Search Results - "SZCZUREK, M"

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  1. 1

    Laser-plasma EUV source dedicated for surface processing of polymers by Bartnik, A., Fiedorowicz, H., Jarocki, R., Kostecki, J., Szczurek, M., Wachulak, P.W.

    “…In this work, a 10 Hz laser-plasma extreme ultraviolet (EUV) source built for surface processing of polymers is presented. The source is based on a…”
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    Journal Article
  2. 2

    Development and characterization of a laser-plasma soft X-ray source for contact microscopy by Ayele, M.G., Wachulak, P.W., Czwartos, J., Adjei, D., Bartnik, A., Wegrzynski, Ł., Szczurek, M., Pina, L., Fiedorowicz, H.

    “…In this work, we present a compact laser-produced plasma source of X-rays, developed and characterized for application in soft X-ray contact microscopy (SXCM)…”
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    Journal Article
  3. 3

    Ablation and surface modifications of PMMA using a laser-plasma EUV source by Bartnik, A., Fiedorowicz, H., Jarocki, R., Kostecki, J., Szczurek, A., Szczurek, M.

    Published in Applied physics. B, Lasers and optics (01-09-2009)
    “…Surface modification and micro-structuring of polymers for different application is mainly performed using ultraviolet (UV) radiation from excimer lamps or…”
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    Journal Article
  4. 4

    “Water window” compact, table-top laser plasma soft X-ray sources based on a gas puff target by Wachulak, P.W., Bartnik, A., Fiedorowicz, H., Rudawski, P., Jarocki, R., Kostecki, J., Szczurek, M.

    “…We have developed compact, high repetition, table-top soft-X-ray sources, based on a gas puff target, emitting in “water window” spectral range at λ = 2.88 nm…”
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    Journal Article
  5. 5

    Characterization and optimization of the laser-produced plasma EUV source at 13.5 nm based on a double-stream Xe/He gas puff target by Rakowski, R., Bartnik, A., Fiedorowicz, H., de Gaufridy de Dortan, F., Jarocki, R., Kostecki, J., Mikołajczyk, J., Ryć, L., Szczurek, M., Wachulak, P.

    Published in Applied physics. B, Lasers and optics (01-12-2010)
    “…The paper describes a debris-free, efficient laser-produced plasma source emitting EUV radiation. The source is based on a double-stream Xe/He gas-puff. Its…”
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    Journal Article
  6. 6

    Luminescence of He and Ne gases induced by EUV pulses from a laser plasma source by Bartnik, A., Wachulak, P., Fiedorowicz, H., Jarocki, R., Kostecki, J., Szczurek, M.

    “…In this work helium and neon photoionization experiments, using a laser-plasma EUV (extreme ultraviolet) source were performed. The EUV radiation was focused…”
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  7. 7

    Extreme ultraviolet and soft X-ray imaging with compact, table top laser plasma EUV and SXR sources by Wachulak, P.W., Bartnik, A., Kostecki, J., Wegrzynski, L., Fok, T., Jarocki, R., Szczurek, M., Fiedorowicz, H.

    “…We present a few examples of imaging experiments, which were possible using a compact laser-plasma extreme ultraviolet (EUV) and soft X-ray (SXR) source, based…”
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    Journal Article
  8. 8

    Efficient micromachining of poly(vinylidene fluoride) using a laser-plasma EUV source by Bartnik, A., Fiedorowicz, H., Jarocki, R., Kostecki, J., Szczurek, M., Wachulak, P. W.

    “…In this paper an efficient micromachining of poly(vinylidene fluoride) (PVDF) by direct photo-etching with a laser-plasma EUV (extreme ultraviolet) source was…”
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    Journal Article
  9. 9

    Characterization of pulsed capillary channel gas puff target using EUV shadowgraphy by Wachulak, P.W., Bartnik, A., Węgrzyński, Ł., Fok, T., Kostecki, J., Szczurek, M., Jarocki, R., Fiedorowicz, H.

    “…Characterization measurements of a pulsed capillary channel gas puff target, developed for applications in laser-matter interaction experiments, are presented…”
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    Journal Article
  10. 10

    PMMA and FEP surface modifications induced with EUV pulses in two selected wavelength ranges by Bartnik, A., Fiedorowicz, H., Jarocki, R., Kostecki, J., Szczurek, M.

    “…Surface modification of PMMA and FEP polymers using extreme ultraviolet (EUV) in two spectral ranges was investigated. A laser-plasma EUV source based on a…”
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    Journal Article
  11. 11

    Physical and chemical modifications of PET surface using a laser-plasma EUV source by Bartnik, A., Fiedorowicz, H., Jarocki, R., Kostecki, J., Szczurek, M., Biliński, A., Chernyayeva, O., Sobczak, J. W.

