Search Results - "Seaung-Suk Lee"
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Modeling of [Formula Omitted] Shift in nand Flash-Memory Cell Device Considering Crosstalk and Short-Channel Effects
Published in IEEE transactions on electron devices (01-04-2008)“…A threshold-voltage (V sub(th)) shift of sub-100-nm NAND flash-memory cell transistors was modeled systematically, and the modeling was verified by comparing…”
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New Charge Pumping Method for Characterization of Charge Trapping Layer in Oxide–Nitride–Oxide Structure
Published in Japanese Journal of Applied Physics (01-04-2008)Get full text
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Modeling of Vth Shift in NAND Flash-Memory Cell Device Considering Crosstalk and Short-Channel Effects
Published in IEEE transactions on electron devices (01-04-2008)Get full text
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Imprint Characteristics of Ferroelectric Thin Films at Elevated Storage and Operation Temperatures
Published in Japanese Journal of Applied Physics (01-11-2002)“…The imprint characteristics of SrBi2Ta2O9 (SBT) and Bi4-xLaxTi3O12 (BLT) thin films have been studied at elevated storage and operation temperatures for the…”
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A hierarchy bitline boost scheme for sub-1.5 V operation and short precharge time on high density FeRAM
Published in 2002 IEEE International Solid-State Circuits Conference. Digest of Technical Papers (Cat. No.02CH37315) (2002)“…This work develops three concepts: low-voltage operation with boost voltage control of bitline and plateline, reduced bitline capacitance with multiple divided…”
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Issues and Reliability of High-Density FeRAMs
Published in Japanese Journal of Applied Physics (2003)“…Authors discuss technical issues on the realization of high-density ferroelectric random access memory (FeRAM). Due to reliability concerns of ferroelectric…”
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Highly reliable 26nm 64Gb MLC E2NAND (Embedded-ECC & Enhanced-efficiency) flash memory with MSP (Memory Signal Processing) controller
Published in 2011 Symposium on VLSI Technology - Digest of Technical Papers (01-06-2011)“…A highly reliable 26nm 64GB MLC E2NAND (E2: Embedded-ECC & Enhanced-efficiency) flash memory has been successfully developed. To overcome scaling challenges,…”
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Conference Proceeding -
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Modeling of V Shift in nand Flash-Memory Cell Device Considering Crosstalk and Short-Channel Effects
Published in IEEE transactions on electron devices (01-04-2008)“…A threshold-voltage (V th ) shift of sub-100-nm NAND flash-memory cell transistors was modeled systematically, and the modeling was verified by comparing with…”
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Preparation of (Pb088La0.12)TiO3 thin films for dynamic random access memory by low pressure-metalorganic chemical vapor deposition
Published in Journal of electronic materials (01-08-1995)Get full text
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Effect of annealing conditions on the microstructure of RuO2 thin films deposited by metalorganic chemical vapor deposition
Published in Integrated ferroelectrics (01-09-1997)“…Ruthenium dioxide thin films were deposited on SiO 2 /Si substrate at low temperatures by hot-wall metalorganic chemical vapor deposition using the ruthenocene…”
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Characterization of SrBi2Ta2O9 ferroelectric thin films deposited at low temperatures by plasma-enhanced metalorganic chemical vapor deposition
Published in Applied physics letters (07-07-1997)“…Ferroelectric bismuth-layer SrBi2Ta2O9(SBT) thin films were prepared on Pt/Ti/SiO2/Si substrate by plasma-enhanced metalorganic chemical vapor deposition. The…”
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A CELL MODEL FOR NON-VOLATILE RANDOM ACCESS MEMORY AND A SUBSEQUENT METHOD FOR INCREASING DENSITY
Published in Integrated ferroelectrics (14-05-2007)“…A cell model for non-volatile random access memory (RAM) is suggested in this study. An indicator, a cell, was introduced to simplify the explanation. If the…”
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Characterization of Low Frequency Noise in Floating Gate NAND Flash Memory
Published in 2008 Joint Non-Volatile Semiconductor Memory Workshop and International Conference on Memory Technology and Design (01-05-2008)“…We have characterized the low frequency noise (LFN) in the NAND flash memory string, for the first time, and shown its fundamental properties. As a result, the…”
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Conference Proceeding -
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Modeling and Characterization of Program / Erasure Speed and Retention of TiN-gate MANOS (Si-Oxide-SiNx-Al2O3-Metal Gate) Cells for NAND Flash Memory
Published in 2007 22nd IEEE Non-Volatile Semiconductor Memory Workshop (01-08-2007)“…In this study, physical properties of different trapping nitrides were extracted, and the program efficiency of MANOS cell was explained. We also showed…”
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Conference Proceeding -
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FERROELECTRIC MEMORIES USING RANDOMLY ORIENTED (Bi1-xLax)4Ti3O12 FILMS
Published in Japanese Journal of Applied Physics, Part 1 (2003)“…Authors report on superior reliabilities at high temperature of ferroelectric memories using [Bi1-xLax]4Ti3O12 (BLT) films, which are randomly oriented by…”
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Imprint Characteristics of Bi-Layered Perovskite Ferroelectric Thin Films
Published in Integrated ferroelectrics (01-01-2003)“…The imprint characteristics of SrBi 2 Ta 2 O 9 , SBT, and (Bi 0.8 La 0.2 ) 4 Ti 3 O 12 , BLT, thin film capacitors have been evaluated at the storage…”
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Characterization of Hynix 16M Feram Adopted Novel Sensing Scheme
Published in Integrated ferroelectrics (01-01-2003)“…16M FeRAM was successfully developed using a (Bi 1 − X La X ) 4 Ti 3 O 12 , BLT, film with excellent imprint characteristic as a ferroelectric film to decrease…”
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CHARACTERIZATION OF POLARIZATION SWITCHING BEHAVIOR OF Pt/SrBi2Ta2O9/Pt FERROELECTRIC CAPACITORS IN FERROELECTRIC RANDOM ACCESS MEMORY
Published in Jpn.J.Appl.Phys ,Part 1. Vol. 41, no. 2A, pp. 694-697. 2002 (2002)“…Authors investigated on the polarization switching behavior of Pt/SrBi2Ta2O9/Pt ferroelectric capacitors for ferroelectric random access memory (FeRAM)…”
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A Current-Gain Scheme for High Density and Low Voltage FeRAM
Published in Integrated ferroelectrics (01-01-2003)“…The proposed current-gain scheme provides a key technical solution for a high density, low cost and high performance ferroelectric random access memory. The…”
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