Search Results - "Samudra, G S"
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Electrostatics of Ultimately Thin-Body Tunneling FET Using Graphene Nanoribbon
Published in IEEE electron device letters (01-04-2011)“…The effect of 2-D electrostatic environment on the device performance of ultimately thin-body tunneling field-effect transistors (UTB-TFETs) using graphene…”
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2
Mechanism of Stress Memorization Technique (SMT) and Method to Maximize Its Effect
Published in IEEE electron device letters (01-04-2011)“…A simple and unified fundamental theory on the mechanism of stress memorization technique (SMT) is presented for the first time. This theory is based on the…”
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3
Two-Dimensional Discontinuous Galerkin Time-Domain Method for Modeling of Arbitrarily Shaped Power-Ground Planes
Published in IEEE transactions on electromagnetic compatibility (01-12-2015)“…This paper presents a two-dimensional discontinuous Galerkin time-domain (2-D DGTD) method for modeling arbitrarily shaped power-ground planes in high-speed…”
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4
Low noise RF MOSFETs on flexible plastic substrates
Published in IEEE electron device letters (01-07-2005)“…We report a low minimum noise figure (NF min ) of 1.1 dB and high associated gain (12 dB at 10 GHz) for 16 gate-finger 0.18-μm RF MOSFETs, after thinning down…”
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5
Power integrity modeling and measurement of TSV-based 3D IC system with application to the analysis of seven-chip stack
Published in IEEE electromagnetic compatibility magazine (01-01-2016)“…This paper presents power integrity modeling and measurement of through-silicon via (TSV)-based 3D IC system. To leverage the accuracy of a full-wave approach…”
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Journal Article Magazine Article -
6
N-channel FinFETs With 25-nm Gate Length and Schottky-Barrier Source and Drain Featuring Ytterbium Silicide
Published in IEEE electron device letters (01-02-2007)“…We have fabricated n-channel 25-nm gate length FinFETs with Schottky-barrier source and drain featuring a self-aligned ytterbium silicide (YbSi 1.8 ). A…”
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7
A set of analytic formulas for capacitance of VLSI interconnects of trapezium shape
Published in IEEE transactions on electron devices (01-08-1994)“…In VLSI timing analysis, a quick and accurate extraction of interconnect line to line and line to ground capacitance is very important. This paper presents a…”
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8
Global optimization for digital MOS circuits performance
Published in IEEE transactions on computer-aided design of integrated circuits and systems (01-01-2000)“…Apart from maximization of parametric yield, minimization of the spread in performance functions due to process variation is of extreme importance in very…”
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9
Trends in DRAM dielectrics
Published in IEEE circuits and devices magazine (01-05-1997)“…We trace the development of the ON/ONO dielectric film and examine the potential of new dielectrics with high dielectric constants such as Ta/sub 2/O/sub 5/…”
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10
Tunable oxide-bypassed trench gate MOSFET: breaking the ideal superjunction MOSFET performance line at equal column width
Published in IEEE electron device letters (01-11-2003)“…The superjunction (SJ) MOSFET power device is recognized for its higher blocking capability and lower on-state resistance that break the conventional unipolar…”
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11
A simple technology for superjunction device fabrication: polyflanked VDMOSFET
Published in IEEE electron device letters (01-10-2002)“…The charge compensation based novel superjunction (SJ) MOSFET outperforms its conventional counterparts. However, the production of SJ devices is limited by a…”
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12
Direct extraction of substrate network parameters for RF MOSFET modeling using a simple test structure
Published in IEEE electron device letters (01-02-2006)“…This letter presents a novel test structure to accurately extract the substrate network parameters for RF MOSFET modeling from two-port measurements. The test…”
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13
Accurate current sensor for lateral IGBT smart power integration
Published in IEEE transactions on power electronics (01-09-2003)“…This paper describes research work on the design and fabrication of a current sensor suitable for smart power integration in lateral insulated-gate bipolar…”
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14
Oxide-bypassed VDMOS (OBVDMOS): an alternative to superjunction high voltage MOS power devices
Published in IEEE electron device letters (01-08-2001)“…The superjunction concept has been proposed to overcome the ideal silicon MOSFET limit, but its fabrication was handicapped by the precise charge balance…”
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15
SDODEL MOSFET for performance enhancement
Published in IEEE electron device letters (01-03-2005)“…A high-energy, low-dose implant of the source/drain (S/D) doping type is introduced after the gate definition step to form doped regions beneath and separated…”
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16
Tunneling Field-Effect Transistor: Effect of Strain and Temperature on Tunneling Current
Published in IEEE electron device letters (01-09-2009)“…We report the first study of the effect of strain on tunneling field-effect transistor (TFET) characteristics. Double-gate silicon TFETs were employed. It was…”
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17
Power integrity modeling, measurement and analysis of seven-chip stack for TSV-based 3D IC integration
Published in 2015 Asia-Pacific Symposium on Electromagnetic Compatibility (APEMC) (01-05-2015)“…This paper presents power integrity modeling, measurement and analysis of a seven-chip stack for through-silicon via (TSV)-based 3D IC integration. A hybrid…”
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Conference Proceeding -
18
Device Physics and Characteristics of Graphene Nanoribbon Tunneling FETs
Published in IEEE transactions on electron devices (01-11-2010)“…We present a detailed simulation study on the current-voltage characteristics of ballistic graphene nanoribbon (GNR) tunneling FETs of different widths with…”
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19
Comprehensive study of the impact of TSV induced thermo-mechanical stress on 3D IC device performance
Published in 2013 IEEE Electrical Design of Advanced Packaging Systems Symposium (EDAPS) (01-12-2013)“…Impact caused by Through-Silicon Via (TSV) induced thermo-mechanical stress on device performance has been a concern for three-dimensional (3D) integrated…”
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Conference Proceeding -
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Strain-induced very low noise RF MOSFETs on flexible plastic substrate
Published in Digest of Technical Papers. 2005 Symposium on VLSI Technology, 2005 (2005)“…Using microstrip line design to screen substrate resistance generated RF noise, very low 1.1 dB min. noise figure (NF/sub min/) and high 12 dB associate gain…”
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Conference Proceeding