Search Results - "Tawa, Tsutomu"
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Relationship between Photoelasticity of Polyurethane and Dielectric Anisotropy of Diisocyanate, and Application of High-Photoelasticity Polyurethane to Tactile Sensor for Robot Hands
Published in Polymers (31-12-2020)“…Eight types of polyurethane were synthesized using seven types of diisocyanate. It was found that the elasto-optical constant depends on the concentration of…”
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The Role of Hard Segments of Aqueous Polyurethane-urea Dispersion in Determining the Colloidal Characteristics and Physical Properties
Published in Polymer journal (01-01-2006)Get full text
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Evaluation of gripping sensor using polyurethane with high photoelastic constant
Published in Japanese Journal of Applied Physics (01-11-2021)“…In this study, the measurement of the gripping force on an object using a photoelastic polyurethane sensor is reported. A small amount of force (0.1–10 N) is…”
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Evaluation of pupil-filtering in high-numerical aperture I-line lens
Published in Japanese Journal of Applied Physics (01-12-1993)“…The pupil-filtering lens system for optical lithography experimentally evaluated in this study is based on an i-line stepper lens with a numerical aperture…”
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Conference Proceeding Journal Article -
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Improved alignment accuracy using lens-distortion correction for electron-beam lithography in mix-and-match with an optical stepper
Published in Japanese Journal of Applied Physics (01-12-1997)“…The mix-and-match use of an electron-beam (EB) lithography system and an optical stepper is an effective approach to achieving higher resolution while…”
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Conference Proceeding Journal Article -
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The effect of condenser tilt on optical projection lithography
Published in Japanese Journal of Applied Physics (01-06-1991)“…A basic study on the imaging characteristics of wafer steppers influenced by a condenser tilt is presented. The effects of condenser tilt are explored by…”
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Preparation and reactions of hydrophilic isocyanate micelles dispersed in water
Published in Colloid and polymer science (01-04-2005)“…We investigated the abnormal reaction behavior of NCO units in micellar hydrophilic isocyanate in water through titration, particle size, FT-IR spectroscopy…”
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Pattern dependent alignment technique for mix-and-match electron-beam lithography with optical lithography
Published in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures (01-11-1998)“…An alignment technique for electron-beam (EB) lithography that corrects the writing pattern to match the pattern-dependent lens distortion of an optical…”
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Conference Proceeding