Search Results - "Rowell, N.L."
-
1
Accuracy of an atomic microwave power standard
Published in IEEE transactions on instrumentation and measurement (01-04-2005)“…We have built an atomic microwave power standard based on the electromagnetic interaction with laser-cooled atoms. The atoms traversed a waveguide transmission…”
Get full text
Journal Article -
2
Oblique incidence infrared reflectance spectroscopy of phonons in cubic MgO, MnO, and NiO
Published in Infrared physics & technology (01-09-2020)“…The infrared (IR) reflectivity of the cubic metal oxides MgO, MnO, and NiO has been measured at room temperature using the technique of oblique incidence. The…”
Get full text
Journal Article -
3
Optical phonon frequencies and damping in AlAs, GaP, GaAs, InP, InAs and InSb studied by oblique incidence infrared spectroscopy
Published in Solid state communications (01-11-2005)“…The transverse (TO) and longitudinal (LO) optical phonons in AlAs, GaP, GaAs, InP, InAs and InSb have been measured at room temperature by infrared…”
Get full text
Journal Article -
4
Photoluminescence of strained Si 1 − x − y Ge x C y epilayers on Si(100)
Published in Thin solid films (2008)“…Photoluminescence (PL) spectroscopy has been used to study the incorporation of C in several samples consisting of strained Si 1 − x − y Ge x C y epilayers…”
Get full text
Journal Article -
5
Photoluminescence of strained Si1−x−yGexCy epilayers on Si(100)
Published in Thin solid films (03-11-2008)Get full text
Journal Article -
6
Infrared spectroscopy of self-assembled monolayer films on silicon
Published in Surface science (01-07-2007)“…Infrared vibrational spectroscopy in an attenuated total reflection (ATR) geometry has been employed to investigate the presence of organic thin layers on…”
Get full text
Journal Article Conference Proceeding -
7
Photoluminescence of boron-doped Si 1− xGe x epilayers grown by UHV-CVD
Published in Materials science & engineering. B, Solid-state materials for advanced technology (2002)“…Low temperature photoluminescence (PL) has been used to characterize 17-nm-thick, boron-doped, Si 0.865Ge 0.135 epilayers on Si(001). The samples included an…”
Get full text
Journal Article -
8
Advances in the growth and characterization of Ge quantum dots and islands
Published in Journal of materials research (01-12-2005)“…We review recent advances in the growth of Si1−xGex islands and Ge dots on (001) Si. We first discuss the evolution of the island morphology with Si1−xGex…”
Get full text
Journal Article -
9
Growth and characterization of Si/SiGe strained-layer superlattices on bulk single-crystal SiGe and Si substrates
Published in Journal of crystal growth (01-06-2003)“…Short-period Si/SiGe strained-layer superlattices have been grown on bulk single-crystal SiGe substrates using a commercial low-temperature ultrahigh vacuum…”
Get full text
Journal Article -
10
Photoluminescence of boron-doped Si1-xGex epilayers grown by UHV-CVD
Published in Materials science & engineering. B, Solid-state materials for advanced technology (14-02-2002)Get full text
Conference Proceeding Journal Article -
11
Photoluminescence in UHV-CVD-grown Si 1− xGe x quantum wells on Si(100): band alignment variation with excitation density and applied uniaxial stress
Published in Thin solid films (1998)“…New photoluminescence data are presented which show an intrinsic conduction band alignment in Si 1− x Ge x quantum wells grown by ultra-high vacuum chemical…”
Get full text
Journal Article -
12
Far infrared phonon spectroscopy of In/sub 1-x/Ga/sub x/As epilayers on InP[100]
Published in Conference Proceedings. 14th Indium Phosphide and Related Materials Conference (Cat. No.02CH37307) (2002)“…Polarized far infrared reflectance was measured at oblique incidence for a large number of strained In/sub 1-x/Ga/sub x/As epilayers grown on InP wafers. From…”
Get full text
Conference Proceeding -
13
Photoluminescence in UHV-CVD-grown Si1-xGex quantum wells on Si(100) : Band alignment variation with excitation density and applied uniaxial stress
Published in Thin solid films (26-05-1998)Get full text
Conference Proceeding Journal Article -
14
Accuracy of an Atomic Microwave Power Standard
Published in 2004 Conference on Precision Electromagnetic Measurements (01-06-2004)“…We have studied the accuracy of the atomic microwave power standard. The atoms are cooled and kept in a magneto-optical trap (MOT), then dropped through a…”
Get full text
Conference Proceeding -
15
Sulphur passivation of InAs(Sb)
Published in Applied surface science (1997)“…The sulphur passivation for the InAs surface was studied by photoluminescence (PL) and spectroscopic ellipsometry (SE). Effects of the treatment are compared…”
Get full text
Journal Article -
16
Photoluminescence of Ge nanocrystals self-assembled on SiO2
Published in Superlattices and microstructures (01-10-2008)“…Ge nanocrystals have been obtained from the dewetting process during thermal annealing of an amorphous Ge layer deposited by molecular beam epitaxy on a thin…”
Get full text
Journal Article -
17
Raman measurements of Ge 1− x Mn x epilayers
Published in Superlattices and microstructures (2008)“…Raman scattering has been used to characterize Ge 1− x Mn x (0.01< x<0.051) epilayers grown by MBE on Ge substrates. Ge–Mn clustering corresponding to a Ge 3Mn…”
Get full text
Journal Article -
18
Photoluminescence of Ge nanocrystals self-assembled on SiO 2
Published in Superlattices and microstructures (2008)“…Ge nanocrystals have been obtained from the dewetting process during thermal annealing of an amorphous Ge layer deposited by molecular beam epitaxy on a thin…”
Get full text
Journal Article -
19
Structural characterization of a UHV/CVD-grown SiGe HBT with graded base
Published in Thin solid films (26-05-1998)“…SiGe/Si base heterostructure bipolar transistors (HBTs) were structurally characterized using a variety of techniques. The SiGe base regions were linearly…”
Get full text
Journal Article Conference Proceeding -
20
Native defects in gallium arsenide grown by molecular beam epitaxy and metallorganic chemical vapour deposition: effects of irradiation
Published in Materials science & engineering. B, Solid-state materials for advanced technology (1995)“…Gallium arsenide (GaAs), doped n with silicon nominally to 10 15 and 10 16 cm −3, grown by molecular beam epitaxy (MBE) and by metallorganic chemical vapour…”
Get full text
Journal Article Conference Proceeding