Search Results - "STEFANOV, Yordan"
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Evaluation of MOSFETs with crystalline high-k gate-dielectrics: device simulation and experimental data
Published in Journal of Telecommunications and Information Technology (01-06-2023)“…The evaluation of the world’s first MOSFETs with epitaxially-grown rare-earth high-k gate dielectrics is the main issue of this work. Electrical device…”
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Exploring the Genomic Landscape of Bacillus paranthracis PUMB_17 as a Proficient Phosphatidylcholine-Specific Phospholipase C Producer
Published in Current issues in molecular biology (14-03-2024)“…Phospholipases find versatile applications across industries, including detergent production, food modification, pharmaceuticals (especially in drug delivery…”
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Process integration and nanometer-scale electrical characterization of crystalline high- k gate dielectrics
Published in Microelectronics and reliability (01-05-2005)“…Crystalline praseodymium oxide (Pr 2O 3) high- k gate dielectric has been successfully integrated into a polysilicon gate CMOS technology. Fully functional…”
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Carbon Nanotube Transistor Fabrication Assisted by Topographical and Conductive Atomic Force Microscopy
Published in Japanese Journal of Applied Physics (01-04-2006)Get full text
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Study into the process of defective railtrack arc-hardfacing
Published in Annual Journal of Technical University of Varna (30-06-2023)“…The paper focuses exclusively on the manual arc hardfaced layers of railtrack repairing. The study is conducted in two stages- structural analysis of layers…”
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Electrical characterization of crystalline Gd2O3 gate dielectric MOSFETs fabricated by damascene metal gate technology
Published in Microelectronics and reliability (01-04-2007)Get full text
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Process damage-free damascene metal gate technology for gentle integration of epitaxially grown high- k
Published in Microelectronic engineering (2008)“…This paper presents the first successful attempt to integrate crystalline high- k gate dielectrics into a virtually damage-free damascene metal gate process…”
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Electrical characterization of crystalline Gd 2O 3 gate dielectric MOSFETs fabricated by damascene metal gate technology
Published in Microelectronics and reliability (2007)“…This paper presents the first successful attempt to integrate crystalline high- K gate dielectrics into a virtually damage-free damascene metal gate process…”
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Study of pinholes in ultrathin SiO 2 by C-AFM technique
Published in Thin solid films (2006)“…In this work, we have correlated the electrical characteristics of ultrathin oxide with the presence of pinholes by C-AFM studies. Ultrathin gate oxide has…”
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Study of pinholes in ultrathin SiO2 by C-AFM technique
Published in Thin solid films (10-05-2006)“…In this work, we have correlated the electrical characteristics of ultrathin oxide with the presence of pinholes by C-AFM studies. Ultrathin gate oxide has…”
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Conference Proceeding Journal Article -
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Electrical characterization of crystalline Gd2O3gate dielectric MOSFETs fabricated by damascene metal gate technology
Published in Microelectronics and reliability (2007)Get full text
Conference Proceeding -
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Optimization of nutritive medium composition for production of amylase by Bacillus strains
Published in Journal of BioScience and Biotechnology (01-09-2018)“…The current study aimed to examine the amylolytic activities of various species of the Bacillus genus. A total of 31% of the tested 166 strains showed a…”
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Influence of the Layout Parasitic Effects on the Performance of Current Mode Amplifier Designed Using 32nm CMOS Technology
Published in 2018 IEEE XXVII International Scientific Conference Electronics - ET (01-09-2018)“…This paper investigates the influence of layout parasitic RC elements on the main parameters of a current mode amplifier designed in deep sub-micron CMOS…”
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Conference Proceeding