Search Results - "Smirnova, T. P."

MOCVD growth and characterization of vanadium dioxide films by Yakovkina, L. V., Mutilin, S. V., Prinz, V. Ya, Smirnova, T. P., Shayapov, V. R., Korol’kov, I. V., Maksimovsky, E. A., Volchok, N. D.

“…High-quality vanadium dioxide (VO 2 ) films were synthesized on sapphire and silicon substrates by metal–organic chemical vapor deposition. Optimal growth…”
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Synthesis and properties of dielectric (HfO2)1 − x(Sc2O3)x films by Yakovkina, L. V., Smirnova, T. P., Borisov, V. O., Kichai, V. N., Kaichev, V. V.

“…(HfO 2 ) 1 − x (Sc 2 O 3 ) x films have been grown by chemical vapor deposition (CVD) using the volatile complexes hafnium…”
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SiCN alloys obtained by remote plasma chemical vapour deposition from novel precursors by Smirnova, T.P., Badalian, A.M., Yakovkina, L.V., Kaichev, V.V., Bukhtiyarov, V.I., Shmakov, A.N., Asanov, I.P., Rachlin, V.I., Fomina, A.N.

“…Silicon carbonitride films were synthesised in a remote plasma chemical vapour deposition process using novel single-source precursors [(CH 3) 2HSiNHN(CH 3) 2…”
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Oxygen vacancy in Al2O3: Photoluminescence study and first-principle simulation by Pustovarov, V.A., Perevalov, T.V., Gritsenko, V.A., Smirnova, T.P., Yelisseyev, A.P.

“…Broad photoluminescence (PL) band at 2.97eV excited in the band near 6.0eV in amorphous chemical vapor deposition films is related to the neutral oxygen…”
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Phase composition of nanosized oxide film structures based on lanthanum and scandium doped HfO2 by Smirnova, T. P., Yakovkina, L. V., Borisov, V. O., Lebedev, M. S.

“…X-ray photoelectron spectroscopy, X-ray diffraction, and high-resolution transmission electron microscopy (over thickness profiling of the elemental and phase…”
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DEPOSITION OF HARD SILICON CARBONITRIDE COATINGS FROM HEXAMETHYLDISILAZANE (HMDS) AND HMDS+BENZENE VAPORS IN LASER PLASMA by Demin, V. N., Smirnova, T. P., Borisov, V. O., Grachev, G. N., Smirnov, A. L., Khomyakov, M. N.

“…Hard silicon carbonitride coatings are prepared using Ar and Ar (10 vol.% He) laser plasma from hexamethyldisilazane (HMDS) [(CH 3 ) 3 Si] 2 NH and…”
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Luminescence of intrinsic and extrinsic defects in hafnium oxide films by Rastorguev, A. A., Belyi, V. I., Smirnova, T. P., Yakovkina, L. V., Zamoryanskaya, M. V., Gritsenko, V. A., Wong, Hei

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Phase formation in double oxide films of Hf–La–O system by Smirnova, T.P., Yakovkina, L.V., Borisov, V.O.

“…Metal Organic Chemical Vapor Deposition method (MO CVD) has been developed for LaxHf1−xOy films of an assigned composition by co-deposition from vapors of…”
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The crystal structure of solid solutions formed in the HfO2-Sc2O3 nanoscale system by Smirnova, T.P., Saraev, A.A., Korolkov, I.V., Kitchai, V.N., Borisov, V.O.

“…•Phase formation in the Hf-Sc-O nano-system.•Impact of scandium concentration on the structural type of synthesized phases.•Approaches to phase…”
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New laser plasma process to obtain solid coatings and their structural characteristics by Demin, V. N., Smirnova, T. P., Borisov, V. O., Grachev, G. N., Smirnov, A. L., Khomyakov, M. N.

“…Carbon nitride coatings are synthesized in the new laser plasma of powerful optical pulsating discharge using acetonitrile as a precursor. A high-pressure and…”
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Physical-chemical properties of silicon carbonitride films prepared using laser-plasma deposition from hexamethyldisilazane by Demin, V. N., Smirnova, T. P., Borisov, V. O., Grachev, G. N., Smirnov, A. L., Khomyakov, M. N.

