Influence of thermal treatment on the structure of Ti–Al films

Titanium aluminides based on TiAl and Ti 3Al are potential materials for high temperature aerospace application. Their low density, high temperature creep resistance and strength, high oxidation resistance, make them excellent potential engine materials. It is reasonable to develop processing strate...

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Bibliographic Details
Published in:	Crystal engineering Vol. 5; no. 3; pp. 255 - 263
Main Authors:	Romankov, S.E, Suleeva, S, Volkova, T.V, Ermakov, E
Format:	Journal Article Conference Proceeding
Language:	English
Published:	Oxford Elsevier Ltd 01-09-2002 Elsevier Science
Subjects:	Applied sciences Condensed matter: structure, mechanical and thermal properties Cross-disciplinary physics: materials science; rheology Deposition by sputtering Exact sciences and technology Intermetallics compound Materials science Metals. Metallurgy Methods of deposition of films and coatings; film growth and epitaxy Phase transitions Physics Sputtering Structure and morphology; thickness Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) Thin film structure and morphology Thin films transport phenomena Intermetallics compound Thin films transport phenomena Phase transitions Sputtering Temperature dependence Scanning electron microscopy Intermetallic compounds Metastable phases Phase transformations Crystal growth from vapors XRD Experimental study Heat treatments Titanium base alloys Optimization Substrates Thin films Binary alloys Magnetrons Cathode sputtering Aluminium alloys Morphology Microstructure Transition element alloys
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Summary:	Titanium aluminides based on TiAl and Ti 3Al are potential materials for high temperature aerospace application. Their low density, high temperature creep resistance and strength, high oxidation resistance, make them excellent potential engine materials. It is reasonable to develop processing strategies for protective and high temperature coatings based on them. On magnetron sputtering the Ti–48% Al alloy films, the composition of which corresponds to the target’s one, have been obtained. When annealed, the aluminium atoms have been discovered to diffuse into the substrate. The redistribution and the leveling of the films’ compositions in the volume take place. After annealing the film contains a higher titanium concentration. On sputtering the formation of the Ti 3Al-based metastable phase in the films has been observed. This phase is the main one in the films and has a different morphology on different substrates. It is stable and doesn’t decompose at annealing. During annealing the new intermediate metastable phases, which are stable only within a definite temperature and concentration range, have developed. The structure, kinetics of phase transformation and evolution of the film microstructures depend on the structure and morphology of the substrate.
Bibliography:	SourceType-Scholarly Journals-2 ObjectType-Feature-2 ObjectType-Conference Paper-1 content type line 23 SourceType-Conference Papers & Proceedings-1 ObjectType-Article-3
ISSN:	1463-0184
DOI:	10.1016/S1463-0184(02)00036-9