Search Results - "SHAPPIR, J"
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Glutamate sensing with enzyme-modified floating-gate field effect transistors
Published in Biosensors & bioelectronics (15-04-2009)“…Neurotransmitter release is the key factor of chemical messaging in the brain. Fast, sensitive and in situ detection of single cell neurotransmitter release is…”
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Dielectric relaxation and porosity determination of porous silicon
Published in Journal of non-crystalline solids (01-07-2002)“…Results of the dielectric spectroscopy study of porous silicon (PS) samples in the frequency range, 20 Hz–1 MHz, and in the temperature range, 173–493 K, are…”
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Journal Article Conference Proceeding -
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Infrared photo-induced absorption spectroscopy of porous silicon
Published in Physica status solidi. A, Applied research (01-05-2003)“…The quantum confinement model, which assigns some of the luminescence features in porous silicon to size quantization in Si nano‐crystallites, also predicts…”
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Journal Article Conference Proceeding -
4
Electrically conductive 2D-PAN-containing surfaces as a culturing substrate for neurons
Published in Journal of biomaterials science. Polymer ed. (01-01-2004)“…In the present contribution we report on a novel route to synthesize 2D-polyaniline (2DPAN) on sulfonated-poly(styrene) (SPS) templates by allowing first…”
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Infrared multispectral detection using Si/SixGe1−x quantum well infrared photodetectors
Published in Applied physics letters (22-01-2001)“…A modified p-type Si/SiGe quantum well infrared photodetector for multispectral infrared imaging applications is demonstrated. In order to improve the…”
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Pyramid-shaped silicon photodetector with subwavelength aperture [for NSOM]
Published in IEEE transactions on electron devices (01-06-2002)“…We present a new type of silicon photodetector with a subwavelength aperture designed to scan material surfaces with a resolution inaccessible by conventional…”
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Photoluminescence anisotropy from laterally anodized porous silicon
Published in Applied physics letters (23-11-1998)“…We report on a technique to fabricate planar structures of porous silicon using standard photolithography and processing steps. Uniform stripes of porous…”
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Porous Silicon on Insulator: A New Approach to Fabricate Porous Silicon Based Optoelectronic Devices
Published in Physica status solidi. A, Applied research (01-11-2000)“…A new fabrication technique of laterally anodized porous silicon is presented. This technique, when applied to bulk silicon wafers, generates a uniform pattern…”
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Thermal relaxation processes probed by intersubband and inter-valence-band transitions in Si/Si1−xGex multiple quantum wells
Published in Applied physics letters (11-10-1999)“…Thermal relaxation processes due to strain relaxation and Si/Ge interdiffusion were investigated in pseudomorphic p-type SiGe/Si quantum wells using…”
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Analysis and modeling of floating-gate EEPROM cells
Published in IEEE transactions on electron devices (01-06-1986)“…Floating-gate MOS devices using thin tunnel oxide are becoming an acceptable standard in electrically erasable nonvolatile memory. Theoretical and experimental…”
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Novel interface nitridation process for thin gate oxides
Published in I.E.E.E. transactions on electron devices (01-11-1993)“…A thin (100-200-AA) gate dielectric film which exhibits improved properties as compared to control pure thermal oxides is discussed. The film is obtained by…”
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Journal Article Conference Proceeding -
13
Generation and anneal of a new kind of interface state in stressed and high-temperature annealed metal-oxide-semiconductor devices
Published in Applied physics letters (13-01-1992)“…Polycrystalline silicon (poly) gate metal-oxide-semiconductor (MOS) transistors were electrically stressed by constant-current tunneling. After the stress the…”
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Oxide trapping under spatially variable oxide electric field in the metal-oxide-silicon structure
Published in Applied physics letters (10-08-1987)“…An improved trapping-detrapping model is presented describing the effect of electron injection into the oxide of metal-oxide-silicon devices. The model covers…”
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15
Reversible transition of extracellular field potential recordings to intracellular recordings of action potentials generated by neurons grown on transistors
Published in Biosensors & bioelectronics (18-01-2008)“…The employment of standard CMOS technology to produce semiconductor chips for recording neuronal activity or for its future use to link neurons and transistors…”
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Effect of high-temperature anneal on interface states generation in stressed metal-oxide-semiconductor devices
Published in Applied physics letters (11-02-1991)“…Polycrystalline silicon gate metal-oxide-semiconductor transistors, fabricated with polycrystalline silicon leads, were repeatedly electrically stressed by…”
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Trap generation and occupation in stressed gate oxides under spatially variable oxide electric field
Published in Applied physics letters (30-11-1987)“…The spatial variation of the oxide field in metal-oxide-silicon devices due to charge trapping under electron injection stress is included in a self-consistent…”
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Characterization of short-range leakage currents in undoped polycrystalline Si by means of capacitance-voltage measurement
Published in Applied physics letters (09-11-1987)“…Metal-oxide-semiconductor capacitors with undoped polycrystalline Si (polysilicon) electrodes were studied and a model was developed to explain the voltage and…”
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Current induced trap generation in SiO2
Published in Applied physics letters (01-03-1982)“…Trap generation in the gate oxide of metal-oxide-semiconductor structure is studied in this work. It is shown that the application of a field of several MV/cm…”
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Determination of SiO2 trapped charge distribution by capacitance-voltage analysis of undoped polycrystalline silicon-oxide-silicon capacitors
Published in Applied physics letters (15-02-1984)“…Capacitance measurements on undoped polycrystalline silicon gate capacitors are used for oxide trapping characterization. In this structure, a field-effect…”
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