High quality ZnTe heteroepitaxy layers using low-temperature buffer layers

Low dislocation density ZnTe heteroepitaxial layers are achieved by inserting a thin ZnTe buffer layer at low growth temperature (LT-buffer) followed by annealing. The ZnTe heteroepitaxy layer with a LT-buffer shows a narrow line width of X-ray rocking curve as narrow as 42 arcsec in (0 0 4) reflect...

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Bibliographic Details
Published in:Journal of crystal growth Vol. 251; no. 1; pp. 596 - 601
Main Authors: Chang, Jiho, Godo, Kenji, Song, Junsuk, Oh, Dongcheol, Lee, Changwoo, Yao, Takafumi
Format: Journal Article Conference Proceeding
Language:English
Published: Amsterdam Elsevier B.V 01-04-2003
Elsevier
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Summary:Low dislocation density ZnTe heteroepitaxial layers are achieved by inserting a thin ZnTe buffer layer at low growth temperature (LT-buffer) followed by annealing. The ZnTe heteroepitaxy layer with a LT-buffer shows a narrow line width of X-ray rocking curve as narrow as 42 arcsec in (0 0 4) reflection and the dislocation density is estimated as 1.3×10 6 cm −2 . A cross-sectional view of transmission electron microscopy shows high structural quality of ZnTe layer with LT-buffers.
ISSN:0022-0248
1873-5002
DOI:10.1016/S0022-0248(03)00974-6