Search Results - "Sun, Shichuang"
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Studies on High-Voltage GaN-on-Si MIS-HEMTs Using LPCVD Si3N4 as Gate Dielectric and Passivation Layer
Published in IEEE transactions on electron devices (01-02-2016)“…This paper investigates the performance of AlGaN/gallium nitride (GaN) MIS high electron mobility transistors (MIS-HEMTs). The gate dielectric layer and the…”
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Normally-off p-GaN/AlGaN/GaN high electron mobility transistors using hydrogen plasma treatment
Published in Applied physics letters (10-10-2016)“…In this letter, we report a method by introducing hydrogen plasma treatment to realize normally-off p-GaN/AlGaN/GaN HEMT devices. Instead of using etching…”
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Normally Off AlGaN/GaN MIS-High-Electron Mobility Transistors Fabricated by Using Low Pressure Chemical Vapor Deposition Si3N4 Gate Dielectric and Standard Fluorine Ion Implantation
Published in IEEE electron device letters (01-11-2015)“…This letter presents a fabrication technology of enhancement-mode (E-mode) AlGaN/GaN metal-insulator- semiconductor high-electron mobility transistors…”
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High-resistivity unintentionally carbon-doped GaN layers with nitrogen as nucleation layer carrier gas grown by metal-organic chemical vapor deposition
Published in AIP advances (01-12-2017)“…In this letter, high-resistivity unintentionally carbon-doped GaN layers with sheet resistivity greater than 106 Ω/□ have been grown on c-plane sapphire…”
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AlGaN/GaN MIS-HEMTs of Very-Low }} Hysteresis and Current Collapse With In-Situ Pre-Deposition Plasma Nitridation and LPCVD-Si3N4 Gate Insulator
Published in IEEE electron device letters (01-02-2017)“…In this letter, we report an in-situ predeposition plasma nitridation process, which is adopted to remove the GaN surface oxygen-related bonds and reduce…”
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Interface Si donor control to improve dynamic performance of AlGaN/GaN MIS-HEMTs
Published in AIP advances (01-12-2017)“…In this letter, we have studied the performance of AlGaN/GaN metal-insulator-semiconductor high electron mobility transistors (MIS-HEMTs) with different…”
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Effect of quenching temperature on microstructure and mechanical properties of Mg-35 wt%Sc alloy
Published in Journal of alloys and compounds (15-05-2023)“…In this work, the microstructure, microhardness and compressive mechanical properties of quenched Mg-35 wt%Sc alloy at 540 °С, 600 °С, and 630 °С were…”
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Improved Optical Performance of InAs Quantum Dot Structure via Suitable Manipulation of GaAs Cap Layer Growth
Published in Journal of electronic materials (01-01-2016)“…The influences of the different growth methods of GaAs cap layer on the self-assembled InAs quantum dots were investigated via photoluminescence and…”
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Mechanism of leakage of ion-implantation isolated AlGaN/GaN MIS-high electron mobility transistors on Si substrate
Published in Solid-state electronics (01-08-2017)“…In this paper, we systematically investigated the leakage mechanism of the ion-implantation isolated AlGaN/GaN metal-insulator-semiconductor high electron…”
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AlGaN/GaN metal-insulator-semiconductor high electron mobility transistors with reduced leakage current and enhanced breakdown voltage using aluminum ion implantation
Published in Applied physics letters (04-01-2016)“…This letter has studied the performance of AlGaN/GaN metal-insulator-semiconductor high electron mobility transistors on silicon substrate with GaN buffer…”
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Normally Off AlGaN/GaN MIS-High-Electron Mobility Transistors Fabricated by Using Low Pressure Chemical Vapor Deposition Si sub(3)N sub(4) Gate Dielectric and Standard Fluorine Ion Implantation
Published in IEEE electron device letters (01-11-2015)“…This letter presents a fabrication technology of enhancement-mode (E-mode) AlGaN/GaN metal-insulator-semiconductor high-electron mobility transistors…”
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13
Studies on High-Voltage GaN-on-Si MIS-HEMTs Using LPCVD Si sub(3)N sub(4) as Gate Dielectric and Passivation Layer
Published in IEEE transactions on electron devices (01-02-2016)“…This paper investigates the performance of AlGaN/gallium nitride (GaN) MIS high electron mobility transistors (MIS-HEMTs). The gate dielectric layer and the…”
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14
Studies on High-Voltage GaN-on-Si MIS-HEMTs Using LPCVD Si 3 N 4 as Gate Dielectric and Passivation Layer
Published in IEEE transactions on electron devices (01-02-2016)Get full text
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Optical performance improvement of GaN/AlN quantum dots via a two-step grown caplayer
Published in Journal of alloys and compounds (05-12-2015)“…A two-step growth technique consisting of a low temperature pulsed atomic layer epitaxy (PALE) method and high temperature PALE method has been employed to…”
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InAs/GaAs quantum dots with wide-range tunable densities by simply varying V/III ratio using metal-organic chemical vapor deposition
Published in Nanoscale research letters (28-08-2013)“…The complicated behaviors of InAs/GaAs quantum dots with increasing V/III ratio associated with several competing mechanisms have been described. The results…”
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Influence of high-temperature postgrowth annealing under different ambience on GaN quantum dots grown via Ga droplet epitaxy
Published in Optical materials express (01-07-2015)“…The influence of high-temperature postgrowth annealing (PGA) under NH sub(3)/H sub(2), NH sub(3)/N sub(2) ambience on the morphologies and nitridation degree…”
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Optical properties of the nonpolar a-plane MgZnO films grown on a-GaN/r-sapphire templates by pulsed laser deposition
Published in Optical materials express (01-11-2014)“…Nonpolar (1120) a-plane MgZnO films were grown on different a-GaN/r-sapphire templates by pulsed laser deposition (PLD), where the growth temperature of GaN…”
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