Search Results - "SHAPPIR, J"

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  1. 1

    Glutamate sensing with enzyme-modified floating-gate field effect transistors by Braeken, D., Rand, D.R., Andrei, A., Huys, R., Spira, M.E., Yitzchaik, S., Shappir, J., Borghs, G., Callewaert, G., Bartic, C.

    Published in Biosensors & bioelectronics (15-04-2009)
    “…Neurotransmitter release is the key factor of chemical messaging in the brain. Fast, sensitive and in situ detection of single cell neurotransmitter release is…”
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    Journal Article
  2. 2

    Dielectric relaxation and porosity determination of porous silicon by Axelrod, E, Givant, A, Shappir, J, Feldman, Y, Sa'ar, A

    Published in Journal of non-crystalline solids (01-07-2002)
    “…Results of the dielectric spectroscopy study of porous silicon (PS) samples in the frequency range, 20 Hz–1 MHz, and in the temperature range, 173–493 K, are…”
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    Journal Article Conference Proceeding
  3. 3

    Infrared photo-induced absorption spectroscopy of porous silicon by Krapf, D., Davidi, A., Shappir, J., Sa'ar, A.

    Published in Physica status solidi. A, Applied research (01-05-2003)
    “…The quantum confinement model, which assigns some of the luminescence features in porous silicon to size quantization in Si nano‐crystallites, also predicts…”
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    Journal Article Conference Proceeding
  4. 4

    Electrically conductive 2D-PAN-containing surfaces as a culturing substrate for neurons by Oren, R., Sfez, R., Korbakov, N., Shabtai, K., Cohen, A., Erez, H., Dormann, A., Cohen, H., Shappir, J., Spira, M.E., Yitzchaik, S.

    “…In the present contribution we report on a novel route to synthesize 2D-polyaniline (2DPAN) on sulfonated-poly(styrene) (SPS) templates by allowing first…”
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  5. 5

    Infrared multispectral detection using Si/SixGe1−x quantum well infrared photodetectors by Krapf, D., Adoram, B., Shappir, J., Sa’ar, A., Thomas, S. G., Liu, J. L., Wang, K. L.

    Published in Applied physics letters (22-01-2001)
    “…A modified p-type Si/SiGe quantum well infrared photodetector for multispectral infrared imaging applications is demonstrated. In order to improve the…”
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    Journal Article
  6. 6

    Pyramid-shaped silicon photodetector with subwavelength aperture [for NSOM] by Chelly, R.A., Cohen, Y., Sa'ar, A., Shappir, J.

    Published in IEEE transactions on electron devices (01-06-2002)
    “…We present a new type of silicon photodetector with a subwavelength aperture designed to scan material surfaces with a resolution inaccessible by conventional…”
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  7. 7

    Photoluminescence anisotropy from laterally anodized porous silicon by Givant, A., Shappir, J., Sa’ar, A.

    Published in Applied physics letters (23-11-1998)
    “…We report on a technique to fabricate planar structures of porous silicon using standard photolithography and processing steps. Uniform stripes of porous…”
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    Journal Article
  8. 8

    Porous Silicon on Insulator: A New Approach to Fabricate Porous Silicon Based Optoelectronic Devices by Givant, A., Shappir, J., Sa'ar, A.

    Published in Physica status solidi. A, Applied research (01-11-2000)
    “…A new fabrication technique of laterally anodized porous silicon is presented. This technique, when applied to bulk silicon wafers, generates a uniform pattern…”
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  9. 9

    Thermal relaxation processes probed by intersubband and inter-valence-band transitions in Si/Si1−xGex multiple quantum wells by Adoram, B., Krapf, D., Shappir, J., Sa’ar, A., Levy, M., Beserman, R., Thomas, S. G., Wang, K. L.

