Liquid-phase epitaxy of 2H–SiC film on a (0001) 4H–SiC substrate in Li–Si melt
We first applied a liquid-phase epitaxy (LPE) method to the growth of 2H–SiC to obtain an oriented 2H–SiC layer. The LPE growth was performed on a (0001) 4H–SiC substrate in a Li–Si–C melt at 850 °C. A LPE layer grew on the carbon face of the (0001) 4H–SiC substrate with the area of about 1 × 1 mm 2...
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Published in: | Materials letters Vol. 63; no. 8; pp. 649 - 651 |
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Main Authors: | , , , , , , , , , , |
Format: | Journal Article |
Language: | English |
Published: |
Elsevier B.V
31-03-2009
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Subjects: | |
Online Access: | Get full text |
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Summary: | We first applied a liquid-phase epitaxy (LPE) method to the growth of 2H–SiC to obtain an oriented 2H–SiC layer. The LPE growth was performed on a (0001) 4H–SiC substrate in a Li–Si–C melt at 850 °C. A LPE layer grew on the carbon face of the (0001) 4H–SiC substrate with the area of about 1
×
1 mm
2. The thickness and morphology of the LPE layer were confirmed by scanning electron microscope (SEM), and the polytype of the LPE layer was determined using a high-resolution transmission electron microscope (HR-TEM) and a Raman spectroscopy. SEM measurements revealed that the thickness of the LPE layer was 50 μm and that this layer developed with a hexagonal shape. HR-TEM observations and Raman spectral analysis showed that 2H–SiC layer grows on 4H–SiC substrate with the relationship of (0001) 2H–SiC
(0001) 4H–SiC. In this study, we first succeeded to grow -axis-oriented 2H–SiC films and concluded that the LPE technique is applicable to the growth of oriented 2H–SiC films in the Li–Si melt. |
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Bibliography: | ObjectType-Article-2 SourceType-Scholarly Journals-1 ObjectType-Feature-1 content type line 23 |
ISSN: | 0167-577X 1873-4979 |
DOI: | 10.1016/j.matlet.2008.12.009 |