Search Results - "Setoyama, E."

Sequence stratigraphic and petrological analyses of the Cambrian oncoids exposed in the Liaoning Province, North China Platform by Xiao, E. Z., Jiang, S., Zafar, T., Riaz, M., Latif, K., Setoyama, E., Wang, H., Xin, H.

“…The Cambrian Miaolingian Series strata are continuously exposed in the North China Platform and contain diverse sedimentary phenomena, including substantial…”
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Neogene Benthic Foraminifera from the southern Bering Sea (IODP Expedition 323) by Setoyama, E, Kaminski, MA

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Triassic and Jurassic possible planktonic foraminifera and the assemblages recovered from the Ogrodzieniec Glauconitic Marls Formation (uppermost Callovian and lowermost Oxfordian, Jurassic) of the Polish Basin by Hart, Malcolm B., Gebhardt, Holger, Setoyama, Eiichi, Smart, Christopher W., Tyszka, Jarosław

“…In the 1960s and 1970s Werner Fuchs of the Austrian Geological Survey (Vienna) described a significant number of new foraminiferal taxa that he considered…”
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Development of a locally electron-heated plasma source by Seki, H., Kitazawa, S., Ueno, Y., Wada, N., Takemori, S., Sato, T., Uchikawa, S., Setoyama, E.

“…A new type high-density plasma source has been developed. It employs a 2.45-GHz microwave in combination with permanent magnets which surround microwave ports…”
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Development of a locally-electron-heated plasma source for HDP-CVD process by Seki, H., Ueno, Y., Ichimura, S., Takemori, S., Uchikawa, S., Murakamia, H., Okada, S., Mochizuki, Y., Setoyama, E.

“…A new ECR plasma source has been developed. ECR regions are produced locally by permanent magnets placed around the chamber. Microwaves enter the chamber…”
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Composition distribution and magnetic characteristics of sputtered Permalloy films with substrate angle by Nakagawa, Y., Ohshita, Y., Narishige, S., Setoyama, E.

“…Permalloy sputtered films for a thin magnetic head are deposited under precisely controlled conditions. The head pattern on a substrate shows not only a flat…”
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Stress reduction of chromium thin films deposited by cluster-type sputtering system for ultra-large-size (550 x 650 mm) substrates: Selected papers revised from the proceedings of the fourth international symposium on sputtering and plasma processes (ISSP'97) by NAKAJIMA, K, ONISAWA, K.-I, CHAHARA, K.-I, MINEMURA, T, KAMEI, M, SETOYAMA, E

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Development of a locally-electron-heated plasma source for HDP-CVD process: Selected papers revised from the proceedings of the fourth international symposium on sputtering and plasma processes (ISSP'97) by SEKI, H, UENO, Y, ICHIMURA, S, TAKEMORI, S, UCHIKAWA, S, MURAKAMIA, H, OKADA, S, MOCHIZUKI, Y, SETOYAMA, E

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Stress reduction of chromium thin films deposited by cluster-type sputtering system for ultra-large-size (550×650 mm) substrates by Nakajima, Katsunori, Onisawa, Ken-ichi, Chahara, Ken-ichi, Minemura, Tetsuroh, Kamei, Mitsuhiro, Setoyama, Eiji

“…In order to reduce the intrinsic tensile stress in sputtered Cr films, the relationship between sputtering condition and the stress properties was…”
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Higher Harmonics in Backscattering of Laser Light from the TEA CO2 Laser-Produced Plasma by Yokoyama, Masahiro, Yamabe, Chobei, Setoyama, Eiji, Thein, Aye, Yamanaka, Chiyoe

“…Higher harmonics in backscattered laser light from the CO2 laser produced plasma were investigated. They were in the frequency range of (3/2)ω0 and 2ω0, when…”
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