Search Results - "Takao, Yoshinori"
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Modifications of plasma density profile and thrust by neutral injection in a helicon plasma thruster
Published in Applied physics letters (07-11-2016)“…Argon propellant is introduced from the upstream and downstream sides of a high power helicon plasma thruster. The plasma density profile and the imparted…”
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2
Neutral-depletion-induced axially asymmetric density in a helicon source and imparted thrust
Published in Applied physics letters (15-02-2016)“…The high plasma density downstream of the source is observed to be sustained only for a few hundreds of microsecond at the initial phase of the discharge, when…”
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3
Thrust imparted by a stepped-diameter magnetic nozzle rf plasma thruster
Published in Applied physics letters (16-07-2018)“…A stepped-diameter source tube is employed on a magnetic nozzle radiofrequency plasma thruster, where the magnetic field lines intersecting the wall near the…”
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4
High-performance planar-type electron source based on a graphene-oxide-semiconductor structure
Published in Applied physics letters (27-05-2019)“…A graphene-oxide-semiconductor (GOS) planar-type electron source was fabricated by direct synthesis of graphene on an oxide layer via low-pressure chemical…”
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5
Low-power-consumption, high-current-density, and propellantless cathode using graphene-oxide-semiconductor structure array
Published in Acta astronautica (01-09-2020)“…Graphene-oxide-semiconductor (GOS) planar-type electron sources—which consist of a graphene electrode layer, a thin SiO2 insulator, and a Si substrate—can be…”
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6
Uniform needle-emitter arrays for ionic liquid electrospray thrusters with precise thrust control
Published in Japanese Journal of Applied Physics (01-06-2021)“…Abstract The development of ionic liquid electrospray thrusters with highly precise needle-emitter arrays is reported. Micro-electro-mechanical systems process…”
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7
Microfabricated emitter array for an ionic liquid electrospray thruster
Published in Japanese Journal of Applied Physics (01-06-2017)“…We have fabricated needle-shaped emitters on a Si wafer by a MEMS process, and measured the voltage-current characteristics and the frequency dependence of a…”
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8
Oxidation Resistance Improvement of Graphene-Oxide-Semiconductor Planar-Type Electron Sources Using h‑BN as an Oxygen-Resistant, Electron-Transmissive Coating
Published in ACS omega (20-09-2022)“…Graphene–oxide–semiconductor (GOS) planar-type electron emission devices with a hexagonal boron nitride (h-BN) protective layer have demonstrated improved…”
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9
Surface smoothing during plasma etching of Si in Cl2
Published in Applied physics letters (14-11-2016)“…Effects of initial roughness on the evolution of plasma-induced surface roughness have been investigated during Si etching in inductively coupled Cl2 plasmas,…”
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10
Development of a momentum vector measurement instrument in steady-state plasmas
Published in AIP advances (01-10-2018)“…Momentum vector measurement instrument yielding individual and simultaneous identification of local fluxes of momentum components in two different directions,…”
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7. Inspection of Hepatocellular Carcinoma 5: Angiography
Published in Nippon Hōshasen Gijutsu Gakkai zasshi (01-07-2016)Get more information
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12
Fabrication of nano-capillary emitter arrays for ionic liquid electrospray thrusters
Published in Japanese Journal of Applied Physics (01-06-2021)“…Abstract In this study, we fabricated nano-capillary emitter arrays for stable ion emission of ionic liquid electrospray thrusters, employing the fabrication…”
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13
Effects of straggling of incident ions on plasma-induced damage creation in "fin"-type field-effect transistors
Published in Japanese Journal of Applied Physics (01-03-2014)“…We investigated the plasma-induced physical damage (PPD) mechanism in a field-effect transistor (FET) with a fin-type channel, called FinFET. Compared to PPD…”
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14
Vector Resolved Energy Fluxes and Collisional Energy Losses in Magnetic Nozzle Radiofrequency Plasma Thrusters
Published in Frontiers in physics (10-12-2021)“…Energy losses in a magnetic nozzle radiofrequency plasma thruster are investigated to improve the thruster efficiency and are calculated from particle energy…”
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15
Fabrication of a high-density emitter array for electrospray thrusters using field emitter array process
Published in Japanese Journal of Applied Physics (01-06-2019)“…To improve the thrust density of electrospray thrusters using ionic liquids as the propellant, we have fabricated a high-density emitter array utilizing the…”
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16
Modeling of ion-bombardment damage on Si surfaces for in-line analysis
Published in Thin solid films (30-04-2010)“…Structures and mechanism of ion-bombardment damage on silicon wafers exposed to plasma were investigated comprehensively. By using molecular dynamics…”
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Journal Article Conference Proceeding -
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Evaluation technique for plasma-induced SiOC dielectric damage by capacitance-voltage hysteresis monitoring
Published in Japanese Journal of Applied Physics (01-06-2016)“…We propose an electrical method, named capacitance-voltage (C-V) monitoring, for quantifying plasma-induced damage (PID) to interlayer dielectrics. By this…”
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18
Molecular dynamics simulations of silicon chloride ion incidence during Si etching in Cl-based plasmas
Published in Japanese Journal of Applied Physics (01-05-2014)“…Classical molecular dynamics (MD) simulations have been performed for SiClx+ (x = 0-4) ions incident on Si(100) surfaces, using an improved Stillinger-Weber…”
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19
Mechanism of Highly Efficient Electron Emission from a Graphene/Oxide/Semiconductor Structure
Published in ACS applied electronic materials (28-07-2020)“…Highly efficient electron emission of 48.5% was demonstrated by a graphene/oxide/semiconductor (GOS) structure. The main factors contributing to this…”
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20
Modeling and Simulation of Nanoscale Surface Rippling during Plasma Etching of Si under Oblique Ion Incidence
Published in Japanese Journal of Applied Physics (01-08-2012)“…A three-dimensional atomic-scale cellular model (ASCeM-3D) has been developed to reproduce the evolution of feature profiles on atomic or nanometer scale…”
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