Search Results - "Samudra, G S"

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  1. 1

    Electrostatics of Ultimately Thin-Body Tunneling FET Using Graphene Nanoribbon by Kai-Tak Lam, Yue Yang, Samudra, G S, Yee-Chia Yeo, Gengchiau Liang

    Published in IEEE electron device letters (01-04-2011)
    “…The effect of 2-D electrostatic environment on the device performance of ultimately thin-body tunneling field-effect transistors (UTB-TFETs) using graphene…”
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    Journal Article
  2. 2

    Mechanism of Stress Memorization Technique (SMT) and Method to Maximize Its Effect by Pandey, S M, Liu, J, Hooi, Z S, Flachowsky, S, Herrmann, T, Tao, W, Benistant, F, See, A, Chu, S, Samudra, G S

    Published in IEEE electron device letters (01-04-2011)
    “…A simple and unified fundamental theory on the mechanism of stress memorization technique (SMT) is presented for the first time. This theory is based on the…”
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    Journal Article
  3. 3

    Two-Dimensional Discontinuous Galerkin Time-Domain Method for Modeling of Arbitrarily Shaped Power-Ground Planes by Hui Min Lee, Siping Gao, En-Xiao Liu, Samudra, G. S., Er-Ping Li

    “…This paper presents a two-dimensional discontinuous Galerkin time-domain (2-D DGTD) method for modeling arbitrarily shaped power-ground planes in high-speed…”
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    Journal Article
  4. 4

    Low noise RF MOSFETs on flexible plastic substrates by Kao, H.L., Chin, A., Hung, B.F., Lee, C.F., Lai, J.M., McAlister, S.P., Samudra, G.S., Won Jong Yoo, Chi, C.C.

    Published in IEEE electron device letters (01-07-2005)
    “…We report a low minimum noise figure (NF min ) of 1.1 dB and high associated gain (12 dB at 10 GHz) for 16 gate-finger 0.18-μm RF MOSFETs, after thinning down…”
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    Journal Article
  5. 5

    Power integrity modeling and measurement of TSV-based 3D IC system with application to the analysis of seven-chip stack by Lee, Hui Min, Liu, En-Xiao, Samudra, G.S., Li, Er-Ping, Li, Hong Yu, Teo, Keng Hwa

    “…This paper presents power integrity modeling and measurement of through-silicon via (TSV)-based 3D IC system. To leverage the accuracy of a full-wave approach…”
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    Journal Article Magazine Article
  6. 6

    N-channel FinFETs With 25-nm Gate Length and Schottky-Barrier Source and Drain Featuring Ytterbium Silicide by Lee, R.T.P., Lim, A.E.-J., Kian-Ming Tan, Tsung-Yang Liow, Guo-Qiang Lo, Samudra, G.S., Dong Zhi Chi, Yee-Chia Yeo

    Published in IEEE electron device letters (01-02-2007)
    “…We have fabricated n-channel 25-nm gate length FinFETs with Schottky-barrier source and drain featuring a self-aligned ytterbium silicide (YbSi 1.8 ). A…”
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    Journal Article
  7. 7

    A set of analytic formulas for capacitance of VLSI interconnects of trapezium shape by Samudra, G.S., Hsio Lin Lee

    Published in IEEE transactions on electron devices (01-08-1994)
    “…In VLSI timing analysis, a quick and accurate extraction of interconnect line to line and line to ground capacitance is very important. This paper presents a…”
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    Journal Article
  8. 8

    Global optimization for digital MOS circuits performance by Chen, H.M., Samudra, G.S., Chan, D.S.H., Ibrahim, Y.

    “…Apart from maximization of parametric yield, minimization of the spread in performance functions due to process variation is of extreme importance in very…”
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    Journal Article
  9. 9

    Trends in DRAM dielectrics by Tang, K.S., Lau, W.S., Samudra, G.S.

