Large area deposition of a-Si PV modules

Large area deposition of a-Si PV modules

Large-area deposition scaling-up (from 30*30 to 50*60 and 60*100 m/sup 2/) is reported within the context of PV (photovoltaic) industrial development. Production-oriented deposition machine specifications are described, and the various technical solutions are discussed. The selected solutions such a...

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Bibliographic Details
Published in:IEEE Conference on Photovoltaic Specialists pp. 1670 - 1673 vol.2
Main Authors: Boman, L., Bubenzer, A., Meot, J., Schmitt, J.P.M., Siefert, J.M.
Format: Conference Proceeding
Language:English
Published: IEEE 1990
Subjects:
Cleaning
Etching
Impurities
Machinery production industries
Noise measurement
Photovoltaic systems
Plasma applications
Plasma density
Plasma materials processing
Solar power generation
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Summary:Large-area deposition scaling-up (from 30*30 to 50*60 and 60*100 m/sup 2/) is reported within the context of PV (photovoltaic) industrial development. Production-oriented deposition machine specifications are described, and the various technical solutions are discussed. The selected solutions such as plasma box and plasma etching were investigated in full-scale experiments, and illustrative results are presented. An NF/sub 3/ etching process was developed and optimized in order to match the maintenance requirements of the production machines. Thanks to this cleaning process, a very low point defect density is demonstrated (>1/ft/sup 2/). The thickness uniformity is shown to be better than +or-5%. Material quality is also uniform, which is demonstrated by a mapping of the microcrystalline transition. The plasma box concept is shown to reach very low impurity contamination levels in a classical vacuum machine, comparable to what is obtained in ultrahigh-vacuum technology.< >
DOI:10.1109/PVSC.1990.111893