“…A new method of the plasma chemical vapor deposition with the activation of the initial compounds by the plasma of the CO 2 laser in the high-speed gas flow…”
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Plasma Deposition and Properties of Silicon Carbonitride Films by Smirnova, T. P., Badalyan, A. M., Borisov, V. O., Kaichev, V. V., Bakhturova, L. F., Kichai, V. N., Rakhlin, V. I., Shainyan, B. A.

“…A variety of advanced analytical techniques were used to characterize silicon carbonitride films grown from new volatile nitrogen-rich silyl derivatives of…”
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Composition and structure of hafnia films on silicon by Smirnova, T. P., Kaichev, V. V., Yakovkina, L. V., Kosyakov, V. I., Beloshapkin, S. A., Kuznetsov, F. A., Lebedev, M. S., Gritsenko, V. A.

“…Ellipsometry, electron microscopy, and x-ray photoelectron spectroscopy data indicate that, during HfO 2 deposition onto silicon, the native oxide reacts with…”
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Thermodynamic Approach to Optimization of SrTiO3 Chemical Vapor Deposition from Volatile Metalorganic Precursors by Golubenko, A N, Yakovkina, L V, Smirnova, T P, Shubin, Yu V, Morozova, N B, Danilovich, V S

“…Advances in silicon microelectronics are highly dependent on the miniaturization of electronic components, which is crucial for enhancing the integration…”
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Plasma-chemical deposition of SiCN films from volatile N-bromhexamethyldisilazane by Smirnova, T. P., Badalian, A. M., Borisov, V. O., Bakhturova, L. F., Kaichev, V. V., Podgorbunskaya, T. A., Rakhlin, V. I.

“…Process of silicon-carbonitride (SiCN) film production from a new volatile organosilicon, N-bromhexamethyldisilazane, is developed. The use of this chemical…”
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Effect of the chemical structure of silyl derivatives of unsymmetrical dimethylhydrazine on the composition and structure of silicon carbonitride films: Theoretical and experimental studies by Smirnova, T. P., Shainyan, B. A., Borisov, V. O., Rakhlin, V. I.

“…Quantum-chemical calculations are used to analyze the homolytic decomposition of 1,1-dimethyl-2-(dimethylhydrazino)silane (DMDMHS) and…”
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Intrinsic and defect related luminescence in double oxide films of Al–Hf–O system under soft X-ray and VUV excitation by Pustovarov, V.A., Smirnova, Т.P., Lebedev, M.S., Gritsenko, V.A., Kirm, M.

“…Low temperature time-resolved luminescence spectra in the region of 2.5–9.5eV under soft X-ray excitation as well as time-resolved luminescence excitation…”
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Preparation and Properties of Thin HfO2 Films by Yakovkina, L. V., Kichai, V. N., Smirnova, T. P., Kaichev, V. V., Shubin, Yu. V., Morozova, N. B., Zherikova, K. V., Igumenov, I. K.

“…HfO2 layers were grown on silicon by metalorganic chemical vapor deposition using (C5H5)2Hf(CH3)2, (C5H5)2Hf(N(C2H5)2)2, and Hf(dpm)4 as volatile precursors…”
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Impact of lanthanum on the modification of HfO sub(2) films structure by Smirnova, T P, Yakovkina, L V, Borisov, V O

“…La sub(x)Hf sub(1-x)O sub(y) thin films with various concentrations of La, homogeneous and nonhomogeneous distributions of elements throughout the films…”
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Structure, chemistry and luminescence properties of dielectric LaxHf1-xOy films by Kaichev, V.V., Smirnova, T.P., Yakovkina, L.V., Ivanova, E.V., Zamoryanskaya, M.V., Saraev, A.A., Pustovarov, V.A., Perevalov, T.V., Gritsenko, V.A.

“…Dielectric films of La2O3, HfO2, and LaxHf1-xOy were synthesized by metal-organic chemical vapor deposition. Structural, chemical, and luminescence properties…”
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