Search Results - "Tawa, Tsutomu"

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    Evaluation of gripping sensor using polyurethane with high photoelastic constant by Takarada, Jun, Mitsuzuka, Masahiko, Sugino, Yo, Mori, Tatsuya, Kinbara, Yuho, Kageoka, Masakazu, Tawa, Tsutomu, Kawamura, Sadao, Tajitsu, Yoshiro

    Published in Japanese Journal of Applied Physics (01-11-2021)
    “…In this study, the measurement of the gripping force on an object using a photoelastic polyurethane sensor is reported. A small amount of force (0.1–10 N) is…”
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    Journal Article
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    Evaluation of pupil-filtering in high-numerical aperture I-line lens by FUKUDA, H, KOBAYASHI, Y, HAMA, K, TAWA, T, OKAZAKI, S

    Published in Japanese Journal of Applied Physics (01-12-1993)
    “…The pupil-filtering lens system for optical lithography experimentally evaluated in this study is based on an i-line stepper lens with a numerical aperture…”
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    Conference Proceeding Journal Article
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    Improved alignment accuracy using lens-distortion correction for electron-beam lithography in mix-and-match with an optical stepper by GOTOH, Y, NAKAYAMA, Y, MATSUZAKA, T, SAITOU, N, HOJYO, Y, KAWAHARA, T, TAWA, T

    Published in Japanese Journal of Applied Physics (01-12-1997)
    “…The mix-and-match use of an electron-beam (EB) lithography system and an optical stepper is an effective approach to achieving higher resolution while…”
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    Conference Proceeding Journal Article
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    The effect of condenser tilt on optical projection lithography by TERASAWA, T, HAMA, K, TAWA, T, KATAGIRI, S

    Published in Japanese Journal of Applied Physics (01-06-1991)
    “…A basic study on the imaging characteristics of wafer steppers influenced by a condenser tilt is presented. The effects of condenser tilt are explored by…”
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    Journal Article
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    Preparation and reactions of hydrophilic isocyanate micelles dispersed in water by TAWA, Tsutomu, ITO, Shinzaburo

    Published in Colloid and polymer science (01-04-2005)
    “…We investigated the abnormal reaction behavior of NCO units in micellar hydrophilic isocyanate in water through titration, particle size, FT-IR spectroscopy…”
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    Journal Article
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    Pattern dependent alignment technique for mix-and-match electron-beam lithography with optical lithography by Gotoh, Yasuko, Sohda, Yasunari, Saitou, Norio, Tawa, Tsutomu, Matsuzaka, Takashi, Asai, Naoko, Hayano, Katsuya, Hasegawa, Norio

    “…An alignment technique for electron-beam (EB) lithography that corrects the writing pattern to match the pattern-dependent lens distortion of an optical…”
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    Conference Proceeding