Search Results - "Tamamura, Toshiaki"

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  1. 1

    Highly ordered nanochannel-array architecture in anodic alumina by Masuda, Hideki, Yamada, Haruki, Satoh, Masahiro, Asoh, Hidetaka, Nakao, Masashi, Tamamura, Toshiaki

    Published in Applied physics letters (10-11-1997)
    “…The development of the ordered channel array in the anodic porous alumina was initiated by the textured pattern of the surface made by the molding process, and…”
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    Journal Article
  2. 2

    Self-collimating phenomena in photonic crystals by Kosaka, Hideo, Kawashima, Takayuki, Tomita, Akihisa, Notomi, Masaya, Tamamura, Toshiaki, Sato, Takashi, Kawakami, Shojiro

    Published in Applied physics letters (01-03-1999)
    “…We found that self-determining collimated light is generated in a photonic crystal fabricated on silicon. The divergence of the collimated beam is insensitive…”
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    Journal Article
  3. 3

    Photonic crystals for micro lightwave circuits using wavelength-dependent angular beam steering by Kosaka, Hideo, Kawashima, Takayuki, Tomita, Akihisa, Notomi, Masaya, Tamamura, Toshiaki, Sato, Takashi, Kawakami, Shojiro

    Published in Applied physics letters (08-03-1999)
    “…Light-beam steering that is extremely wavelength dependent has been demonstrated by using photonic crystals fabricated on Si. The scanning span reached 50°…”
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    Journal Article
  4. 4

    Self-organized growth of strained InGaAs quantum disks by Nötzel, Richard, Temmyo, Jiro, Tamamura, Toshiaki

    Published in Nature (London) (12-05-1994)
    “…The self-organized formation of box-like microstructures during the interrupted epitaxial growth of strained InGaAs/AlGaAs multilayer structures on (311)B…”
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    Journal Article
  5. 5

    Self-repair of ordered pattern of nanometer dimensions based on self-compensation properties of anodic porous alumina by Masuda, Hideki, Yotsuya, Masato, Asano, Mari, Nishio, Kazuyuki, Nakao, Masashi, Yokoo, Atsushi, Tamamura, Toshiaki

    Published in Applied physics letters (05-02-2001)
    “…The self-repair of an ordered pattern of nanometer dimensions based on the self-compensation properties of anodic porous alumina is demonstrated. In a…”
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    Journal Article
  6. 6

    Photonic Crystal Using Anodic Porous Alumina by Masuda, Hideki, Ohya, Masayuki, Asoh, Hidetaka, Nakao, Masashi, Nohtomi, Masaya, Tamamura, Toshiaki

    Published in Japanese Journal of Applied Physics (01-12-1999)
    “…Two-dimensional (2D) photonic crystals in the visible wavelength region were fabricated using anodic porous alumina with a highly ordered hole array…”
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    Journal Article
  7. 7

    Quantum Wire Fabrication by E-Beam Elithography Using High-Resolution and High-Sensitivity E-Beam Resist ZEP-520 by Nishida, Toshio, Notomi, Masaya, Ryuzo Iga, Ryuzo Iga, Toshiaki Tamamura, Toshiaki Tamamura

    Published in Japanese Journal of Applied Physics (01-12-1992)
    “…We have evaluated the resolution of the positive electron-beam (E-beam) resist ZEP-520 using finely focused E-beam exposure for the application of quantum wire…”
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    Journal Article
  8. 8
  9. 9

    GaAs and InP Nanohole Arrays Fabricated by Reactive Beam Etching Using Highly Ordered Alumina Membranes by Nakao, Masashi, Oku, Satoshi, Tamamura, Toshiaki, Yasui, Kenshi, Masuda, Hideki

    Published in Japanese Journal of Applied Physics (01-02-1999)
    “…Highly ordered anodic porous alumina was used as a mask for a reactive beam etching (RBE) to transform the nanochannel pattern into III-V semiconductors. The…”
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    Journal Article
  10. 10

    Photonic Band Gap in Anodic Porous Alumina with Extremely High Aspect Ratio Formed in Phosphoric Acid Solution by Masuda, Hideki, Ohya, Masayuki, Nishio, Kazuyuki, Asoh, Hidetaka, Nakao, Masashi, Nohtomi, Masaya, Yokoo, Atsushi, Tamamura, Toshiaki

    Published in Japanese Journal of Applied Physics (15-10-2000)
    “…Two-dimensional (2D) photonic crystals were fabricated using anodic porous alumina with a highly ordered air-hole array of triangular lattice with a high…”
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    Journal Article
  11. 11

