Search Results - "S. Beckx"

Nanophotonic waveguides in silicon-on-insulator fabricated with CMOS technology by Bogaerts, W., Baets, R., Dumon, P., Wiaux, V., Beckx, S., Taillaert, D., Luyssaert, B., Van Campenhout, J., Bienstman, P., Van Thourhout, D.

“…High-index-contrast, wavelength-scale structures are key to ultracompact integration of photonic integrated circuits. The fabrication of these nanophotonic…”
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Basic structures for photonic integrated circuits in Silicon-on-insulator by Bogaerts, W, Taillaert, D, Luyssaert, B, Dumon, P, Van Campenhout, J, Bienstman, P, Van Thourhout, D, Baets, R, Wiaux, V, Beckx, S

“…For the compact integration of photonic circuits, wavelength-scale structures with a high index contrast are a key requirement. We developed a fabrication…”
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Compact wavelength router based on a Silicon-on-insulator arrayed waveguide grating pigtailed to a fiber array by Dumon, P, Bogaerts, W, Van Thourhout, D, Taillaert, D, Baets, R, Wouters, J, Beckx, S, Jaenen, P

“…We demonstrate a compact, fiber-pigtailed, 4-by-4 wavelength router in Silicon-on-insulator photonic wires, fabricated using CMOS processing methods. The core…”
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Low-loss SOI photonic wires and ring resonators fabricated with deep UV lithography by Dumon, P., Bogaerts, W., Wiaux, V., Wouters, J., Beckx, S., Van Campenhout, J., Taillaert, D., Luyssaert, B., Bienstman, P., Van Thourhout, D., Baets, R.

“…We demonstrate single-mode photonic wires in silicon-on-insulator with propagation loss as low as 2.4 dB/cm, fabricated with deep ultraviolet lithography and…”
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Fabrication of photonic crystals in silicon-on-insulator using 248-nm deep UV lithography by Bogaerts, W., Wiaux, V., Taillaert, D., Beckx, S., Luyssaert, B., Bienstman, P., Baets, R.

“…We demonstrate wavelength-scale photonic nanostructures, including photonic crystals, fabricated in silicon-on-insulator using deep ultraviolet (UV)…”
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A compact photonic horizontal spot-size converter realized in silicon-on-insulator by Luyssaert, B., Vandersteegen, P., Taillaert, D., Dumon, P., Bogaerts, W., Bienstman, P., Van Thourhout, D., Wiaux, V., Beckx, S., Baets, R.

“…We present a compact planar coupler connecting two optical waveguides with highly different widths. The coupler consists of various nonperiodic waveguide…”
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Diffusion of solvents in thin porous films by Shamiryan, D., Baklanov, M.R., Lyons, P., Beckx, S., Boullart, W., Maex, K.

“…Porous films are used nowadays as dielectrics with low dielectric constant (so-called low- k dielectrics). Knowing the porous structure of such films is…”
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Experimental demonstration of high coupling efficiency between wide ridge waveguides and single-mode photonic Crystal waveguides by Sanchis, P., Garcia, J., Marti, J., Bogaerts, W., Dumon, P., Taillaert, D., Baets, R., Wiaux, V., Wouters, J., Beckx, S.

“…The experimental demonstration of a high efficiency coupling technique based on setting a single defect within a photonic crystal (PhC) taper is reported. The…”
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Implementation of high- k and metal gate materials for the 45 nm node and beyond: gate patterning development by Beckx, S., Demand, M., Locorotondo, S., Henson, K., Claes, M., Paraschiv, V., Shamiryan, D., Jaenen, P., Boullart, W., Degendt, S., Biesemans, S., Vanhaelemeersch, S., Vertommen, J., Coenegrachts, B.

“…We report on gate patterning development for the 45 nm node and beyond. Both poly-Si and different metal gates in combination with medium- k and high- k…”
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Compact Wavelength-Selective Functions in Silicon-on-Insulator Photonic Wires by Bogaerts, Wim, Dumon, Pieter, Van Thourhout, Dries, Taillaert, Dirk, Jaenen, Patrick, Wouters, Johan, Beckx, Stephan, Wiaux, Vincent, Baets, Roel G.

“…We present a number of compact wavelength-selective elements implemented in silicon-on-insulator (SOI) photonic wires. These include arrayed waveguide gratings…”
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CMP-less integration of fully Ni-silicided metal gates in FinFETs by simultaneous silicidation of the source, drain, and the gate using a novel dual hard mask approach by Anil, K.G., Verheyen, P., Collaert, N., Dixit, A., Kaczer, B., Snow, J., Vos, R., Locorotondo, S., Degroote, B., Shi, X., Rooyackers, R., Mannaert, G., Brus, S., Yim, Y.S., Lauwers, A., Goodwin, M., Kittl, J.A., van Dal, M., Richard, O., Veloso, A., Kubicek, S., Beckx, S., Boullart, W., De Meyer, K., Absil, P., Jurczak, M., Biesemans, S.

