Liquid-phase epitaxy of 2H–SiC film on a (0001) 4H–SiC substrate in Li–Si melt

We first applied a liquid-phase epitaxy (LPE) method to the growth of 2H–SiC to obtain an oriented 2H–SiC layer. The LPE growth was performed on a (0001) 4H–SiC substrate in a Li–Si–C melt at 850 °C. A LPE layer grew on the carbon face of the (0001) 4H–SiC substrate with the area of about 1 × 1 mm 2...

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Bibliographic Details
Published in:Materials letters Vol. 63; no. 8; pp. 649 - 651
Main Authors: Imade, Mamoru, Ogura, Takashi, Uemura, Masahiro, Kawamura, Fumio, Yoshimura, Masashi, Kitaoka, Yasuo, Sasaki, Takatomo, Mori, Yusuke, Yamazaki, Masanobu, Suwabe, Shigekazu, Nakashima, Shin-ichi
Format: Journal Article
Language:English
Published: Elsevier B.V 31-03-2009
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Summary:We first applied a liquid-phase epitaxy (LPE) method to the growth of 2H–SiC to obtain an oriented 2H–SiC layer. The LPE growth was performed on a (0001) 4H–SiC substrate in a Li–Si–C melt at 850 °C. A LPE layer grew on the carbon face of the (0001) 4H–SiC substrate with the area of about 1 × 1 mm 2. The thickness and morphology of the LPE layer were confirmed by scanning electron microscope (SEM), and the polytype of the LPE layer was determined using a high-resolution transmission electron microscope (HR-TEM) and a Raman spectroscopy. SEM measurements revealed that the thickness of the LPE layer was 50 μm and that this layer developed with a hexagonal shape. HR-TEM observations and Raman spectral analysis showed that 2H–SiC layer grows on 4H–SiC substrate with the relationship of (0001) 2H–SiC (0001) 4H–SiC. In this study, we first succeeded to grow -axis-oriented 2H–SiC films and concluded that the LPE technique is applicable to the growth of oriented 2H–SiC films in the Li–Si melt.
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content type line 23
ISSN:0167-577X
1873-4979
DOI:10.1016/j.matlet.2008.12.009