Pulsed laser deposition of ITO thin films and their characteristics

The indium tin oxide (ITO) thin films are grown on quartz glass substrates by the pulsed laser deposition method. The structural, electrical, and optical properties of ITO films are studied as a function of the substrate temperature, the oxygen pressure in the vacuum chamber, and the Sn concentratio...

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Bibliographic Details
Published in:	Semiconductors (Woodbury, N.Y.) Vol. 46; no. 3; pp. 410 - 413
Main Authors:	Zuev, D. A., Lotin, A. A., Novodvorsky, O. A., Lebedev, F. V., Khramova, O. D., Petuhov, I. A., Putilin, Ph. N., Shatohin, A. N., Rumyanzeva, M. N., Gaskov, A. M.
Format:	Journal Article
Language:	English
Published:	Dordrecht SP MAIK Nauka/Interperiodica 01-03-2012 Springer
Subjects:	Dielectric films Electric properties ENERGY BEAM DEPOSITION Fabrication GLASS INDIUM LASER RADIATION Magnetic Materials Magnetism MATERIALS SCIENCE OPTICAL PROPERTIES Physics Physics and Astronomy SUBSTRATES Testing of Materials and Structures THIN FILMS TIN OXIDES Treatment Substrate Temperature Pulse Laser Deposition Pulse Laser Deposition Method Thin Solid Film Visible Spectral Region
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Summary:	The indium tin oxide (ITO) thin films are grown on quartz glass substrates by the pulsed laser deposition method. The structural, electrical, and optical properties of ITO films are studied as a function of the substrate temperature, the oxygen pressure in the vacuum chamber, and the Sn concentration in the target. The transmittance of grown ITO films in the visible spectral region exceeds 85%. The minimum value of resistivity 1.79 × 10 −4 Ω cm has been achieved in the ITO films with content of Sn 5 at %.
ISSN:	1063-7826 1090-6479
DOI:	10.1134/S1063782612030256