Search Results - "Spiller, Eberhard"

Initial Calibration of the Atmospheric Imaging Assembly (AIA) on the Solar Dynamics Observatory (SDO) by Boerner, Paul, Edwards, Christopher, Lemen, James, Rausch, Adam, Schrijver, Carolus, Shine, Richard, Shing, Lawrence, Stern, Robert, Tarbell, Theodore, Title, Alan, Wolfson, C. Jacob, Soufli, Regina, Spiller, Eberhard, Gullikson, Eric, McKenzie, David, Windt, David, Golub, Leon, Podgorski, William, Testa, Paola, Weber, Mark

“…The Atmospheric Imaging Assembly (AIA) instrument onboard the Solar Dynamics Observatory (SDO) is an array of four normal-incidence reflecting telescopes that…”
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An ion-assisted Mo-Si deposition process for planarizing reticle substrates for extreme ultraviolet lithography by Mirkarimi, P.B., Spiller, E.A., Stearns, D.G., Sperry, V., Baker, S.L.

“…Substrate particles are a serious concern in the fabrication of reticles for extreme ultraviolet lithography (EUVL) because they nucleate defects in the…”
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Smoothing of multilayer x-ray mirrors by ion polishing by SPILLER, E

“…Ion bombardment at grazing angles of incidence is used to smoothen the boundaries within multilayer x-ray mirrors. Increases in the reflectivity by a factor of…”
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Femtosecond diffractive imaging with a soft-X-ray free-electron laser by Chapman, Henry N, Hajdu, Janos, Barty, Anton, Bogan, Michael J, Boutet, Sébastien, Frank, Matthias, Hau-Riege, Stefan P, Marchesini, Stefano, Woods, Bruce W, Bajt, Saša, Benner, W. Henry, London, Richard A, Plönjes, Elke, Kuhlmann, Marion, Treusch, Rolf, Düsterer, Stefan, Tschentscher, Thomas, Schneider, Jochen R, Spiller, Eberhard, Möller, Thomas, Bostedt, Christoph, Hoener, Matthias, Shapiro, David A, Hodgson, Keith O, van der Spoel, David, Burmeister, Florian, Bergh, Magnus, Caleman, Carl, Huldt, Gösta, Seibert, M. Marvin, Maia, Filipe R. N. C, Lee, Richard W, Szöke, Abraham, Timneanu, Nicusor

“…Theory predicts that, with an ultrashort and extremely bright coherent X-ray pulse, a single diffraction pattern may be recorded from a large macromolecule, a…”
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Single Particle X-ray Diffractive Imaging by Bogan, Michael J, Benner, W. Henry, Boutet, Sébastien, Rohner, Urs, Frank, Matthias, Barty, Anton, Seibert, M. Marvin, Maia, Filipe, Marchesini, Stefano, Bajt, Saša, Woods, Bruce, Riot, Vincent, Hau-Riege, Stefan P, Svenda, Martin, Marklund, Erik, Spiller, Eberhard, Hajdu, Janos, Chapman, Henry N

“…In nanotechnology, strategies for the creation and manipulation of nanoparticles in the gas phase are critically important for surface modification and…”
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Aperiodic Mo/Si multilayers for hard x-rays by Pardini, Tom, Alameda, Jennifer, Platonov, Yuriy, Robinson, Jeff, Soufli, Regina, Spiller, Eberhard, Walton, Chris, Hau-Riege, Stefan P

“…In this work we have developed aperiodic Molybdenum/Silicon (Mo/Si) multilayers (MLs) to reflect 16.25 keV photons at a grazing angle of incidence of 0.6° ±…”
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Femtosecond time-delay X-ray holography by Bogan, Michael J, Chapman, Henry N, London, Richard A, Woods, Bruce W, Bergh, Magnus, Caleman, Carl, Szöke, Abraham, Möller, Thomas, Treusch, Rolf, Bajt, Saša, Benner, W. Henry, Frank, Matthias, Plönjes, Elke, Huldt, Gösta, Marchesini, Stefano, Shapiro, David A, Hajdu, Janos, Boutet, Sébastien, Burmeister, Florian, Barty, Anton, Bostedt, Christoph, Kuhlmann, Marion, Seibert, M. Marvin, Spiller, Eberhard, Hau-Riege, Stefan P, Rohner, Urs

“…Extremely intense and ultrafast X-ray pulses from free-electron lasers offer unique opportunities to study fundamental aspects of complex transient phenomena…”
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Low-Loss Reflection Coatings Using Absorbing Materials by Spiller, Eberhard

