Spatial Profiles Of Plasma Properties In Planar Rf Inductive Discharges - 1) Role Of Chamber Length And 2) Anisotropy Of Electron Velocity Distributions

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Bibliographic Details
Published in:	Proceedings of 1994 IEEE 21st International Conference on Plasma Sciences (ICOPS) p. 107
Main Authors:	Mahoney, L.J., Wendt, A.E., Shohet, J.I.
Format:	Conference Proceeding
Language:	English
Published:	IEEE 1994
Subjects:	Electrons Plasma applications Plasma density Plasma materials processing Plasma measurements Plasma properties Plasma temperature Plasma transport processes Probes Radio frequency
Online Access:	Get full text
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