Search Results - "Stickel, W."

Automated Generation of Energy Profiles for Urban Simulations by Maile, Tobias, Steinacker, Heiner, Stickel, Matthias W., Ott, Etienne, Kley, Christian

“…Urban simulations play an important role on the way to a climate neutral society. To enable early assessment of different energy concepts for urban…”
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Projection reduction exposure with variable axis immersion lenses: Next generation lithography by Pfeiffer, H. C., Dhaliwal, R. S., Golladay, S. D., Doran, S. K., Gordon, M. S., Groves, T. R., Kendall, R. A., Lieberman, J. E., Petric, P. F., Pinckney, D. J., Quickle, R. J., Robinson, C. F., Rockrohr, J. D., Senesi, J. J., Stickel, W., Tressler, E. V., Tanimoto, A., Yamaguchi, T., Okamoto, K., Suzuki, K., Okino, T., Kawata, S., Morita, K., Suziki, S. C., Shimizu, H., Kojima, S., Varnell, G., Novak, W. T., Stumbo, D. P., Sogard, M.

“…Projection reduction exposure with variable axis immersion lenses (PREVAIL) represents the high throughput e-beam projection approach to NGL, which IBM is…”
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Sonographic appearance of the normal posterior cruciate ligament (PCL) by Stickel, W H

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PREVAIL-EPL alpha tool: Early results by Golladay, S. D., Pfeiffer, H. C., Bohnenkamp, C. A., Dhaliwal, R. S., Enichen, W. A., Gordon, M. S., Kendall, R. A., Lieberman, J. E., Stickel, W., Rockrohr, J. D., Tressler, E. V., Tanimoto, A., Yamaguchi, T., Okamoto, K., Suzuki, K., Miura, T., Okino, T., Kawata, S., Morita, K., Suzuki, S. C., Shimizu, H., Kojima, S., Varnell, G., Novak, W. T., Sogard, M.

“…The IBM/Nikon alliance is developing an EPL stepper alpha tool based on the PREVAIL technology. This article provides a status report on the alliance activity…”
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PREVAIL — Evolution and properties of large area reduction projection electron optics by Stickel, W., Langner, G.O.

“…The large area reduction projection optics with beam scanning of the PREVAIL proof-of-concept system is described as the result of an evolution of a variable…”
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Simulation of Coulomb interactions in electron beam lithography systems—A comparison of theoretical models by Stickel, W.

“…The Loeffler effect (trajectory displacement) has been calculated for a magnetic lens doublet electron-optic system considered to represent the basic…”
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Performance enhancements on IBM’s EL‐4 electron‐beam lithography system by Butsch, R., Enichen, W. A., Gordon, M. S., Groves, T. R., Hartley, J. G., Pavick, J. W., Pfeiffer, H. C., Quickle, R. J., Rockrohr, J. D., Stickel, W.

“…IBM’s latest electron‐beam mask maker, EL‐4, is installed at IBM’s Advanced Mask Facility in Essex Junction, Vermont. The EL‐4 system is a 75 kV…”
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EL‐4, a new generation electron‐beam lithography system by Pfeiffer, H. C., Davis, D. E., Enichen, W. A., Gordon, M. S., Groves, T. R., Hartley, J. G., Quickle, R. J., Rockrohr, J. D., Stickel, W., Weber, E. V.

“…The new generation electron‐beam lithography system EL‐4 is described, designed for direct wafer exposure as well as optical reticle and x‐ray mask making. The…”
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PREVAIL: Theory of the proof of concept column electron optics by Stickel, W., Langner, G. O.

“…The PREVAIL proof-of-concept (POC) system is described elsewhere in these proceedings. For theoretical as well as practical reasons, the operating conditions…”
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Large Piezoresponse and Ferroelectric Properties of (Bi0.5Na0.5)TiO3-(Bi0.5K0.5)TiO3-Bi(Mg0.5Ti0.5)O3 Thin Films Prepared by Chemical Solution Deposition by Jeon, Yu Hong, Patterson, Eric A., Cann, David P., Mardilovich, Peter, Stickel, William, Gibbons, Brady J.

“…Bulk ceramic 72.5 mol%(Bi0.5Na0.5)TiO3–22.5 mol%(Bi0.5K0.5)TiO3–5 mol%Bi(Mg0.5Ti0.5)O3 (BNT–BKT–BMgT) has previously been reported to show a large high‐field…”
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Electron optical image correction subsystem in electron beam projection lithography by Kojima, S., Stickel, W., Rockrohr, J. D., Gordon, M.

“…To obtain ultimate image fidelity in the PREVAIL electron beam projection lithography system (EB stepper) [Pfeiffer et al., J. Vac. Sci. Technol. B 17, 2840…”
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Application of the generalized curvilinear variable axis lens to electron projection by Stickel, W., Langner, G. O.

“…The concept of the curvilinear variable axis lens (CVAL) has been introduced for the optics of projection reduction exposure with variable axis immersion…”
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Aroclor 1254 residues in birds: lethal levels and loss rates [Polychlorinated biphenyls] by STICKEL, W. H, STICKEL, L. F, DYRLAND, R. A, HUGHES, D. L

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DDE in birds: lethal residues and loss rates [Pesticides, pollution, wildlife; USA] by STICKEL, W. H, STICKEL, L. F, DYRLAND, R. A, HUGHES, D. L

“…Lethal brain residues of DDE were determined experimentally in four species of wild birds (male common grackels (Quiscalus quiscula ), immature female…”
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PREVAIL Alpha system: Status and design considerations by Golladay, S. D., Pfeiffer, H. C., Rockrohr, J. D., Stickel, W.

“…An overview is given of the PREVAIL Alpha system program, a joint project of IBM and Nikon to develop a production-level electron project lithography system…”
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Evolution of electron projection optics from variable axis immersion lenses to projection reduction exposure with variable axis immersion lenses by Stickel, W., Pfeiffer, H. C., Golladay, S. D., Gordon, M. S.

“…The optics of the electron projection lithography (EPL) system PREVAIL (projection reduction exposure with variable axis immersion lenses) is retraced from its…”
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Interaction of 25-keV Electrons with Lattice Vibrations in LiF. Experimental Evidence for Surface Modes of Lattice Vibration by Boersch, H., Geiger, J., Stickel, W.

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The chiropodist and the community by STICKEL, W J

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What should we publish? by Stickel, W H

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Comparison of methods of preserving tissues for pesticide analysis by STICKEL, W. H, STICKEL, L. F, DYRLAND, R. A, HUGHES, D. L

“…Formalin preservation, freezing, spoiling followed by freezing, and phenoxyethanol were compared in terms of concentrations of DDT, DDD, DDE, endrin, and…”
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