Search Results - "Sirse, N."

Surface loss rates of H and Cl radicals in an inductively coupled plasma etcher derived from time-resolved electron density and optical emission measurements by Curley, G. A., Gatilova, L., Guilet, S., Bouchoule, S., Gogna, G. S., Sirse, N., Karkari, S., Booth, J. P.

“…A study is undertaken of the loss kinetics of H and Cl atoms in an inductively coupled plasma (ICP) reactor used for the etching of III-V semiconductor…”
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Plasma Sources and Diagnostic Solution for Investigating Laboratory Plasmas by Karkari, Shantanu K., Patil, Y., Pandey, Avnish K., Das, S., Singh, Pawandeep, Dahiya, Swati, Sirse, N.

“…Laboratory plasma experiments serve as an essential tool for mimicking complicated phenomena seen in space plasma and at the plasma-material interface…”
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Photo-detachment signal analysis to accurately determine electronegativity, electron temperature, and charged species density by Oudini, N., Sirse, N., Taccogna, F., Ellingboe, A. R., Bendib, A.

“…Laser pulse induced photo-detachment combined with Langmuir probing has been introduced to diagnose plasma electronegativity. This technique uses a laser pulse…”
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Electro-negative plasma diagnostic using pulse bias hairpin probe by Sirse, N., Karkari, S. K., Turner, M. M.

“…Electro-negative plasmas are widely used in plasma processing, ion source for neutral beam heating in fusion devices, plasma etching and ion Hall thrusters…”
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Gas temperature measurement in Ar and Ar-Cl2 based ICP discharge: Comparison between experiments and simulations by Sirse, N., Delivre, Q., Booth, J. P., Chabert, P.

“…Summary form only given. Gas temperature is an important parameter for the study of discharge modeling and in plasma etching process. We present neutral gas…”
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Electric field filamentation and higher harmonic generation in a very high frequency capacitive discharges by Sharma, Sarveshwar, Sirse, N, Sen, A, Wu, J. S, Turner, M. M

“…The effects of the discharge voltage on the formation and nature of electric field transients in a symmetric, collisionless, very high frequency, capacitively…”
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Influence of driving frequency on the metastable atoms and electron energy distribution function in a capacitively coupled argon discharge by Sharma, S, Sirse, N, Turner, M. M, Ellingboe, A. R

“…One-dimensional particle-in-cell simulation is used to simulate the capacitively coupled argon plasma for a range of driving frequency from 13.56 MHz to 100…”
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Plasma density and ion energy control via driving frequency and applied voltage in a low pressure capacitively coupled plasma discharge by Sharma, Sarveshwar, Sen, Abhijit, Sirse, N, Turner, M. M, Ellingboe, A. R

“…The dynamical characteristics of a single frequency low pressure capacitively coupled plasma (CCP) device under varying applied RF voltages and driving…”
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