Search Results - "Shamamian, V."

Guided resonances in asymmetrical GaN photonic crystal slabs observed in the visible spectrum by Rosenberg, A, Carter, Michael, Casey, J, Kim, Mijin, Holm, Ronald, Henry, Richard, Eddy, Charles, Shamamian, V, Bussmann, K, Shi, Shouyuan, Prather, Dennis

“…We demonstrate that guided resonant modes can be readily observed in asymmetrical photonic crystal slabs on high-index substrates. In spite of the high…”
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Dense Medium Plasma Environments:  A New Approach for the Disinfection of Water by Manolache, S, Somers, E. B, Wong, A. C. L, Shamamian, V, Denes, F

“…The levels to which microbial colony forming units are permitted in various waters fit for human contact are carefully regulated. Conventional chemical and…”
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Characterization of the CH4/H2/Ar high density plasma etching process for HgCdTe by EDDY, C. R, LEONHARDT, D, SHAMAMIAN, V. A, MEYER, J. R, HOFFMAN, C. A, BUTLER, J. E

“…High density plasma etching of mercury cadmium telluride using CH4/H2/Ar plasma chemistries is investigated. Mass spectrometry is used to identify and monitor…”
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Characterization of the CH4/H2/Ar high density plasma etching process for ZnSe by EDDY, C. R, LEONHARDT, D, SHAMAMIAN, V. A, BUTLER, J. E

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Guided resonances in asymmetrical GaN photonic crystal slabs observed in the visible spectrum by Rosenberg, A., Carter, Michael W., Casey, J. A., Kim, Mijin, Holm, Ronald T., Henry, Richard L., Eddy, Charles R., Shamamian, V. A., Bussmann, K., Shi, Shouyuan, Prather, Dennis W.

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Treatment of Methyl tert-Butyl Ether Contaminated Water Using a Dense Medium Plasma Reactor:  A Mechanistic and Kinetic Investigation by Johnson, Derek C, Shamamian, Vasgen A, Callahan, John H, Denes, Ferencz S, Manolache, Sorin O, Dandy, David S

“…Plasma treatment of contaminated water appears to be a promising alternative for the oxidation of aqueous organic pollutants. This study examines the kinetic…”
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Gallium arsenide surface chemistry and surface damage in a chlorine high density plasma etch process by Eddy, C. R., Glembocki, O. J., Leonhardt, D., Shamamian, V. A., Holm, R. T., Thoms, B. D., Butler, J. E., Pang, S. W.

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Mass spectrometry sampling method for characterizing high-density plasma etching mechanisms by Eddy, C. R., Leonhardt, D., Shamamian, V. A., Butler, J. E., Thoms, B. D.

“…Mass spectrometry sampling using a “through-the-platen” technique is described with respect to its utility in characterizing high-density plasma etching…”
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Characterization of Cl 2 /Ar high density plasmas for semiconductor etching by Eddy, C. R., Leonhardt, D., Douglass, S. R., Thoms, B. D., Shamamian, V. A., Butler, J. E.

“…Chlorine-based high density plasmas, commonly used in the etching of elemental and compound semiconductors, are characterized using mass spectrometry, optical…”
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Combustion chemistry in premixed C2F4-O2 flames by DOUGLASS, C. H, LADOUCEUR, H. D, SHAMAMIAN, V. A, MCDONALD, J. R

“…The flame speed and combustion product distribution in a premixed C2F4-O2 flame at atmospheric pressure have been measured and are compared with computational…”
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Surface chemistry and damage in the high density plasma etching of gallium arsenide by Leonhardt, D., Eddy, C. R., Shamamian, V. A., Holm, R. T., Glembocki, O. J., Butler, J. E.

“…Anisotropic pattern transfer with low damage in compound semiconductor dry etching requires an in depth understanding of the chemical processes that occur at…”
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Two-dimensional model of a large area, inductively coupled, rectangular plasma source for chemical vapor deposition by Giuliani, J.L., Shamamian, V.A., Thomas, R.E., Apruzese, J.P., Mulbrandon, M., Rudder, R.A., Hendry, R.C., Robson, A.E.

“…A novel design for an inductively coupled, rectangular plasma source is described. The design encompasses several key issues of large area thin film growth by…”
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Decomposition of trimethylgallium on the gallium-rich GaAs (100) surface : implications for atomic layer epitaxy by CREIGHTON, J. R, LYKKE, K. R, SHAMAMIAN, V. A, KAY, B. D

“…The decomposition of trimethylgallium (TMGa) on the gallium-rich (4×6) and (1×6) GaAs (100) surface was studied with temperature programmed desorption, Auger…”
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Using Ni masks in inductively coupled plasma etching of high density hole patterns in GaN by Hsu, David S. Y., Kim, Chul Soo, Eddy, Charles R., Holm, Ronald T., Henry, Richard L., Casey, J. A., Shamamian, V. A., Rosenberg, A.

“…High density patterns of holes in metalorganic chemical vapor deposition grown GaN films on sapphire have been fabricated by inductively coupled plasma etching…”
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Kinetic effects in the chemistry of diamond CVD source gases and implications for diamond growth by Sinkovits, Robert S., DeVore, C. Richard, Shamamian, Vasgen A.

“…Perfectly stirred reactor calculations have been carried out on six different gas mixtures containing ethanol, water, methane, acetylene, oxygen and hydrogen…”
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Dense Medium Plasma-Plasma-Enhanced Decontamination of Water of Aromatic Compounds by Manolache, Sorin, Shamamian, Vasgen, Denes, Ferencz

“…Artificially contaminated water with aromatic compounds, including benzene, ethylbenzene, and xylenes, was exposed to dense medium plasma (DMP) environments in…”
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Ion Energy Effects on Surface Chemistry and Damage in a High Density Plasma Etch Process for Gallium Arsenide by Leonhardt, Darrin, Eddy, Charles R., Shamamian, Jr, Holm, Ronald T., Glembocki, Orest J., Thoms, Brian D., Katzer, Daniel S., Butler, James E.

“…Etch product chlorides from a gallium arsenide substrate subjected to a high density Cl 2 /Ar plasma etching process have been sampled in situ to determine…”
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An analysis of gas phase ethanol-water chemistry for diamond CVD by Sinkovits, Robert S., DeVore, C.Richard, Shamamian, Vasgen A., Westbrook, Charles K.

“…Chemical kinetics calculations were carried out on ethanol (EtOH)-water mixtures at a range of temperatures, pressures and EtOH-to-H 2O ratios. The results…”
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Speed ratios greater than 1000 and temperatures less than 1 mK in a pulsed he beam by WANG, J, SHAMAMIAN, V. A, THOMAS, B. R, WILKINSON, J. M, RILEY, J, GIESE, C. F, GENTRY, W. R

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Characterization of Cl2/Ar high density plasmas for semiconductor etching by Eddy, C. R., Leonhardt, D., Douglass, S. R., Thoms, B. D., Shamamian, V. A., Butler, J. E.

“…Chlorine-based high density plasmas, commonly used in the etching of elemental and compound semiconductors, are characterized using mass spectrometry, optical…”
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