Search Results - "Takao, Yoshinori"

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  1. 1

    Modifications of plasma density profile and thrust by neutral injection in a helicon plasma thruster by Takahashi, Kazunori, Takao, Yoshinori, Ando, Akira

    Published in Applied physics letters (07-11-2016)
    “…Argon propellant is introduced from the upstream and downstream sides of a high power helicon plasma thruster. The plasma density profile and the imparted…”
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    Journal Article
  2. 2

    Neutral-depletion-induced axially asymmetric density in a helicon source and imparted thrust by Takahashi, Kazunori, Takao, Yoshinori, Ando, Akira

    Published in Applied physics letters (15-02-2016)
    “…The high plasma density downstream of the source is observed to be sustained only for a few hundreds of microsecond at the initial phase of the discharge, when…”
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    Journal Article
  3. 3

    Thrust imparted by a stepped-diameter magnetic nozzle rf plasma thruster by Takahashi, Kazunori, Takao, Yoshinori, Ando, Akira

    Published in Applied physics letters (16-07-2018)
    “…A stepped-diameter source tube is employed on a magnetic nozzle radiofrequency plasma thruster, where the magnetic field lines intersecting the wall near the…”
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    Journal Article
  4. 4

    High-performance planar-type electron source based on a graphene-oxide-semiconductor structure by Murakami, Katsuhisa, Miyaji, Joji, Furuya, Ryo, Adachi, Manabu, Nagao, Masayoshi, Neo, Yoichiro, Takao, Yoshinori, Yamada, Yoichi, Sasaki, Masahiro, Mimura, Hidenori

    Published in Applied physics letters (27-05-2019)
    “…A graphene-oxide-semiconductor (GOS) planar-type electron source was fabricated by direct synthesis of graphene on an oxide layer via low-pressure chemical…”
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    Journal Article
  5. 5

    Low-power-consumption, high-current-density, and propellantless cathode using graphene-oxide-semiconductor structure array by Furuya, Ryo, Takao, Yoshinori, Nagao, Masayoshi, Murakami, Katsuhisa

    Published in Acta astronautica (01-09-2020)
    “…Graphene-oxide-semiconductor (GOS) planar-type electron sources—which consist of a graphene electrode layer, a thin SiO2 insulator, and a Si substrate—can be…”
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    Journal Article
  6. 6

    Uniform needle-emitter arrays for ionic liquid electrospray thrusters with precise thrust control by Tachibana, Fumiya, Tsuchiya, Toshiyuki, Takao, Yoshinori

    Published in Japanese Journal of Applied Physics (01-06-2021)
    “…Abstract The development of ionic liquid electrospray thrusters with highly precise needle-emitter arrays is reported. Micro-electro-mechanical systems process…”
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    Journal Article
  7. 7

    Microfabricated emitter array for an ionic liquid electrospray thruster by Nakagawa, Kaito, Tsuchiya, Toshiyuki, Takao, Yoshinori

    Published in Japanese Journal of Applied Physics (01-06-2017)
    “…We have fabricated needle-shaped emitters on a Si wafer by a MEMS process, and measured the voltage-current characteristics and the frequency dependence of a…”
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    Journal Article
  8. 8

    Oxidation Resistance Improvement of Graphene-Oxide-Semiconductor Planar-Type Electron Sources Using h‑BN as an Oxygen-Resistant, Electron-Transmissive Coating by Matsumoto, Naoyuki, Takao, Yoshinori, Nagao, Masayoshi, Murakami, Katsuhisa

    Published in ACS omega (20-09-2022)
    “…Graphene–oxide–semiconductor (GOS) planar-type electron emission devices with a hexagonal boron nitride (h-BN) protective layer have demonstrated improved…”
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    Journal Article
  9. 9

    Surface smoothing during plasma etching of Si in Cl2 by Nakazaki, Nobuya, Matsumoto, Haruka, Tsuda, Hirotaka, Takao, Yoshinori, Eriguchi, Koji, Ono, Kouichi

    Published in Applied physics letters (14-11-2016)
    “…Effects of initial roughness on the evolution of plasma-induced surface roughness have been investigated during Si etching in inductively coupled Cl2 plasmas,…”
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    Journal Article
  10. 10

    Development of a momentum vector measurement instrument in steady-state plasmas by Takahashi, Kazunori, Sugawara, Takeharu, Akahoshi, Hikaru, Takao, Yoshinori, Ando, Akira

    Published in AIP advances (01-10-2018)
    “…Momentum vector measurement instrument yielding individual and simultaneous identification of local fluxes of momentum components in two different directions,…”
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    Journal Article
  11. 11
  12. 12

