Search Results - "Song, Yoon J."
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Some characterizations of cone preserving Z-transformations
Published in Annals of operations research (01-04-2020)“…Given a proper cone K in a finite dimensional real Hilbert space H , we present some results characterizing Z -transformations that keep K invariant. We show…”
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Integration technology for ferroelectric memory devices
Published in Microelectronics and reliability (01-03-2003)“…Ferroelectric devices have been developed for future memory devices due to their ideal memory properties such as non-volatility, fast access time, and low…”
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Low temperature fabrication and properties of sol-gel derived (111) oriented Pb(Zr1−xTix)O3 thin films
Published in Applied physics letters (25-05-1998)“…A novel processing method is developed for preparing sol-gel derived Pb(Zr1−xTix)O3 (x=0.47) thin films on Pt/Ti/SiO2/Si substrates. Using a modified precursor…”
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Laser-assisted low temperature processing of Pb(Zr, Ti)O3 thin film
Published in Applied physics letters (05-10-1998)“…A method for lowering the processing temperature of PbZr1−xTixO3 (PZT) films was developed utilizing a laser-assisted two-step process. In the first step,…”
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Integration and electrical properties of diffusion barrier for high density ferroelectric memory
Published in Applied physics letters (24-01-2000)“…A reliable Ir diffusion barrier was prepared on polysilicon plugged substrate with a contact size of 0.6 μm. Using a Ti adhesion layer and stress-relief…”
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Current and Future High Density FRAM Technology
Published in Integrated ferroelectrics (01-01-2004)“…Current high density FRAM devices have been fabricated by developing several novel integration technologies such as capacitor technology and process…”
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Electrical properties of highly reliable plug buffer layer for high-density ferroelectric memory
Published in Applied physics letters (01-04-2002)“…A CoSi2 buffer layer was prepared in polycrystalline silicon (polysilicon) plug for preventing an undesired microvoid between the polysilicon plug and Ir/Ti…”
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Highly reliable etching mask technology for high density fram
Published in Integrated ferroelectrics (01-01-2001)“…It is well known that ferroelectric capacitors are degraded during etching process due to its highly energetic ion bombardment. The etching damage is…”
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Integration Technology of Interlayer and Intermetallic Dielectrics for High Density 32Mb FRAM
Published in Integrated ferroelectrics (01-01-2002)“…Ferroelectric capacitors are severely degraded by integrating interlayer dielectrics (ILD) and intermetallic dielectrics (IMD) due to their undesired hydrogen…”
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A novel diffusion barrier using oxygen stopping layer for high density FRAM
Published in Integrated ferroelectrics (01-11-2000)“…A novel diffusion barrier was successfully developed by using an oxygen stopping layer between Ir barrier films. The oxygen stopping layer was generated by…”
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