Search Results - "Schellenberg, F. M."

Adoption of OPC and the impact on design and layout by Schellenberg, F. M., Toublan, Olivier, Capodieci, Luigi, Socha, Bob

“…With the adoption of various combinations of resolution enhancement techniques (RET) for IC lithography, different process constraints are placed on the IC…”
Get full text

Generation of blue light by intracavity frequency mixing of the laser and pump radiation of a miniature neodymium:yttrium aluminum garnet laser by RISK, W. P, BAUMERT, J.-C, BJORKLUND, G. C, SCHELLENBERG, F. M, LENTH, W

“…Potassium titanyl phosphate (KTiOPO4,KTP) has been used to generate blue 459-nm radiation by intracavity sum frequency mixing of the circulating 1064-nm laser…”
Get full text

Optical proximity correction: A detail comparison of techniques and their effectiveness by Zhang, H., Morrow, J., Schellenberg, F.M.

“…The study presented here quantifies the benefit of optical proximity correction (OPC) for an I-line and a DUV wafer process in a systematic way. Masks and…”
Get full text

Generation of blue cw coherent radiation by sum frequency mixing in KTiOPO4 by BAUMERT, J.-C, SCHELLENBERG, F. M, LENTH, W, RISK, W. P, BJORKLUND, G. C

“…The wavelength, angle, and temperature tolerances of a new room-temperature noncritically phase-matched frequency mixing process involving type II frequency…”
Get full text

Design for manufacturing in the semiconductor industry: the Litho/Design Workshops by Schellenberg, F.M.

“…Design for Manufacturing (DFM) practices for productivity improvement have been applied with great success in many industries, including automobile…”
Get full text

Adoption of OPC and the impact on design and layout by Schellenberg, F. M., Toublan, Olivier, Capodieci, Luigi, Socha, Bob

“…With the adoption of various combinations of resolution enhancement techniques (RET) for IC lithography, different process constraints are placed on the IC…”
Get full text

vacuum-ultraviolet spectroscopy of dialkyl polysilanes by SCHELLENBERG, F. M, BYER, R. L, FRENCH, R. H, MILLER, R. D

Get full text

Persistent spectral hole burning for R' color centers in LiF crystals: statics, dynamics, and external-field effects by MOERNER, W. E, POKROWSKY, P, SCHELLENBERG, F. M, BJORKLUND, G. C

Get full text

High-efficiency photochemical hole burning for an infrared color center by MOERNER, W. E, SCHELLENBERG, F. M, BJORKLUND, G. C, PRASAD KAIPA, LUTY, F

Get full text

Electromagnetic phenomena in advanced photomasks by Schellenberg, F. M., Adam, K., Matteo, J., Hesselink, L.

“…The adoption of resolution enhancement techniques (RET) for subwavelength lithography relies on performing accurate simulation of mask effects. Although…”
Get full text

A history of resolution enhancement technology by SCHELLENBERG, Franklin M

Get full text

Spectral holeburning properties ofR? color centers in LiF: dependence on doping and irradiation processes by Ortiz, C., Afonso, C. N., Gehrtz, M., Schellenberg, F. M., Bjorklund, G. C., Whittaker, E. A.

Get full text

Novel spectroscopy by Schenzle, A., Devoe, R. G., Brewer, R. G., Shimizu, F., Umezu, K., Takuma, H., Saha, S. K., Hellwarth, R. W., Bjorklund, G. C., Zapka, W., Levenson, M. D., Tam, A. C., Lenth, W., Schellenberg, F. M., Gallagher, T. F., Kachru, R., Gounand, F., Weber, W. H., Terhune, R. W., le Floch, A., Lenormand, J. M., le Naour, R., Goldsmith, J. E. M.

Get full text

Nonlinear processes II by Shelby, R. M., Macfarlane, R. M., Burum, D. P., Friedrich, J., Haarer, D., Moerner, W. E., Schellenberg, F. M., Bjorklund, G. C., Chraplyvy, A. R., Sievers, A. J., Silsbee, R. H., Frenkel, F., H ger, J., Krieger, W., Walther, H., Ertl, G., Segner, J., Vielhaber, W., Gerassimov, R. B., Metev, S. M., Savtchenko, S. K., Kotov, G. A., Veiko, V. P., Figueira, J. F., Thomas, S. J., B uerle, D., Leyendecker, G., Geittner, P., Lydtin, H.

Get full text

The litho/design workshop by Schellenberg, F.M

Get full text