    Fabrication of nano-capillary emitter arrays for ionic liquid electrospray thrusters by Suzuki, Kanta, Nagao, Masayoshi, Liu, Yongxun, Murakami, Katsuhisa, Khumpuang, Sommawan, Hara, Shiro, Takao, Yoshinori

    Published in Japanese Journal of Applied Physics (01-06-2021)
    “…Abstract In this study, we fabricated nano-capillary emitter arrays for stable ion emission of ionic liquid electrospray thrusters, employing the fabrication…”
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    Journal Article
  13. 13

    Effects of straggling of incident ions on plasma-induced damage creation in "fin"-type field-effect transistors by Eriguchi, Koji, Matsuda, Asahiko, Takao, Yoshinori, Ono, Kouichi

    Published in Japanese Journal of Applied Physics (01-03-2014)
    “…We investigated the plasma-induced physical damage (PPD) mechanism in a field-effect transistor (FET) with a fin-type channel, called FinFET. Compared to PPD…”
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    Journal Article
  14. 14

    Vector Resolved Energy Fluxes and Collisional Energy Losses in Magnetic Nozzle Radiofrequency Plasma Thrusters by Emoto, Kazuma, Takahashi, Kazunori, Takao, Yoshinori

    Published in Frontiers in physics (10-12-2021)
    “…Energy losses in a magnetic nozzle radiofrequency plasma thruster are investigated to improve the thruster efficiency and are calculated from particle energy…”
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    Journal Article
  15. 15

    Fabrication of a high-density emitter array for electrospray thrusters using field emitter array process by Inoue, Naoki, Nagao, Masayoshi, Murakami, Katsuhisa, Khumpuang, Sommawan, Hara, Shiro, Takao, Yoshinori

    Published in Japanese Journal of Applied Physics (01-06-2019)
    “…To improve the thrust density of electrospray thrusters using ionic liquids as the propellant, we have fabricated a high-density emitter array utilizing the…”
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    Journal Article
  16. 16

    Modeling of ion-bombardment damage on Si surfaces for in-line analysis by Matsuda, Asahiko, Nakakubo, Yoshinori, Takao, Yoshinori, Eriguchi, Koji, Ono, Kouichi

    Published in Thin solid films (30-04-2010)
    “…Structures and mechanism of ion-bombardment damage on silicon wafers exposed to plasma were investigated comprehensively. By using molecular dynamics…”
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    Journal Article Conference Proceeding
  17. 17

    Evaluation technique for plasma-induced SiOC dielectric damage by capacitance-voltage hysteresis monitoring by Nishida, Kentaro, Okada, Yukimasa, Takao, Yoshinori, Eriguchi, Koji, Ono, Kouichi

    Published in Japanese Journal of Applied Physics (01-06-2016)
    “…We propose an electrical method, named capacitance-voltage (C-V) monitoring, for quantifying plasma-induced damage (PID) to interlayer dielectrics. By this…”
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    Journal Article
  18. 18

    Molecular dynamics simulations of silicon chloride ion incidence during Si etching in Cl-based plasmas by Nakazaki, Nobuya, Takao, Yoshinori, Eriguchi, Koji, Ono, Kouichi

    Published in Japanese Journal of Applied Physics (01-05-2014)
    “…Classical molecular dynamics (MD) simulations have been performed for SiClx+ (x = 0-4) ions incident on Si(100) surfaces, using an improved Stillinger-Weber…”
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    Journal Article
  19. 19

    Mechanism of Highly Efficient Electron Emission from a Graphene/Oxide/Semiconductor Structure by Murakami, Katsuhisa, Adachi, Manabu, Miyaji, Joji, Furuya, Ryo, Nagao, Masayoshi, Yamada, Yoichi, Neo, Yoichiro, Takao, Yoshinori, Sasaki, Masahiro, Mimura, Hidenori

    Published in ACS applied electronic materials (28-07-2020)
    “…Highly efficient electron emission of 48.5% was demonstrated by a graphene/oxide/semiconductor (GOS) structure. The main factors contributing to this…”
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    Journal Article
  20. 20

    Modeling and Simulation of Nanoscale Surface Rippling during Plasma Etching of Si under Oblique Ion Incidence by Tsuda, Hirotaka, Takao, Yoshinori, Eriguchi, Koji, Ono, Kouichi

    Published in Japanese Journal of Applied Physics (01-08-2012)
    “…A three-dimensional atomic-scale cellular model (ASCeM-3D) has been developed to reproduce the evolution of feature profiles on atomic or nanometer scale…”
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    Journal Article