Search Results - "Stanchev, Todor"
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Charge Storage and Reliability Characteristics of Nonvolatile Memory Capacitors with HfO2/Al2O3-Based Charge Trapping Layers
Published in Materials (09-09-2022)“…Flash memories are the preferred choice for data storage in portable gadgets. The charge trapping nonvolatile flash memories are the main contender to replace…”
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Journal Article -
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Charge Storage and Reliability Characteristics of Nonvolatile Memory Capacitors with HfO[sub.2]/Al[sub.2]O[sub.3]-Based Charge Trapping Layers
Published in Materials (01-09-2022)“…Flash memories are the preferred choice for data storage in portable gadgets. The charge trapping nonvolatile flash memories are the main contender to replace…”
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Journal Article -
3
Radiation Tolerance and Charge Trapping Enhancement of ALD HfO 2 /Al 2 O 3 Nanolaminated Dielectrics
Published in Materials (10-02-2021)“…High- dielectric stacks are regarded as a promising information storage media in the Charge Trapping Non-Volatile Memories, which are the most viable…”
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Journal Article -
4
Radiation Tolerance and Charge Trapping Enhancement of ALD HfO2/Al2O3 Nanolaminated Dielectrics
Published in Materials (10-02-2021)“…High-k dielectric stacks are regarded as a promising information storage media in the Charge Trapping Non-Volatile Memories, which are the most viable…”
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Journal Article