Search Results - "Selwyn, Gary S."

Anti-SARS-CoV-2 Activity of Surgical Masks Infused with Quaternary Ammonium Salts by Selwyn, Gary S., Ye, Chunyan, Bradfute, Steven B.

“…The SARS-CoV-2 pandemic has highlighted the need for protective and effective personal protective equipment (PPE). Research has shown that SARS-CoV-2 can…”
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Reaction Chemistry in the Afterglow of an Oxygen−Helium, Atmospheric-Pressure Plasma by Jeong, James Y, Park, Jaeyoung, Henins, Ivars, Babayan, Steve E, Tu, Vincent J, Selwyn, Gary S, Ding, Guowen, Hicks, Robert F

“…The reaction chemistry in the afterglow of a non-equilibrium, capacitive discharge, operated at 600 Torr total pressure with (0.5 to 5.0) × 1017 cm-3 of oxygen…”
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A phenomenlogical study of particulates in plasma tools and processes by SELWYN, G. S

“…Particle contamination in a variety of plasma processes and tools has been studied using a real-time, in-situ detection technique, rastered laser light…”
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Chemical warfare agent decontamination studies in the plasma decon chamber by Herrmann, H.W., Selwyn, G.S., Henins, I., Jaeyoung Park, Jeffery, M., Williams, J.M.

“…A "plasma decon chamber" has been developed at Los Alamos National Laboratory (LANL), Albuquerque, NM, to study the decontamination of chemical and biological…”
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Particle trapping phenomena in radio frequency plasmas by SELWYN, G. S, HEIDENREICH, J. E, HALLER, K. L

“…Particles generated in an argon plasma and suspended at the plasma/sheath boundary are localized by lateral trapping fields. In the commercial rf etching…”
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Plasma particulate contamination control. II. Self‐cleaning tool design by Selwyn, Gary S., Patterson, Edward F.

“…Macroscopic particles are often observed in etching, sputtering, and deposition plasmas, in laboratory and manufacturing tools, in concentrations far exceeding…”
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Rastered laser light scattering studies during plasma processing: Particle contamination trapping phenomena by Selwyn, Gary S., Heidenreich, John E., Haller, Kurt L.

“…The distribution and transport of particles in materials processing plasmas has been studied with a rastered laser light scattering technique. Contrary to…”
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In-situ analysis of particle contamination in magnetron sputtering processes by Selwyn, Gary S, Weiss, Corey A, Sequeda, Federico, Huang, Carrie

“…Defects caused by particulate contamination are an important concern in the fabrication of thin film products. Often, magnetron sputtering processes are used…”
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Particle contamination characterization in a helicon plasma etching tool by Selwyn, Gary S., Bailey, Andrew D.

“…There is much current interest regarding the formation, transport, charging, and behavior of particulate contamination in high density plasma tools, as these…”
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Trapping and behavior of particulates in a radio frequency magnetron plasma etching tool by Selwyn, Gary S., Haller, Kurt L., Patterson, Edward F.

“…Particle contamination has been studied in a commercial, magnetron reactive ion etching tool using rastered laser light scattering. Particles present in the…”
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The atmospheric-pressure plasma jet: a review and comparison to other plasma sources by Schutze, A., Jeong, J.Y., Babayan, S.E., Jaeyoung Park, Selwyn, G.S., Hicks, R.F.

“…Atmospheric-pressure plasmas are used in a variety of materials processes. Traditional sources include transferred arcs, plasma torches, corona discharges, and…”
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Detection of Cl and chlorine-containing negative ions in rf plasmas by two-photon laser-induced fluorescence by SELWYN, G. S, BASTON, L. D, SAWIN, H. H

“…Chlorine atoms have been detected in rf etching plasmas of CClF3 and CCl2F2 with three-dimensional spatial resolution using a two-photon laser-induced…”
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Plasma‐enhanced photoemission in argon discharges: Signal characterization and silicon doping effects by Selwyn, Gary S., Singh, J.

“…The recently reported technique of plasma‐enhanced photoemission (PEP) provides capability for i n s i t u, noncontact and rapid monitoring of the surface of a…”
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Plasma particulate contamination control. I. Transport and process effects by Selwyn, Gary S.

“…The transport and behavior of particulates during plasma processing is imaged in real time using rastered laser light scattering combined with video detection…”
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Chemical warfare agent decontamination studies in the plasma decon chamber: Special issue on nonthermal medical/biological applications of ionized gases and electromagnetic fields by HERRMANN, Hans W, SELWYN, Gary S, HENINS, Ivars, PARK, Jaeyoung, JEFFERY, Mark, WILLIAMS, John M

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Particle contamination formation in magnetron sputtering processes by Selwyn, Gary S., Weiss, Corey A., Sequeda, Federico, Huang, Carrie

“…Defects caused by particulate contamination are an important concern in the fabrication of thin film products. Often, magnetron sputtering processes are used…”
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Laser diagnostic techniques for reactive ion etching: Plasma understanding to process control by Selwyn, Gary S.

“…Reactive ion etching is the current process of choice for production of high‐speed integrated circuits; yet the development and use of this technology has…”
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Atomic arsenic detection by ArF laser-induced fluorescence by SELWYN, G. S

“…Arsenic atoms sputtered from gallium arsenide wafers or arsenic-doped n-type silicon wafers have been detected in argon plasmas using the laser-induced…”
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I n s i t u plasma contamination measurements by HeNe laser light scattering: A case study by Selwyn, Gary S., McKillop, J. S., Haller, Kurt L., Wu, J. J.

“…Using a simple, inexpensive HeNe laser and a video camera to measure light scattering intensity and location, particulate contamination in an SiO2 sputtering…”
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Plasma-enhanced photoemission detection: a new method for real-time surface monitoring during plasma processing by Selwyn, G. S., Singh, J.

“…A technique for characterization of semiconductor surfaces during plasma exposure, plasma-enhanced photoemission (PEP) detection, which is compatible with…”
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