    “…Extreme ultraviolet (EUV) radiation is the electromagnetic radiation ranging from vacuum ultraviolet to soft X-rays. A single EUV photon carries enough energy…”
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    Journal Article
  12. 12

    A compact, quasi-monochromatic laser-plasma EUV source based on a double-stream gas-puff target at 13.8 nm wavelength by Wachulak, P. W., Bartnik, A., Fiedorowicz, H., Feigl, T., Jarocki, R., Kostecki, J., Rakowski, R., Rudawski, P., Sawicka, M., Szczurek, M., Szczurek, A., Zawadzki, Z.

    Published in Applied physics. B, Lasers and optics (01-09-2010)
    “…A compact, high-repetition table-top EUV source, based on a gas-puff target, is presented. This source was developed in our group and is capable of emitting…”
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    Journal Article
  13. 13

    EUV-induced physico-chemical changes in near-surface layers of polymers by Bartnik, A., Fiedorowicz, H., Jarocki, R., Kostecki, J., Szczurek, M., Chernyayeva, O., Sobczak, J.W.

    “…In this work a laser-plasma EUV source based on a gas puff target was used for micro- and nanostructuring of polyethylene terephthalate (PET), polyethylene…”
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    Journal Article
  14. 14

    Compact laser plasma EUV source based on a gas puff target for metrology applications by Fiedorowicz, H., Bartnik, A., Jarocki, R., Kostecki, J., Krzywiński, J., Mikołajczyk, J., Rakowski, R., Szczurek, A., Szczurek, M.

    Published in Journal of alloys and compounds (29-09-2005)
    “…A newly developed compact laser plasma EUV source for metrology applications is presented in the paper. The source is based on the double-stream gas puff…”
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    Journal Article Conference Proceeding
  15. 15

    Combined effect of EUV irradiation and acetone treatment on PET surface by Bartnik, A., Fiedorowicz, H., Burdyńska, S., Jarocki, R., Kostecki, J., Szczurek, M.

    “…In this work, the radiation from a laser-plasma extreme ultraviolet (EUV) source based on a double-stream gas-puff target was used for surface modification of…”
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    Journal Article
  16. 16

    Enhanced X-ray emission in the 1-keV range from a laser-irradiated gas puff target produced using the double-nozzle setup by Fiedorowicz, H., Bartnik, A., Jarocki, R., Rakowski, R., Szczurek, M.

    Published in Applied physics. B, Lasers and optics (01-02-2000)
    “…X-ray emission from a double-stream gas puff target irradiated with a nanosecond Nd:glass laser pulse was studied for the first time. The target was formed by…”
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    Journal Article
  17. 17

    Strong temperature effect on X-ray photo-etching of polytetrafluoroethylene using a 10 Hz laser-plasma radiation source based on a gas puff target by BARTNIK, A, FIEDOROWICZ, H, JAROCKI, R, JUHA, L, KOSTECKI, J, RAKOWSKI, R, SZCZUREK, M

    Published in Applied physics. B, Lasers and optics (01-03-2006)
    “…The first results of experiments on direct photo-etching of heated PTFE using a 10 Hz X-ray source based on a laser-irradiated gas puff target are presented…”
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    Journal Article
  18. 18

    Study of crystalline thin films and nanofibers by means of the laser–plasma EUV-source based microscopy by Wachulak, P.W., Bartnik, A., Baranowska-Korczyc, A., Pánek, D., Brůža, P., Kostecki, J., Węgrzyński, Ł., Jarocki, R., Szczurek, M., Fronc, K., Elbaum, D., Fiedorowicz, H.

    “…New developments in nanoscience and nanotechnology require nanometer scale resolution imaging tools and techniques such as an extreme ultraviolet (EUV) and…”
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    Journal Article
  19. 19

    EUV emission from solids illuminated with a laser-plasma EUV source by Bartnik, A., Fiedorowicz, H., Jarocki, R., Kostecki, J., Rakowski, R., Szczurek, M.

    Published in Applied physics. B, Lasers and optics (01-12-2008)
    “…In this paper a possibility of performing fluorescence experiments in extreme ultraviolet (EUV) using a laboratory EUV source was demonstrated. Usually such…”
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    Journal Article
  20. 20

    Laser-produced plasma EUV source based on tin-rich, thin-layer targets by Rakowski, R., Mikołajczyk, J., Bartnik, A., Fiedorowicz, H., de Gaufridy de Dortan, F., Jarocki, R., Kostecki, J., Szczurek, M., Wachulak, P.

    Published in Applied physics. B, Lasers and optics (01-03-2011)
    “…In this paper a new approach to a laser-produced plasma EUV source based on a tin target is presented. A thin layer of pure tin and composite layers consisting…”
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    Journal Article