    Published in IEEE circuits and devices magazine (01-05-1997)
    “…We trace the development of the ON/ONO dielectric film and examine the potential of new dielectrics with high dielectric constants such as Ta/sub 2/O/sub 5/…”
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    Journal Article
  10. 10

    Tunable oxide-bypassed trench gate MOSFET: breaking the ideal superjunction MOSFET performance line at equal column width by Xin Yang, Liang, Y.C., Samudra, G.S., Yong Liu

    Published in IEEE electron device letters (01-11-2003)
    “…The superjunction (SJ) MOSFET power device is recognized for its higher blocking capability and lower on-state resistance that break the conventional unipolar…”
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    Journal Article
  11. 11

    A simple technology for superjunction device fabrication: polyflanked VDMOSFET by Kian Paau Gan, Xin Yang, Liang, Y.C., Samudra, G.S., Liu Yong

    Published in IEEE electron device letters (01-10-2002)
    “…The charge compensation based novel superjunction (SJ) MOSFET outperforms its conventional counterparts. However, the production of SJ devices is limited by a…”
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    Journal Article
  12. 12

    Direct extraction of substrate network parameters for RF MOSFET modeling using a simple test structure by Mahalingam, U., Rustagi, S.C., Samudra, G.S.

    Published in IEEE electron device letters (01-02-2006)
    “…This letter presents a novel test structure to accurately extract the substrate network parameters for RF MOSFET modeling from two-port measurements. The test…”
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    Journal Article
  13. 13

    Accurate current sensor for lateral IGBT smart power integration by Liang, Y.C., Samudra, G.S., Lim, A.J.D., Pick Hong Ong

    Published in IEEE transactions on power electronics (01-09-2003)
    “…This paper describes research work on the design and fabrication of a current sensor suitable for smart power integration in lateral insulated-gate bipolar…”
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    Journal Article
  14. 14

    Oxide-bypassed VDMOS (OBVDMOS): an alternative to superjunction high voltage MOS power devices by Liang, Y.C., Gan, K.P., Samudra, G.S.

    Published in IEEE electron device letters (01-08-2001)
    “…The superjunction concept has been proposed to overcome the ideal silicon MOSFET limit, but its fabrication was handicapped by the precise charge balance…”
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    Journal Article
  15. 15

    SDODEL MOSFET for performance enhancement by King Jien Chui, Samudra, G.S., Yee-Chia Yeo, Kheng-Chok Tee, Leong, K.-W., Kian Meng Tee, Benistant, F., Lap Chan

    Published in IEEE electron device letters (01-03-2005)
    “…A high-energy, low-dose implant of the source/drain (S/D) doping type is introduced after the gate definition step to form doped regions beneath and separated…”
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    Journal Article
  16. 16

    Tunneling Field-Effect Transistor: Effect of Strain and Temperature on Tunneling Current by Peng-Fei Guo, Li-Tao Yang, Yue Yang, Lu Fan, Gen-Quan Han, Samudra, G.S., Yee-Chia Yeo

    Published in IEEE electron device letters (01-09-2009)
    “…We report the first study of the effect of strain on tunneling field-effect transistor (TFET) characteristics. Double-gate silicon TFETs were employed. It was…”
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    Journal Article
  17. 17

    Power integrity modeling, measurement and analysis of seven-chip stack for TSV-based 3D IC integration by Hui Min Lee, En-Xiao Liu, Samudra, G. S., Er-Ping Li

    “…This paper presents power integrity modeling, measurement and analysis of a seven-chip stack for through-silicon via (TSV)-based 3D IC integration. A hybrid…”
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    Conference Proceeding
  18. 18

    Device Physics and Characteristics of Graphene Nanoribbon Tunneling FETs by Sai-Kong Chin, Dawei Seah, Kai-Tak Lam, Samudra, G S, Gengchiau Liang

    Published in IEEE transactions on electron devices (01-11-2010)
    “…We present a detailed simulation study on the current-voltage characteristics of ballistic graphene nanoribbon (GNR) tunneling FETs of different widths with…”
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    Journal Article
  19. 19

    Comprehensive study of the impact of TSV induced thermo-mechanical stress on 3D IC device performance by Hui Min Lee, Er-Ping Li, En-Xiao Liu, Samudra, G. S.

    “…Impact caused by Through-Silicon Via (TSV) induced thermo-mechanical stress on device performance has been a concern for three-dimensional (3D) integrated…”
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    Conference Proceeding
  20. 20

    Strain-induced very low noise RF MOSFETs on flexible plastic substrate by Kao, H.L., Chin, A., Hung, B.F., Lai, J.M., Lee, C.F., Li, M.-F., Samudra, G.S., Zhu, C., Xia, Z.L., Liu, X.Y., Kang, J.F.

    “…Using microstrip line design to screen substrate resistance generated RF noise, very low 1.1 dB min. noise figure (NF/sub min/) and high 12 dB associate gain…”
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    Conference Proceeding