Search Results - "Ruess, F.J."

Scanning probe microscopy for silicon device fabrication by Simmons, M.Y., Ruess, F.J., Goh, K.E.J., Hallam, T., Schofield, S.R., Oberbeck, L., Curson, N.J., Hamilton, A.R., Butcher, M.J., Clark, R.G., Reusch, T.C.G.

“…We present a review of a detailed fabrication strategy for the realisation of nano and atomic-scale devices in silicon using phosphorus as a dopant and a…”
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Measurement of quantum states of neutrons in the Earth’s gravitational field by Nesvizhevsky, V. V., Börner, H. G., Gagarski, A. M., Petoukhov, A. K., Petrov, G. A., Abele, H., Baeßler, S., Divkovic, G., Rueß, F. J., Stöferle, Th, Westphal, A., Strelkov, A. V., Protasov, K. V., Voronin, A. Yu

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Minimisation of P surface segregation during epitaxial silicon growth for the fabrication of a silicon-based quantum computer by Oberbeck, L., Curson, N.J., Hallam, T., Simmons, M.Y., Goh, K.E.J., Schofield, S.R., Ruess, F.J., Clark, R.G.

“…To optimise the fabrication process for a silicon based quantum computer the surface segregation/diffusion of phosphorus atoms in silicon is investigated on an…”
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Atomically precise silicon device fabrication by Simmons, M.Y., Ruess, F.J., Pok, W., Thompson, D.L., Fuchsle, M., Scappucci, G., Reusch, T.C.G., Goh, K.-E.J., Schofield, S.R., Weber, B., Oberbeck, L., Hamilton, A.R., Ratto, F.

“…An important driving force behind the microelectronics industry is the ability to pack ever more features onto a silicon chip, by continually miniaturising the…”
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