Search Results - "Tekcan, Burak"
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1
Tapered InP nanowire arrays for efficient broadband high-speed single-photon detection
Published in Nature nanotechnology (01-05-2019)“…Superconducting nanowire single-photon detectors with peak efficiencies above 90% and unrivalled timing jitter (<30 ps) have emerged as a potent technology for…”
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Journal Article -
2
Semiconductor nanowire metamaterial for broadband near-unity absorption
Published in Scientific reports (11-06-2022)“…The realization of a semiconductor near-unity absorber in the infrared will provide new capabilities to transform applications in sensing, health, imaging, and…”
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Journal Article -
3
Atomic layer deposited HfO2 based metal insulator semiconductor GaN ultraviolet photodetectors
Published in Current applied physics (01-12-2014)“…A report on GaN based metal insulator semiconductor (MIS) ultraviolet (UV) photodetectors (PDs) with atomic layer deposited (ALD) 5-nm-thick HfO2 insulating…”
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Journal Article -
4
Performance enhancement of GaN metal–semiconductor–metal ultraviolet photodetectors by insertion of ultrathin interfacial HfO2 layer
Published in Journal of vacuum science & technology. A, Vacuum, surfaces, and films (01-03-2015)“…The authors demonstrate improved device performance of GaN metal–semiconductor–metal ultraviolet (UV) photodetectors (PDs) by ultrathin HfO2 (UT-HfO2) layer on…”
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Journal Article -
5
A Near-Infrared Range Photodetector Based on Indium Nitride Nanocrystals Obtained Through Laser Ablation
Published in IEEE electron device letters (01-09-2014)“…We present a proof-of-concept photodetector that is sensitive in the near-infrared (NIR) range based on InN nanocrystals. Indium nitride nanocrystals (InN-NCs)…”
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Journal Article -
6
Performance enhancement of GaN metal–semiconductor–metal ultraviolet photodetectors by insertion of ultrathin interfacial HfO{sub 2} layer
Published in Journal of vacuum science & technology. A, Vacuum, surfaces, and films (15-03-2015)“…The authors demonstrate improved device performance of GaN metal–semiconductor–metal ultraviolet (UV) photodetectors (PDs) by ultrathin HfO{sub 2} (UT-HfO{sub…”
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Journal Article -
7
Atomic layer deposited HfO sub(2) based metal insulator semiconductor GaN ultraviolet photodetectors
Published in Current applied physics (01-12-2014)“…A report on GaN based metal insulator semiconductor (MIS) ultraviolet (UV) photodetectors (PDs) with atomic layer deposited (ALD) 5-nm-thick HfO sub(2)…”
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Journal Article -
8
Memory effect by charging of ultra-small 2-nm laser-synthesized solution processable Si-nanoparticles embedded in Si-Al2O3-SiO2 structure
Published in Physica status solidi. A, Applications and materials science (01-08-2015)“…A memory structure containing ultra‐small 2‐nm laser‐synthesized silicon nanoparticles is demonstrated. The Si‐nanoparticles are embedded between an atomic…”
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Journal Article -
9
Memory effect by charging of ultra‐small 2‐nm laser‐synthesized solution processable Si‐nanoparticles embedded in Si–Al 2 O 3 –SiO 2 structure [Phys. Status Solidi A 212 , 1751–1755 (2015)]
Published in Physica status solidi. A, Applications and materials science (01-08-2016)Get full text
Journal Article -
10
Memory effect by charging of ultra-small 2-nm laser-synthesized solution processable Si-nanoparticles embedded in Si-Al2O3-SiO2 structure [Phys. Status Solidi A 212, 1751-1755 (2015)]
Published in Physica status solidi. A, Applications and materials science (01-08-2016)Get full text
Journal Article -
11
Memory effect by charging of ultra-small 2-nm laser-synthesized solution processable Si-nanoparticles embedded in Si-Al sub(2)O sub(3)-SiO sub(2) structure
Published in Physica status solidi. A, Applications and materials science (01-08-2015)“…A memory structure containing ultra-small 2-nm laser-synthesized silicon nanoparticles is demonstrated. The Si-nanoparticles are embedded between an atomic…”
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Journal Article -
12
Memory effect by charging of ultra-small 2-nm laser-synthesized solution processable Si-nanoparticles embedded in Si-Al 2 O 3 -SiO 2 structure: Si-nanoparticles embedded in Si-Al 2 O 3 -SiO 2
Published in Physica status solidi. A, Applications and materials science (01-08-2015)Get full text
Journal Article -
13
Using nanogap in label-free impedance based electrical biosensors to overcome electrical double layer effect
Published in Microsystem technologies : sensors, actuators, systems integration (01-04-2017)“…Point-of-care biosensor applications require low-cost and low-power solutions. They offer being easily accessible at home site. They are usable without any…”
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Journal Article -
14
Electronic and optical device applications of hollow cathode plasma assisted atomic layer deposition based GaN thin films
Published in Journal of vacuum science & technology. A, Vacuum, surfaces, and films (01-01-2015)“…Electronic and optoelectronic devices, namely, thin film transistors (TFTs) and metal–semiconductor–metal (MSM) photodetectors, based on GaN films grown by…”
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Journal Article -
15
Investigation of Photodetectors Based on Iii-Nitride and Metal Oxide Thin Films Deposited by Atomic Layer Deposition
Published 01-01-2015“…Gallium Nitride (GaN), one of the most attractive optoelectronic materials today with a direct wide band gap of 3.4eV and high electron saturation velocity of,…”
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Dissertation -
16
Semiconductor nanowire metamaterial for broadband near-unity absorption
Published 28-02-2022“…Sci Rep 12, 9663 (2022) The realization of a semiconductor near-unity absorber in the infrared will provide new capabilities to transform applications in…”
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Journal Article -
17
Low temperature ALD grown ZnO as emitter and TCO for a thin-film a-Si PIN solar cells
Published in 2015 IEEE 42nd Photovoltaic Specialist Conference (PVSC) (01-06-2015)“…The use of low temperature ALD grown ZnO as emitter and TCO coating for a-Si PIN solar cells is studied. Several cells are fabricated with 30nm ALD ZnO on top…”
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Conference Proceeding -
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Hollow-cathode plasma-assisted atomic layer deposition: A novel route for low-temperature synthesis of crystalline III-nitride thin films and nanostructures
Published in 2015 IEEE 35th International Conference on Electronics and Nanotechnology (ELNANO) (01-04-2015)“…Hollow cathode plasma-assisted atomic layer deposition is a promising technique for obtaining III-nitride thin films with low impurity concentrations at low…”
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Conference Proceeding