Oxidation behavior of NiAl alloy at low temperatures

Oxidation behavior of NiAl alloy at low temperatures

Oxidation behavior of NiAl alloy at low temperatures was studied. A NiAl plate was oxidized by exposure to ambient atmosphere at room temperature, heated at 473 K in air, and heated at 773 K in air. The oxide formed on the NiAl surface was investigated by angle‐resolved X‐ray photoelectron spectrosc...

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Bibliographic Details
Published in:Surface and interface analysis Vol. 39; no. 6; pp. 528 - 532
Main Authors: Ohtsu, Naofumi, Oku, Masaoki, Obara, Kazuo, Ito, Shun, Shisido, Toetsu, Wagatsuma, Kazuaki
Format: Journal Article
Language:English
Published: Chichester, UK John Wiley & Sons, Ltd 01-06-2007
Wiley
Subjects:
angle-resolved XPS
Applied sciences
Composition and phase identification
Condensed matter: electronic structure, electrical, magnetic, and optical properties
Condensed matter: structure, mechanical and thermal properties
Cross-disciplinary physics: materials science; rheology
Electron and ion emission by liquids and solids; impact phenomena
Exact sciences and technology
factor analysis
initial-stage oxidation
Materials science
Metals. Metallurgy
NiAl alloy
Oxidation
Photoemission and photoelectron spectra
Physics
Surface treatments
Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)
Thin film structure and morphology
initial-stage oxidation
Inorganic compounds
Factor analysis
Angular resolution
Surface composition
Thickness
Binary alloys
Thermodynamic model
NiAl alloy
Oxidation
angle-resolved XPS
Double layers
Transition element alloys
Low temperature
X-ray photoelectron spectra
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Summary:Oxidation behavior of NiAl alloy at low temperatures was studied. A NiAl plate was oxidized by exposure to ambient atmosphere at room temperature, heated at 473 K in air, and heated at 773 K in air. The oxide formed on the NiAl surface was investigated by angle‐resolved X‐ray photoelectron spectroscopy (AR‐XPS). Chemical composition and atomic concentration in the oxide layer were analyzed with factor analysis of XPS spectra. Exposure of the NiAl plate to the ambient atmosphere resulted in the formation of an Al2O3 layer along with a small amount of NiO. Oxidation of the NiAl plate at 473 K in air formed a film of double‐layered oxide; the top layer consisted of NiAl2O4 and a small amount of NiO, and the second layer was Al2O3. Successive oxidation at 773 K only changed the oxide‐layer thickness without changing the structure. Formation of oxide observed in the present study corresponds to the thermodynamic prediction for the oxidation behavior of NiAl at 1373 K. Copyright © 2007 John Wiley & Sons, Ltd.
Bibliography:ark:/67375/WNG-S7JN47X2-0
istex:BDE1338FB2635EAB97489F742E698BE917147BC8
ArticleID:SIA2558
ObjectType-Article-2
SourceType-Scholarly Journals-1
ObjectType-Feature-1
content type line 23
ISSN:0142-2421
1096-9918
DOI:10.1002/sia.2558