“…We demonstrate a novel CMP-less dual hard mask scheme for the integration of fully silicided gates in FinFETs by simultaneous silicidation of the gate, source…”
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Integration challenges for multi-gate devices by Collaert, N., Brus, S., De Keersgieter, A., Dixit, A., Ferain, I., Goodwin, M., Kottantharayil, A., Rooyackers, R., Verheyen, P., Yim, Y., Zimmerman, P., Beckx, S., Degroote, B., Demand, M., Kim, M., Kunnen, E., Locorotondo, S., Mannaert, G., Neuilly, F., Shamiryan, D., Baerts, C., Ercken, M., Laidlcr, D., Leys, F., Loo, R., Lisoni, J., Snow, J., Vos, R., Boullart, W., Pollentier, I., De Gendt, S., De Meyer, K., Jurczak, M., Biescmans, S.

“…The FinFET transistor is the most widely studied and known multi-gate architecture that has the potential to be scaled to beyond the 45 nm technology node. In…”
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Gate isolation technology for compact poly-CMP embedded flash memories by Slotboom, M., Goarin, P., Akil, N., van Duuren, M., Demand, M., Wouters, J.M.D., Beckx, S., Leray, P., Baertsb, C., Baerts, C., Heylen, N., Pollentier, I.

“…Downscaling the cell size of embedded flash memories is hampered by a minimum thickness of the tunnel oxide due to reliability constraints. The longer…”
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Thin L-shaped spacers for CMOS devices by Augendre, E., Rooyackers, R., de Potter de ten Broeck, M., Kunnen, E., Beckx, S., Mannaert, G., Vrancken, C., Vassilev, V., Chiarella, T., Jurczak, M., Debusschere, I.

“…This work presents the use of ultimately thin (15 nm) L-shaped spacers to open the process window for deposition-related steps. Whereas conventional spacers…”
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Scaling of high-k dielectrics towards sub-1nm EOT by Heyns, M., Beckx, S., Bender, H., Blomme, P., Boullart, W., Brijs, B., Carter, R., Caymax, M., Claes, M., Conard, T., De Gendt, S., Degraeve, R., Delabie, A., Deweerdt, W., Groeseneken, G., Henson, K., Kauerauf, T., Kubicek, S., Lucci, L., Lujan, G., Mentens, J., Pantisano, L., Petry, J., Richard, O., Rohr, E., Schram, T., Vandervorst, W., Van Doorne, P., Van Elshocht, S., Westlinder, J., Witters, T., Zhao, C., Cartier, E., Chen, J., Cosnier, V., Green, M., Jang, S.E., Kaushik, V., Kerber, A., Kluth, J., Lin, S., Tsai, W., Young, E., Manabe, Y., Shimamoto, Y., Bajolet, P., De Witte, H., Maes, J.W., Date, L., Pique, D., Coenegrachts, B., Vertommen, J., Passefort, S.

“…High-k dielectric layers are deposited using ALD or MOCVD. Most of the work focused on Hf-based high-k dielectrics, either as pure HfO/sub 2/, as silicate or…”
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Basic photonic wire components in silicon-on-insulator by Dumon, P., Roelkens, G., Bogaerts, W., Van Thourhout, D., Wouters, J., Beckx, S., Jaenen, P., Baets, R.

“…We fabricated basic structures for photonic integrated circuits in silicon-on-insulator photonic wires using CMOS technology. We show low-loss bends and…”
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Highly manufacturable FinFETs with sub-10nm fin width and high aspect ratio fabricated with immersion lithography by van Dal, M. J. H., Collaert, N., Doornbos, G., Vellianitis, G., Curatola, G., Pawlak, B. J., Duffy, R., Jonville, C., Degroote, B., Altamirano, E., Kunnen, E., Demand, M., Beckx, S., Vandeweyer, T., Delvaux, C., Leys, F., Hikavyy, A., Rooyackers, R., Kaiser, M., Weemaes, R. G. R., Biesemans, S., Jurczak, M., Anil, K., Witters, L., Lander, R. J. P.

“…We investigate scalability, performance and variability of high aspect ratio trigate FinFETs fabricated with 193 nm immersion lithography and conventional dry…”
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Fabrication of ultra-compact photonic structures in silicon-on-insulator (SOI) using 248 nm deep UV lithography by Bogaerts, W., Wiaux, V., Taillaert, D., Beckx, S., Baets, R.

“…We demonstrate the use of deep UV lithography for the fabrication of wavelength-scale photonic structures. Mass-fabricating ultra-compact structures like…”
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Silicon-on-insulator platform for integrated wavelength-selective components by Taillaert, D., Baets, R., Dumon, P., Wim Bogaerts, W., Van Thourhout, D., Luyssaert, B., Wiaux, V., Beckx, S., Wouters, J.

“…The silicon-on-insulator (SOI) platform allows to make ultra-compact photonic integrated circuits by means of standard processes used for silicon CMOS. Basic…”
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Wavelength-selective components in SOI photonic wires fabricated with deep UV lithography by Dumon, P., Bogaerts, W., Van Thourhout, D., Taillaert, D., Wiaux, V., Beckx, S., Wouters, J., Baets, R.

“…We demonstrate both ring resonator drop filters and arrayed waveguide gratings in silicon-on-insulator photonic wires. The structures are fabricated in a CMOS…”
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