High quality ZnTe heteroepitaxy layers using low-temperature buffer layers
Low dislocation density ZnTe heteroepitaxial layers are achieved by inserting a thin ZnTe buffer layer at low growth temperature (LT-buffer) followed by annealing. The ZnTe heteroepitaxy layer with a LT-buffer shows a narrow line width of X-ray rocking curve as narrow as 42 arcsec in (0 0 4) reflect...
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Published in: | Journal of crystal growth Vol. 251; no. 1; pp. 596 - 601 |
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Main Authors: | , , , , , |
Format: | Journal Article Conference Proceeding |
Language: | English |
Published: |
Amsterdam
Elsevier B.V
01-04-2003
Elsevier |
Subjects: | |
Online Access: | Get full text |
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Summary: | Low dislocation density ZnTe heteroepitaxial layers are achieved by inserting a thin ZnTe buffer layer at low growth temperature (LT-buffer) followed by annealing. The ZnTe heteroepitaxy layer with a LT-buffer shows a narrow line width of X-ray rocking curve as narrow as 42
arcsec in (0
0
4) reflection and the dislocation density is estimated as
1.3×10
6
cm
−2
. A cross-sectional view of transmission electron microscopy shows high structural quality of ZnTe layer with LT-buffers. |
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ISSN: | 0022-0248 1873-5002 |
DOI: | 10.1016/S0022-0248(03)00974-6 |