    Published in Applied physics letters (11-10-1999)
    “…Thermal relaxation processes due to strain relaxation and Si/Ge interdiffusion were investigated in pseudomorphic p-type SiGe/Si quantum wells using…”
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  10. 10

    Analysis and modeling of floating-gate EEPROM cells by Kolodny, A., Nieh, S.T.K., Eitan, B., Shappir, J.

    Published in IEEE transactions on electron devices (01-06-1986)
    “…Floating-gate MOS devices using thin tunnel oxide are becoming an acceptable standard in electrically erasable nonvolatile memory. Theoretical and experimental…”
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  11. 11
  12. 12

    Novel interface nitridation process for thin gate oxides by Rahat, I., Shappir, J., Ben-Atar, D.

    Published in I.E.E.E. transactions on electron devices (01-11-1993)
    “…A thin (100-200-AA) gate dielectric film which exhibits improved properties as compared to control pure thermal oxides is discussed. The film is obtained by…”
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    Journal Article Conference Proceeding
  13. 13

    Generation and anneal of a new kind of interface state in stressed and high-temperature annealed metal-oxide-semiconductor devices by BERGER, M, AVNI, E, SHAPPIR, J

    Published in Applied physics letters (13-01-1992)
    “…Polycrystalline silicon (poly) gate metal-oxide-semiconductor (MOS) transistors were electrically stressed by constant-current tunneling. After the stress the…”
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    Journal Article
  14. 14

    Oxide trapping under spatially variable oxide electric field in the metal-oxide-silicon structure by AVNI, E, SHAPPIR, J

    Published in Applied physics letters (10-08-1987)
    “…An improved trapping-detrapping model is presented describing the effect of electron injection into the oxide of metal-oxide-silicon devices. The model covers…”
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    Journal Article
  15. 15

    Reversible transition of extracellular field potential recordings to intracellular recordings of action potentials generated by neurons grown on transistors by Cohen, Ariel, Shappir, Joseph, Yitzchaik, Shlomo, Spira, Micha E.

    Published in Biosensors & bioelectronics (18-01-2008)
    “…The employment of standard CMOS technology to produce semiconductor chips for recording neuronal activity or for its future use to link neurons and transistors…”
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    Journal Article
  16. 16

    Effect of high-temperature anneal on interface states generation in stressed metal-oxide-semiconductor devices by BERGER, M, AVNI, E, SHAPPIR, J

    Published in Applied physics letters (11-02-1991)
    “…Polycrystalline silicon gate metal-oxide-semiconductor transistors, fabricated with polycrystalline silicon leads, were repeatedly electrically stressed by…”
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    Journal Article
  17. 17

    Trap generation and occupation in stressed gate oxides under spatially variable oxide electric field by AVNI, E, SHAPPIR, J

    Published in Applied physics letters (30-11-1987)
    “…The spatial variation of the oxide field in metal-oxide-silicon devices due to charge trapping under electron injection stress is included in a self-consistent…”
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  18. 18

    Characterization of short-range leakage currents in undoped polycrystalline Si by means of capacitance-voltage measurement by ALPERN, Y, SHAPPIR, J

    Published in Applied physics letters (09-11-1987)
    “…Metal-oxide-semiconductor capacitors with undoped polycrystalline Si (polysilicon) electrodes were studied and a model was developed to explain the voltage and…”
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  19. 19

    Current induced trap generation in SiO2 by Badihi, A., Eitan, B., Cohen, I., Shappir, J.

    Published in Applied physics letters (01-03-1982)
    “…Trap generation in the gate oxide of metal-oxide-semiconductor structure is studied in this work. It is shown that the application of a field of several MV/cm…”
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  20. 20

    Determination of SiO2 trapped charge distribution by capacitance-voltage analysis of undoped polycrystalline silicon-oxide-silicon capacitors by NISSAN-COHEN, Y, SHAPPIR, J, FROHMAN-BENTCHKOWSKY, D

    Published in Applied physics letters (15-02-1984)
    “…Capacitance measurements on undoped polycrystalline silicon gate capacitors are used for oxide trapping characterization. In this structure, a field-effect…”
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