETs by Lee, Shen-Yang, Chen, Han-Wei, Shen, Chiuan-Huei, Kuo, Po-Yi, Chung, Chun-Chih, Huang, Yu-En, Chen, Hsin-Yu, Chao, Tien-Sheng

    Published in IEEE transactions on electron devices (01-02-2020)
    “…In this article, we successfully fabricated nanowire (NW) negative capacitance (NC)-related ferroelectric FETs (FE-FETs) with two structures: trigate (TG) and…”
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  10. 10

    High-Performance Pi-Gate Poly-Si Junctionless and Inversion Mode FET by Hsieh, Dong-Ru, Lin, Jer-Yi, Kuo, Po-Yi, Chao, Tien-Sheng

    Published in IEEE transactions on electron devices (01-11-2016)
    “…In this paper, the Pi-gate (PG) poly-Si junction-less (JL) and inversion mode (IM) FETs with a high aspect ratio (A.R. = channel thickness/channel width ~ 3.4)…”
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  11. 11

    Impacts of the Shell Doping Profile on the Electrical Characteristics of Junctionless FETs by Kumar, Malkundi Puttaveerappa Vijay, Chia-Ying Hu, Kuo-Hsing Kao, Yao-Jen Lee, Tien-Sheng Chao

    Published in IEEE transactions on electron devices (01-11-2015)
    “…This paper presents the impacts of an advanced shell doping profile (SDP) on the electrical characteristics of a junctionless (JL) FET in terms of OFF-current,…”
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  12. 12

    Junctionless Poly-Si Nanowire Transistors With Low-Temperature Trimming Process for Monolithic 3-D IC Application by Lin, Jer-Yi, Kuo, Po-Yi, Lin, Ko-Li, Chin, Chun-Chieh, Chao, Tien-Sheng

    Published in IEEE transactions on electron devices (01-12-2016)
    “…In this paper, the junctionless (JL) ultrathin polycrystalline-Si (poly-Si) nanowire (NW) transistors with gate-all-around configuration and raised…”
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  13. 13

    Experimental Demonstration of Stacked Gate- All-Around Poly-Si Nanowires Negative Capacitance FETs With Internal Gate Featuring Seed Layer and Free of Post-Metal Annealing Process by Lee, Shen-Yang, Chen, Han-Wei, Shen, Chiuan-Huei, Kuo, Po-Yi, Chung, Chun-Chih, Huang, Yu-En, Chen, Hsin-Yu, Chao, Tien-Sheng

    Published in IEEE electron device letters (01-11-2019)
    “…For the first time, two-layer stacked nanowire gate-all-around (GAA) negative capacitance (NC) field-effect transistors (FETs) with an ultrasmall poly-Si…”
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  14. 14

    Investigation of Two Bits With Multistate Antifuse on nMOS Poly-Silicon Junctionless GAA OTP by Chang, Chen-Feng, Shen, Chiuan-Huei, Hsieh, Dong-Ru, Lu, Zong-Han, Lin, Cheng-Chen, Chao, Tien-Sheng

    Published in IEEE transactions on electron devices (01-12-2021)
    “…One-time programmable (OTP) memory is essential to the security and gaming industries because of its "write once, read many" capability. This device supports…”
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  16. 16

    Characteristics of Poly-Si Junctionless FinFETs With HfZrO Using Forming Gas Annealing by Chung, Sheng-Ti, Lee, Yao-Jen, Chao, Tien-Sheng

    “…In this study, an effective method was proposed to enhance the current drivability of junctionless field-effect transistors (JL-FETs) by utilizing…”
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  17. 17

    High-Performance GAA Sidewall-Damascened Sub-10-nm In Situ n+-Doped Poly-Si NWs Channels Junctionless FETs by Kuo, Po-Yi, Lu, Yi-Hsien, Chao, Tien-Sheng

    Published in IEEE transactions on electron devices (01-11-2014)
    “…The gate-all-around sidewall-damascened sub10-nm in situ n + -doped poly-Si nanowires channels junctionless FETs (GAA SWDNW-JLFETs) with one NW of sub-50-nm 2…”
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  18. 18

    Improving the Electrical Performance of a Quantum Well FET With a Shell Doping Profile by Heterojunction Optimization by Kumar, Malkundi Puttaveerappa Vijay, Chia-Ying Hu, Walke, Amey Mahadev, Kuo-Hsing Kao, Tien-Sheng Chao

    Published in IEEE transactions on electron devices (01-09-2017)
    “…This paper investigates the impacts of typical semiconductor material properties-electron affinity, bandgap, and dielectric constant, on the electrical…”
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  19. 19

    A Harmonic Radar Tag with High Detection Range Utilizing Ge FinFETs CMOS Technology by Hsieh, Cheng-Hung, Hong, Tzu-Chieh, Yang, Chiung-Yi, Chen, Yi-Ho, Yu, Xin-Ren, Lu, Wen-Hsiang, Chuang, Ricky W., Tsai, Zuo-Min, Lee, Yao-Jen, Li, YiMing, Wu, Wen-Fa, Chao, Tien-Sheng, Samukawa, Seiji, Wang, Yeong-Her, Yeh, Wen-Kuan, Tarng, Jenn-Hwan

    Published in IEEE electron device letters (01-11-2022)
    “…This study fabricated and verified a germanium (Ge) fin field-effect transistor (FinFET) on developed GeSOI platform. The Ge FinFETs were demonstrated for…”
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  20. 20

    Low-Temperature Microwave Annealing Processes for Future IC Fabrication-A Review by Lee, Yao-Jen, Cho, Ta-Chun, Chuang, Shang-Shiun, Hsueh, Fu-Kuo, Lu, Yu-Lun, Sung, Po-Jung, Chen, Hsiu-Chih, Current, Michael I., Tseng, Tseung-Yuen, Chao, Tien-Sheng, Hu, Chenming, Yang, Fu-Liang

    Published in IEEE transactions on electron devices (01-03-2014)
    “…Microwave annealing (MWA) and rapid thermal annealing (RTA) of dopants in implanted Si are compared in their abilities to produce very shallow and highly…”
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