Search Results - "Schmitt, J. P. M."
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A fully automated hot‐wall multiplasma‐monochamber reactor for thin film deposition
Published in Journal of vacuum science & technology. A, Vacuum, surfaces, and films (01-07-1991)“…We present a study on the development and the evaluation of a fully automated radio‐frequency glow discharge system devoted to the deposition of amorphous thin…”
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Journal Article -
2
Silane dissociation mechanisms and thin film formation in a low pressure multipole dc discharge
Published in Applied physics letters (01-01-1980)“…A silane plasma is generated by a hot cathode dc discharge in a partially confining multipolar magnetic structure yielding hydrogenated amorphous silicon thin…”
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Journal Article -
3
Growth of hydrogenated amorphous silicon due to controlled ion bombardment from a pure silane plasma
Published in Applied physics letters (01-05-1983)“…The growth process, optical and structural properties of a-Si:H films deposited from a silane multipole dc discharge are analyzed by real time and…”
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Journal Article -
4
Dispersion and Cyclotron Damping of Pure Ion Bernstein Waves
Published in Physical review letters (15-10-1973)“…Ion Bernstein waves are excited by a long wire in the center of a potassium Q-machine plasma column. Because the wave vector is very nearly perpendicular to…”
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Journal Article -
5
Development of a numerical simulation tool to study uniformity of large area PECVD film processing
Published in Thin solid films (03-03-2003)“…A numerical two dimensional model to calculate the deposition uniformity over the whole electrode surface in large area rectangular plasma enhanced chemical…”
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Journal Article Conference Proceeding -
6
Mode Conversion and Plasma Column Resonances in the Ion-Cyclotron Harmonics Range
Published in Physical review letters (20-09-1976)“…Results are reported for an experiment in which an extraordinary wave was excited in a plasma column with a long RF coil, and linear conversion from the…”
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Journal Article -
7
Measurements and consequences of nonuniform radio frequency plasma potential due to surface asymmetry in large area radio frequency capacitive reactors
Published in Journal of vacuum science & technology. A, Vacuum, surfaces, and films (01-07-2005)“…In large area reactors, a local asymmetry of the electrode area, due to lateral grounded walls, causes a perturbation in rf plasma potential, due to the…”
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Journal Article -
8
A fully automated hot-wall multiplasma-monochamber reactor for thin film deposition
Published in Journal of vacuum science & technology. A, Vacuum, surfaces, and films (01-07-1997)“…We present a study on the development and the evaluation of a fully automated radio-frequency glow discharge system devoted to the deposition of amorphous thin…”
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Journal Article -
9
Fluctuation in the ion-cyclotron-frequency range - Possible measurement of Te/Ti in tokamaks
Published in Physical review letters (06-10-1980)“…The thermal density fluctuations in a typical tokamak plasma, for a wave vector perpendicular to the magnetic field and for a wavelength of the order of the…”
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Journal Article -
10
Fluctuations in the Ion-Cyclotron-Frequency Range: Possible Measurement of T e T i in Tokamaks
Published in Physical review letters (01-10-1980)Get full text
Journal Article