    Ideally Ordered Anodic Porous Alumina Mask Prepared by Imprinting of Vacuum-Evaporated Al on Si by Masuda, Hideki, Yasui, Kenji, Sakamoto, Yasuhisa, Nakao, Masashi, Tamamura, Toshiaki, Nishio, Kazuyuki

    Published in Japanese Journal of Applied Physics (15-11-2001)
    “…Application of imprinting of vacuum-evaporated Al on a Si substrate using an SiC mold with an ordered array of hexagonally arranged convexes and subsequent…”
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    Journal Article
  12. 12

    Semiconductor nanostructures formed by the Turing instability by Temmyo, Jiro, Nötzel, Richard, Tamamura, Toshiaki

    Published in Applied physics letters (25-08-1997)
    “…We describe the surface topography domain in a strained InGaAs/AlGaAs system on the GaAs (311)B substrate during metalorganic-vapor-phase-epitaxial growth. The…”
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    Journal Article
  13. 13

    High-aspect-ratio nanometer-pattern fabrication using fullerene-incorporated nanocomposite resists for dry-etching application by SHIBATA, T, ISHII, T, NOZAWA, H, TAMAMURA, T

    Published in Japanese Journal of Applied Physics (01-12-1997)
    “…This paper presents the improved performance of a nanocomposite resist system that incorporates an unseparated mixture of fullerenes C 60 and C 70 into ZEP520,…”
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    Conference Proceeding Journal Article
  14. 14

    Nanocomposite resist system by Ishii, Tetsuyoshi, Nozawa, Hiroshi, Tamamura, Toshiaki

    Published in Applied physics letters (03-03-1997)
    “…We propose a nanocomposite resist system that incorporates sub-nm carbon particles into a resist film to enable an ultrathin film resist process for nanometer…”
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    Journal Article
  15. 15

    Atomic force microscopy study of strained InGaAs quantum disks self-organizing on GaAs ( n 11)B substrates by Nötzel, Richard, Fukui, Takashi, Hasegawa, Hideki, Temmyo, Jiro, Tamamura, Toshiaki

    Published in Applied physics letters (28-11-1994)
    “…Strained quantum-box structures are naturally formed during the interrupted growth of AlGaAs and InGaAs films on GaAs (n11)B substrates. InGaAs films organize…”
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    Journal Article
  16. 16

    Self-organization of boxlike microstructures on GaAs (311)B surfaces by metalorganic vapor-phase epitaxy by NÖTZEL, R, TEMMYO, J, TAMAMURA, T

    “…We have found new self-organizing phenomena in metalorganic vapor-phase epitaxy of strained InGaAs/AlGaAs heterostructures on GaAs (311)B substrates. During…”
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    Journal Article
  17. 17

    Tunability of one-dimensional self-faceting on GaAs (311)A surfaces by metalorganic vapor-phase epitaxy by Nötzel, Richard, Temmyo, Jiro, Tamamura, Toshiaki

    Published in Applied physics letters (27-06-1994)
    “…The controlled step bunching on GaAs (311)A oriented surfaces during growth by metalorganic vapor-phase epitaxy (MOVPE) leads to one-dimensional faceting with…”
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    Journal Article
  18. 18

    Strong photoluminescence emission at room temperature of strained InGaAs quantum disks (200–30 nm diameter) self-organized on GaAs (311)B substrates by Nötzel, Richard, Temmyo, Jiro, Kamada, Hidehiko, Furuta, Tomofumi, Tamamura, Toshiaki

    Published in Applied physics letters (25-07-1994)
    “…We have recently found that quantum-box-like structures are formed during spontaneous reorganization of a sequence of AlGaAs and strained InGaAs epitaxial…”
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    Journal Article
  19. 19

    Self-organization of strained GaInAs microstructures on InP (311) substrates grown by metalorganic vapor-phase epitaxy by Nötzel, Richard, Temmyo, Jiro, Kozen, Atsuo, Tamamura, Toshiaki, Fukui, Takashi, Hasegawa, Hideki

    Published in Applied physics letters (08-05-1995)
    “…The evolution of low-dimensional microstructures in the growth of strained GaInAs/AlInAs and GaInAs/InP heterostructures on planar InP (311)B and (311)A…”
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    Journal Article
  20. 20

    Fullerene-Derivative Nanocomposite Resist for Nanometer Pattern Fabrication by Ishii, Tetsuyoshi, Tamamura, Toshiaki, Shigehara, Kiyotaka

    Published in Japanese Journal of Applied Physics (15-10-2000)
    “…A nanocomposite resist system that incorporates a fullerene derivative into a conventional positive-type electron-beam resist, ZEP520, is examined. Because of…”
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    Journal Article