Search Results - "Tai, Tom"
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Through the genetic bottleneck: O. rufipogon as a source of trait-enhancing alleles for O. sativa
Published in Euphytica (01-04-2007)“…This paper summarizes results from a decade of collaborative research using advanced backcross (AB) populations to a) identify quantitative trait loci (QTL)…”
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Journal Article Conference Proceeding -
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Self-Perceived Stigma, Depressive Symptoms, and Suicidal Behaviors Among Female Sex Workers in China
Published in Journal of transcultural nursing (2010)“…Data regarding female sex workers’ (FSWs) self-perceived stigma and their mental health are limited, particularly in developing countries. This study, using a…”
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Journal Article -
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Prevalence and correlates of doctor–geriatric patient lifestyle discussions: Analysis of ADEPT videotapes
Published in Preventive medicine (01-12-2006)“…This study identifies the prevalence and correlates of physician–geriatric patient discussions about physical activity and nutrition lifestyle behaviors…”
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Journal Article -
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Effects of Photosensitive Film Sidewall Profile with Different Exposure Wavelength and Process Characteristics of Wafer Bump Technology
Published in 2006 International Microsystems, Package, Assembly Conference Taiwan (01-10-2006)“…Wafer bumping is growing in importance with the increasing used of flip chip package. In this study, we tried to determine which factors at photosensitive film…”
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Conference Proceeding -
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Effects of photosensitive film sidewall profile with different exposure wavelength and process characteristics of plating bump technology
Published in 56th Electronic Components and Technology Conference 2006 (2006)“…Wafer bumping is growing in importance with the increasing used of flip chip package. In this study, we tried to determine which factors at photosensitive film…”
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Conference Proceeding -
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Considerations for using low dielectric constant material as re-passivation layer on 300mm wafer bump process and manufacturing benefits of flip chip package
Published in IEEE/CPMT/SEMI 29th International Electronics Manufacturing Technology Symposium (IEEE Cat. No.04CH37585) (2004)“…Major improvements over the last four years have removed and reduced many of these barriers with the transition from 150mm, 200mm to 300mm process wafers;…”
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Conference Proceeding