Search Results - "Tai-Ju Chen"
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A 14-nm FinFET Logic CMOS Process Compatible RRAM Flash With Excellent Immunity to Sneak Path
Published in IEEE transactions on electron devices (01-12-2017)“…In this paper, we have demonstrated an oxygen-vacancy-based bipolar RRAM on a pure logic 14-nm-node HKMG FinFET platform. A unit cell of the memory consists of…”
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An Experimental Approach to Characterizing the Channel Local Temperature Induced by Self-Heating Effect in FinFET
Published in IEEE journal of the Electron Devices Society (01-01-2018)“…In this paper, we have developed a methodology of a lateral profiling technique of the channel local temperature in 14 nm FinFET, incurred by the self-heating…”
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Application of plasma immersion ion implantation doping to low-temperature processed poly-Si TFTs
Published in IEEE electron device letters (01-11-1998)“…This work applied, for the first time, plasma immersion ion implantation (PIII) for source/drain doping on low-temperature processed polysilicon thin-film…”
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Novel gate dielectric films formed by ion plating for low-temperature-processed polysilicon TFTs
Published in IEEE electron device letters (01-09-1996)“…A novel SiO/sub 2/ film formed by ion plating (IP) at room temperature was developed for low-temperature-processed (LTP) (<625/spl deg/C) polysilicon thin-film…”
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Experimental comparison of off-state current between high-temperature- and low-temperature-processed undoped channel polysilicon thin-film transistors
Published in JPN J APPL PHYS PART 1 REGUL PAP SHORT NOTE REV PAP (1993)“…Poly-Si thin-film transistors (TFT's) have a large off-state current that is unacceptable for pixel driver application. To quickly establish an effective…”
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Physical characteristics of N2 annealing on room-temperature-deposited ion plating oxide
Published in Applied physics letters (24-03-1997)“…The effects of N2 annealing on the physical properties of room-temperature-deposited ion plating (IP) oxide have been characterized. As-deposited IP oxide…”
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The performance and reliability of self-induced lightly-doped-drain polysilicon thin film transistors
Published in International Electron Devices and Materials Symposium (1994)“…A novel polycrystalline silicon thin film transistor (poly-Si TFT) with high ON/OFF current ratio independent of gate bias is developed. We call this device…”
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Conference Proceeding -
9
Hydrogenation of polysilicon thin-film transistor in a planar inductive H/sub 2//Ar discharge
Published in IEEE electron device letters (01-05-1999)“…A planar inductive discharge is used to hydrogenate polysilicon thin-film transistors (poly-Si TFTs). Experimental results indicate that inductive discharges…”
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Hydrogenation of polysilicon thin-film transistor in a planarinductive H(2)/Ar discharge
Published in IEEE electron device letters (01-05-1999)“…A planar inductive discharge is used to hydrogenate polysilicon thin-film transistors (poly-Si TFTs). Experimental results indicate that inductive discharges…”
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Characteristics of self-induced lightly-doped-drain polycrystalline silicon thin film transistors with liquid-phase deposition SiO/sub 2/ as gate-insulator and passivation-layer
Published in IEEE transactions on electron devices (01-02-1995)“…As the passivation layer on the top of undoped offset region for offset-gate structured poly-Si TFTs is exposed to hydrogen plasma, a lightly-doped-like drain…”
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Characteristics of self-induced lightly-doped-drain polycrystallinesilicon thin film transistors with liquid-phase deposition SiO(2) as gate-insulator and passivation-layer
Published in IEEE transactions on electron devices (01-02-1995)“…As the passivation layer on the top of undoped offset region for offset-gate structured poly-Si TFTs is exposed to hydrogen plasma, a lightly-doped-like drain…”
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14
Hydrogenation of polysilicon thin-film transistor in a planar inductive H sub(2)/Ar discharge
Published in IEEE electron device letters (01-01-1999)“…A planar inductive discharge is used to hydrogenate polysilicon thin-film transistors (poly-Si TFT's). Experimental results indicate that inductive discharges…”
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Journal Article -
15
HIGHLY RELIABLE LIQUID-PHASE-DEPOSITED SiO2 WITH NITROUS OXIDE PLASMA POST-TREATMENT FOR LOW-TEMPERATURE-PROCESSED POLYSILICON THIN FILM TRANSISTORS
Published in Japanese Journal of Applied Physics, Part 1 (2002)“…Low-temperature (approximately 300 C) N2O-plasma post-treatment for liquid-phase-deposited (LPD) gate oxide has been proposed for the first time. This…”
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Passivation effects of ion plating capping oxide on poly-Si TFTs
Published in 1997 55th Annual Device Research Conference Digest (1997)“…The reduction of defect density in poly-Si active layers is an important issue to improve poly-Si TFT performance. A novel method has been developed for…”
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Conference Proceeding