“…A new design principle is described which allows construction of mirrors that are of reasonable reflectivity (R>25%) in the extreme ultraviolet (λ = 50 to 500…”
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Subnanometer-scale measurements of the interaction of ultrafast soft x-ray free-electron-laser pulses with matter by Hau-Riege, Stefan P, Chapman, Henry N, Krzywinski, Jacek, Sobierajski, Ryszard, Bajt, Sasa, London, Richard A, Bergh, Magnus, Caleman, Carl, Nietubyc, Robert, Juha, Libor, Kuba, Jaroslav, Spiller, Eberhard, Baker, Sherry, Bionta, Richard, Sokolowski Tinten, K, Stojanovic, Nikola, Kjornrattanawanich, Benjawan, Gullikson, Eric, Plönjes, Elke, Toleikis, Sven, Tschentscher, Thomas

“…At the recently built FLASH x-ray free-electron laser, we studied the reflectivity of Si/C multilayers with fluxes up to 3 x 10(14) W/cm2. Even though the…”
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Sub-diffraction-limited multilayer coatings for the 0.3 numerical aperture micro-exposure tool for extreme ultraviolet lithography by Soufli, Regina, Hudyma, Russell M, Spiller, Eberhard, Gullikson, Eric M, Schmidt, Mark A, Robinson, Jeff C, Baker, Sherry L, Walton, Christopher C, Taylor, John S

“…Multilayer coating results are discussed for the primary and secondary mirrors of the micro-exposure tool (MET): a 0.30 NA lithographic imaging system with a…”
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Controlled fabrication of multilayer soft‐x‐ray mirrors by Spiller, Eberhard, Segmüller, Armin, Rife, Jack, Haelbich, Rolf‐Peter

“…Multilayer mirrors have been fabricated for various angles of incidence throughout the wavelength range λ=1.5–160 Å. Reflectivity increases by more than a…”
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Propagation of x rays in waveguides by Spiller, Eberhard, Segmüller, Armin

“…Waveguide structures and couplers for x rays are analyzed. Experimental results are given for the propagation of Cu Ka radiation in guides made of BN…”
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Smooth multilayer films suitable for x-ray mirrors by Haelbich, Rolf-Peter, Segmüller, Armin, Spiller, Eberhard

“…Multilayer coatings consisting of very smooth ReW and carbon films used as near-normal-incidence reflectors show theoretical performance in the 150–200-Å…”
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Employing a detailed compositional analysis to develop a low defect Mo/Si deposition tool and process for EUVL mask blanks by Ma, Andy, Randive, Rajul, Kearney, Patrick, Han, San-In, Seo, Soon-Cheon, Uno, Toshiyuki, Krick, Dave, Mirkarimi, Paul, Spiller, Eberhard

“…Extreme ultraviolet lithography (EUVL) is the leading lithography technology to fabricate critical feature sizes of 32 nm and smaller. For EUVL a Mo/Si…”
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Fabrication of high-efficiency multilayer-coated gratings for the EUV regime using e-beam patterned substrates by Naulleau, Patrick P, Liddle, J.Alexander, Anderson, Erik H, Gullikson, Eric M, Mirkarimi, Paul, Salmassi, Farhad, Spiller, Eberhard

“…The use of multilayer reflection coatings has proven to be an effective means for improving the efficiency of soft X-ray and extreme ultraviolet gratings…”
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EUV/X-ray multilayer optics: Meeting the challenges of next-generation applications by Soufli, Regina, Robinson, Jeff, Spiller, Eberhard, Fernandez-Perea, Monica, Gullikson, Eric

“…This paper summarizes recent advances in the development of EUV/x-ray multilayer optics for photolithography, free-electron and tabletop lasers, and solar…”
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Summary Abstract: Multilayer thin films for x‐ray optics by Spiller, Eberhard

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Imaging performance of multilayer X-ray mirrors by Spiller, Eberhard, Wilczynski, Janusz, Stearns, Daniel, Golub, Leon, Nystrom, George

“…We analyze soft X-ray images of the solar corona, obtained on the day of the solar eclipse in July 1991, and find that the deviations of our telescope mirror…”
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Erratum: ‘‘Imaging performance of multilayer x-ray mirrors’’ [Appl. Phys. Lett. 61 , 1481 (1992)] by Spiller, Eberhard, Wilczynski, Janusz, Stearn, Daniel, Golub, Leon, Nystrom, George

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Imaging performance of a normal incidence soft x-ray telescope by Henry, J. Patrick, Spiller, Eberhard, Weisskopf, Martin

“…We have made the first measurements of the imaging performance of a normal incidence soft x-ray telescope at BKα (0.183 keV, 67.6 Å). The performance is quite…”
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